Structural properties of polycrystalline silicon films formed by pulsed rapid thermal processing
Data(s) |
1999
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Resumo |
A novel pulsed rapid thermal processing (PRTP) method has been used for realizing the solid-phase crystallization of amorphous silicon films prepared by PECVD. The microstructure and surface morphology of the crystallized films are investigated by X-ray diffraction (XRD) and atomic force microscopy (AFM). The results indicate that this PRTP is a suitable post-crystallization technique for fabricating large-area polycrystalline silicon films with good structural qualities such as large grain size, small lattice microstain and smooth surface morphology on low-cost substrate. A novel pulsed rapid thermal processing (PRTP) method has been used for realizing the solid-phase crystallization of amorphous silicon films prepared by PECVD. The microstructure and surface morphology of the crystallized films are investigated by X-ray diffraction (XRD) and atomic force microscopy (AFM). The results indicate that this PRTP is a suitable post-crystallization technique for fabricating large-area polycrystalline silicon films with good structural qualities such as large grain size, small lattice microstain and smooth surface morphology on low-cost substrate. 于2010-10-29批量导入 Made available in DSpace on 2010-10-29T06:37:06Z (GMT). No. of bitstreams: 1 2978.pdf: 981462 bytes, checksum: 9b71dc58b556adbdf4b41552cc14a135 (MD5) Previous issue date: 1999 Mat Res Soc.; Akzo Nobel.; dpiX A Xerox Co.; Fuji Elect Corp Res & Dev Ltd.; Kaneka Corp.; Mitsui Chem Co Ltd.; NAPS France.; Natl Renewable Energy Lab.; Sanyo Elect Co Ltd.; Tokuyama Corp.; Voltaix Inc. Chinese Acad Sci, Inst Semicond, State Lab Surface Phys, Beijing 100083, Peoples R China Mat Res Soc.; Akzo Nobel.; dpiX A Xerox Co.; Fuji Elect Corp Res & Dev Ltd.; Kaneka Corp.; Mitsui Chem Co Ltd.; NAPS France.; Natl Renewable Energy Lab.; Sanyo Elect Co Ltd.; Tokuyama Corp.; Voltaix Inc. |
Identificador | |
Idioma(s) |
英语 |
Publicador |
MATERIALS RESEARCH SOCIETY 506 KEYSTONE DRIVE, WARRENDALE, PA 15088-7563 USA |
Fonte |
Wang YQ; Liao XB; Diao HW; He J; Ma ZX; Yue GZ; Shen SR; Kong GL; Zhao YW; Li ZM; Yun F .Structural properties of polycrystalline silicon films formed by pulsed rapid thermal processing .见:MATERIALS RESEARCH SOCIETY .AMORPHOUS AND MICROCRYSTALLINE SILICON TECHNOLOGY-1998, 507,506 KEYSTONE DRIVE, WARRENDALE, PA 15088-7563 USA ,1999,975-980 |
Palavras-Chave | #半导体材料 #AMORPHOUS-SILICON #CRYSTALLIZATION #TRANSISTORS |
Tipo |
会议论文 |