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Resumo:
A novel pulsed rapid thermal processing (PRTP) method has been used for realizing the solid-phase crystallization of amorphous silicon films prepared by PECVD. The microstructure and surface morphology of the crystallized films are investigated by X-ray diffraction (XRD) and atomic force microscopy (AFM). The results indicate that this PRTP is a suitable post-crystallization technique for fabricating large-area polycrystalline silicon films with good structural qualities such as large grain size, small lattice microstain and smooth surface morphology on low-cost substrate.
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装置应国内辐照加工需求而研制,采用单相无铁芯变压器结构,初级供以400 Hz的中频交流,次级全波整流倍压后级联形成直流高压。加速管同心地位于次级线圈内,电子枪采用间热式LaB6发射阴极。该装置结构紧凑,电子束1.2 MeV/40 mA,束流功率近50 kW,不稳定度均好于±5%,电功率转化效率高于65%,已通过8 h运行测试。
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IEECAS SKLLQG
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IEECAS SKLLQG
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IEECAS SKLLQG
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IEECAS SKLLQG
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IEECAS SKLLQG
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IEECAS SKLLQG