Growth of alpha-Al2O3:C crystal with highly sensitive optically stimulated luminescence

In this work. an alpha-Al2O3:C crystal was directly grown by the temperature gradient technique (TGT) using Al2O3 and graphite powders as the raw materials. The optical, optically stimulated luminescence (OSL) properties and dosimetric characteristics of as-grown crystal were investigated. As-grown alpha-Al2O3:C crystal shows strong absorption band at 205, 230 and 256 nm. Three-dimensional thermoluminescence (TL) emission spectrum of the crystal shows a single emission peak at similar to 415 nm. The OSL decay curve can be fitted to two exponentials, the faster component and the slower component. The OSL response of the crystal shows a linear-sublinear-saturation characteristic. As-grown alpha-Al2O3:C crystal shows excellent linearity in the dose range from 5 x 10(-6) to 50 Gy. For doses higher than the saturation dose (100 Gy). the OSL sensitivity decreases as the dose increases. Crown Copyright (C) 2008 Published by Elsevier B.V. All rights reserved.

Field emission site densities of nanostructured carbon

The field emission properties of nanostructured carbon films deposited by cathodic vacuum arc in a He atmosphere have been studied by measuring the emission currents and the emission site density. The films have an onset field of ∼ 3 V/μm. The emission site density is viewed on a phosphor anode and it increases rapidly with applied field. It is assumed that the emission occurs from surface regions with a range of field enhancement factors but with a constant work function. The field enhancement factor is found to have an exponential distribution.

Deep levels in high resistivity GaN detected by thermally stimulated luminescence and first-principles calculations

Thermally stimulated luminescence spectroscopy has been applied to study the deep centres in unintentionally doped high resistivity GaN epilayers grown by the metal organic chemical vapour deposition method on c-sapphire substrates. Two trap states with activation energies of 0.12 and 0.62 eV are evaluated from two luminescence peaks at 141.9 and 294.7 K in the luminescence curve. Our spectroscopy measurement, in combination with more accurate first-principles studies, provided insights into the microscopic origin of these levels. Our investigations suggest that the lower level at 0.12 eV might originate from C-N, which behaves as a hole trap state; the deeper level at 0.62 eV can be correlated with V-Ga that corresponds to the yellow luminescence band observed in low-temperature photoluminescence spectra.

White light emission from ultraviolet laser diode

A phosphor-conversion white light using an InGaN laser diode that emits 405 nm near-ultraviolet (n-UV) light and phosphors that emit in the red/green/blue region when excited by the n-UV light was fabricated. The relationship of the luminous flux and the luminous efficacy of the white light with injection current were discussed. Based on the evaluation method for luminous efficacy of light sources established by the Commission International de I'Eclairage (CIE) and the phosphor used in this experiment, a theoretical analysis of the experiment results and the maximum luminous efficacy of this white light fabrication method were also presented.

White light emission from fiber pigtailed laser module

We fabricated a phosphor-conversion white light using an InGaN laser diode that emits 445 nm and phosphor that emit in the yellow. The InGaN laser diode was coupled to an optical fiber firstly and the phosphor was excited by the laser light output from the fiber. At 350 mA injection current the luminous flux and the luminous efficacy was 73 lm and 42.7 lm/W, respectively. The luminance was estimated to be 50 cd/mm(2). The relationship of the luminous flux and the luminous efficacy of the white light with injection current were measured and discussed.

Analysis on the high luminous flux white light from GaN-based laser diode

We fabricated a phosphor-conversion white light using an InGaN laser diode that emits 445 nm and phosphor that emits in the yellow region when excited by the blue laser light. At 500 mA injection current the luminous flux and the luminous efficacy were 113 lm and 44 lm/W, respectively. The relationship of the luminous flux and the luminous efficacy of the white light with an injection current were discussed. Based on the evaluation method for luminous efficacy of light sources established by the Commission International de I'Eclairage (CIE) and the phosphor used in this experiment, a theoretical analysis of the experiment results and the maximum luminous efficacy of this white light fabrication method were also presented.

Full-color emission from In2S3 and ln(2)S(3): Eu3+ nanoparticles

New observations on the luminescence Of In2S3 and europium-doped In2S3 nanoparticles show a green (5 10 nm) emission from In2S3 and In1.8Eu0.2S3 nanoparticles while a blue (425 nm) emission is observed from ln(1.6)Eu(0.4)S(3) nanoparticles. Both the blue and green emissions have large Stokes shifts of 62 and 110 nm, respectively. Excitation with longer-wavelength photons causes the blue emission to shift to a longer wavelength while the green emission wavelength remains unchanged. The lifetimes of both the green and blue emissions are similar to reported values for excitonic recombination. When doped with Eu3+, in addition to the broad blue and green emissions, a red emission near 615 nm attributed to Eu3+ is observed. Temperature dependences on nanoparticle thin films indicate that with increasing temperature, the green emission wavelength remains constant, however, the blue emission shifts toward longer wavelengths. Based on these observations, the blue emission is attributed to exciton recombination and the green emission to Indium interstitial defects. These nanoparticles show full-color emission with high efficiency, fast lifetime decays, and good stability; they are also relatively simple to prepare, thus making them a new type of phosphor with potential applications in lighting, flat-panel displays, and communications.

Generation and suppression of deep level defects in InP

Deep level defects in as-grown and annealed n-type and semi-insulating InP have been studied. After annealing in phosphorus ambient, a large quantity of deep level defects were generated in both n-type and semi-insulating InP materials. In contrast, few deep level defects exist in InP after annealing in iron phosphide ambient. The generation of deep level defects has direct relation with in-diffusion of iron and phosphorus in the annealing process. The in-diffused phosphorus and iron atoms occupy indium sites in the lattice, resulting in the formation of P anti-site defects and iron deep acceptors, respectively. T e results indicate that iron atoms fully occupy indium sites and suppress the formation of indium vacancy and P anti-site, etc., whereas indium vacancies and P anti-site defects. are formed after annealing in phosphor-us ambient. The nature of the deep level defects in InP has been studied based on the results.

Carrier transport properties of the (n)nc-Si : H/(p)c-Si heterojunction

Phosphor-doped nano-crystalline silicon ((n))nc-Si:H) films are successfully grown on the p-type (100) oriented crystal silicon ((p) c-Si) substrate by conventional plasma-enhanced chemical vapor deposition method. The films are obtained using high H-2 diluted SiH4 as a reaction gas source and using PH3 as the doping gas source of phosphor atoms. Futhermore, the heterojunction diodes are also fabricated by using (n)nc-Si:H films and (p)c-Si substrate. I-V properties are investigated in the temperature range of 230-420K. The experimental results domenstrate that (n)nc-Si:H/(p) c-Si heterojunction is a typical abrupt heterojunction having good rectifing and temperature properties. Carrier transport mechanisms are tunneling - recombination model at forward bias voltages. In the range of low bias voltages ( V-F< 0.8 V), the current is determined by recombination at the (n)nc-Si:H side of the space charge region, while the current becomes tunneing at higher bias voltages( V-F>1.0 V). The present heterojunction has high reverse breakdown voltage ( > - 75 V) and low reverse current (approximate to nA).

Photoluminescence and electroluminescence of (Gd2O3-Ga2O3): Ce thin film

A novel electroluminescence oxide phosphor (Gd2O3-Ga2O3):Ce has been prepared by electron beam evaporation. The emission peaks of photoluminescence lie at 390nm and a shoulder at 440nm. However, the electroluminescence of the (Gd2O3-Ga2O3):Ce thin film have four emission peaks at 358nm, 390nm, 439nm and 510nm, respectively. The optical absorption of (Gd2O3-Ga2O3):Ce thin film and the photoluminescence of composite materials with various ratios of Ga2O3/(Gd2O3+Ga2O3) have also been described to investigate the origin of emission of photoluminescence and electroluminescence.

Preparation and luminescence properties of Eu2+ in SiO2 xerogels

Al-doped and B, Al co-doped SiO2 xerogels with Eu2+ ions were prepared only by sol-gel reaction in air without reducing heat-treatment or post-doping. The luminescence characteristics and mechanism of europium doping SiO2 xerogels were studied as a function of the concentration of Al, B, the europium concentration and the host composition. The emission spectra of the Al-doped and B, Al codoped samples all show an efficient emission broad band in the blue violet range. The blue emission of the Al-doped sample was centered at 437 nm, whereas the B, Al co-doped xerogel emission maximum shifted to 423 nm and the intensity became weaker. Concentration quenching effect occurred in both the Al-doped and B, Al co-doped samples, which probably is the result of the transfer of the excitation energy from Eu2+ ions to defects. The highest Eu2+ emission intensity was observed for samples with the Si(OC2H5)(4):C2H5OH:H2O molar ratio of 1:2:4. (c) 2006 Elsevier B.V. All rights reserved.

合成方法对几种稀土发光材料的形貌及发光性能的影响

分别采用喷雾热解法、溶胶-凝胶法、共沉淀法和固相法合成了Y<,3>Al<,5>O<,12>:Eu<'3+>发光粉,并且比较了不同方法制备的发光粉的结晶过程和发光性质.通过比较我们发现,与其他三种方法相比,喷雾热解法结晶温度低、合成的发光粉具有球形形貌、且发光强度较大,是一种比较理想的合成发光粉的方法.

溶胶-凝胶软石印法制备稀土发光薄膜及其图案化

利用溶胶-凝胶法合成了一系列稀土离子掺杂的发光薄膜，包括三元氧磷灰石稀土硅酸盐Ca2RS（SiO4）6O2（R＝YGd）体系，YVO4体系，LaPO4体系以及钒磷酸盐形成的固熔体体系1并研究了稀土离子Eu3+，Tb3+，Dy3+，Sm3+，Er3+和类汞离子Pb2＋在这些薄膜中的发光性质和能量传递性质。同时利用软石印法结合毛细管微模板技术实现了发光薄膜的图案化。SEM以及AFM结果表明，利用溶胶一凝胶法制备的发光薄膜表面致密均匀，无开裂。通过增加镀膜溶液的粘度、镀膜的次数可以有效的控制薄膜的厚度，使其达到理想的范围。由此可见溶胶一凝胶法是一种比较理想的制备发光薄膜的方法。在三元氧磷灰石稀土硅酸盐Ca2R8（SiO4）6O2（R＝YGd）体系中，稀土离子Eu3+，Tb3+在Ca2Y8（SiO4）6O2基质中占据低刘·称性格位6h（Cs）和4f（C3），并以其特征的红光发射（5Do-7F2）和绿光发射（5D4-7F5）为主。Eu3+，Tb3+发光的最佳浓度分别为Y3+的10mol％和6mol％，Ca2Y8（51O4）6O2:Eu3＋薄膜样品的发光强度和寿命随着烧结温度的升高而增加，Ca2Y8（SiO4）6O2:Tb3+薄膜样品的发光强度和寿命在800℃时最大，随后又随烧结温度的升高有所下降，Pb2＋可以敏化Ca2Gd8（SiO4 ）6O2中Gd3+的基质晶格，通过Pb2＋→Gd3十→（Gd3＋）n→A3＋形式传递和转移能量。在YVO4体系中，利用Pechini溶胶一凝胶法以无机盐为主要原料，柠檬酸为络合剂，利用聚乙二醇调节镀膜溶液的粘度，制备了YvO4:A（A＝Eu3＋ Dy3＋，Sm3＋，Er3＋）纳米发光薄膜。结合软石印法，通过简单工艺实现了发光薄膜图案化烧结过程中图案化薄膜有一定程度的收缩，存在一定的缺陷。得到的条纹在紫外灯下发出明亮的红光。掺杂的稀土离子在YVO4薄膜中显示它们特征发射，同时VO43-和稀土离子之间存在能量传递。Dy3＋，Sm3＋，Er3十发光的最佳浓度皆为Y3+的2mol％，这三者的发光淬灭是由交叉驰豫引起的。在LaPO4发光薄膜中，Etl3+以591nm的5Do-7Fl跃迁发射为主，呈现红橙光；Tb3＋以543nm的5D4-7F5发射为主，属于绿光发射。Ce3＋则由其特有的5d-4f双峰发射组成。Tb3＋和Eu3+掺杂的样品发光强度和荧光寿命随烧结温度的升局而增加。Tb3+和Eu3+的寿命曲线符合指数衰减，但Tb3十在LaPO4:Ce，Tb薄膜中，所得的寿命曲线不符合单指数衰减。Ce3+和Tb3+之间存在吸收能量传递。通过计算得到能量传递效率可以达到95％以上。XRD结果表明，从x＝0到x＝1 YVxP1-xO4:Eu3+薄膜形成了一系列具有错石结构的固熔体。在YVxP1-xO4:Eu3+（0≤x≤1）系列薄膜中，随着x值的增加，Eu3+的发光强度和红橙比逐渐增大。除x＝0，其它的Eu3+的红橙比都大于1，说明在发射光谱中，以Eu3+禁戒5Do一7F2电偶极跃迁为主，Etls十在基质中处于低对称性格位。当x＝0时，即Y0.98Eu0.l2PO4薄膜中，Eu3+，仍处于D2d低对称性格位，但5D0一7FI橙光发射却比SD0一7F2红光发射强。x对Y0.98Eu0.02VxP1-xO4（0≤x≤l）薄膜寿命曲线有很大的影响，当0≤x≤0.5时，Eu3+5 D0-7F2发射呈单指数衰减；当x≥0.6时，Eu3+5D0-7F2发射的衰减曲线比较复杂，不能用单指数拟合。YVxP1-xO4:A3＋（0≤x≤1，A＝Er，Sm）薄膜中，由于存在VO43-A3+，以及VO43-（VO43-）n-A3+（n≥1）形式的能量传递，同时由于浓度淬灭，VO43-的蓝光发射在0.1≤x≤1范围内，随x的增加而减弱，当x＝1时，VO43-的蓝光发射被完全淬灭，而A3+发光强度随x的增加而增加。在RVO4:A3+（R＝Y，La，Gd，A＝Eu，Sm，Er）纳米发光薄膜中，R对稀土离子发光性质的影响主要是由于基质晶体结构的不同。A3+在YVO4和GdVO4中属于D2d对称性，在YVO4和GdVO4薄膜中A3+的光谱性质基本相同，而LaVO4属于单斜晶系，具有独居石结构。A3+在LaVO4中属于C1对称性。C1对称性比D2d对称性低，A3+的发光光谱中谱线的位置以及谱线的劈裂数目都略有不同。由于Gd3+和发光离子之间的能量传递，A3+在GdVO4基质中的发光最强。

溶胶-凝胶软石印法制备硅酸盐发光薄膜及其图案化

利用瑞利波信息反演层状半空间介质的性质和状态，是地震勘探、岩土工程、及超声检测领域关注的研究课题。本文由层状半空间瑞利波的实验数据，分析给出了层状半空间中瑞利波的传播模式和频散曲线，并进而利用基阶和（或）高阶模式瑞利波频散曲线反演了层状介质参数。本文分别用数值模拟和实验分析进行了深入的研究。在数值模拟中，采用地震勘探中常用的爆炸点源激发产生的瑞利波，利用频率波数分析方法分析了层状半空间瑞利波的频散，考察了源检距，道间距，接收道数目等因素对频散曲线的影响，给出了这些参数的定量要求。研究表明频率波数分析方法得到的频散曲线和按激发强度占主导的模式随频率的变化而形成的跳跃频散曲线一致。对于速度递增的层状半空间，反演时可以仅考虑基阶模式的瑞利波频散曲线，对于含有低速层的层状半空间，则必须考虑模式跳跃后形成的“之”字形频散曲线。在用遗传算法反演介质参数时，也必须考虑激发强度占主导地位的模式随频率的变化，从而恰当地设计目标函数，才能得出对层状介质参数的正确反演。在超声实验中，用表面圆形法向力源激发的瑞利波，对三个层状半空间模型，即均匀半空间，速度递增的两层半空间，含低速层的三层半空间，利用我们实验室自行研制的数字式多通道发射和接收系统，进行了超声探测实验。通过对实验得到的多道瑞利波信号，利用频率波数分析的方法得到了和理论结果一致的实验频散曲线，并基此利用遗传算法实现了层状介质参数的正确反演，得到了和实际介质参数相符的反演结果。数值模拟和实验研究的结果均表明，由实验数据正确给出频散曲线和相应的采用遗传算法发展的适合层状半空间介质的反演方法，是一种优良的反演方法，一般可以找到全局的最优解。获得介质性状较好反演结果的原因，是因为我们首次考虑到了由激发强度决定的占主导地位的模式随频率的变化规律，对应地我们建立了爆炸点源和表面法向力源激发下，分层半空间多模瑞利波模式分析及频散曲线获取和介质参数反演的系统方法。此外，本文最后为了与频率波数分析的结果进行对比，研究了时频分析方法一魏格纳维尔分布，用数值模拟和实验结果分析了层状介质中瑞利波的频散曲线。结果表明时频分析方法获得的频散曲线不及多道频率波数分析得到的瑞利波频散曲线准确。不过由于时频分析仅需要一个接收道的数据就能给出结果，比多道频率波数分析方法要简便，如果能对此方法加以改进，还是一种具有前景的分析方法。总的来说，本文系统地给出了用瑞利波反演分层半空间介质性质和层厚的方法，并给出了相应的软件。数值模拟和实验研究表明，本文给出的建立在严格理论基础上的方法，为用瑞利波探测地层和超声探测层状介质，奠定了可靠的基础。在此基础上，进一步发展相应的系统解释软件，可望能提供给地层勘探，层状材料和薄膜的超声探测等领域应用。

稀土固体剂量计材料的合成、发光及剂量光学性质

采用高温固相扩散反应合成了稀土元素激活的碱土硼酸盐MB4O7:RE（M=Sr， Ba；RE＝D又Tb，Tm， Ho）；过渡金属硼酸盐Zn4B6O13：RE（RE＝Dy,Tb，Tm，Ho）； Zn（BO2）2:RE（RE＝Dy,Tb，Tm，Ho）；碱土磷酸盐M3（PO4）2:RE（M=Sr，Ba；RE＝Du, Tb）。通过）。RD和琅光谱对其结构进行了表征。测定了上述化合物的红外、荧光、余辉、漫反射和热释光谱及剂量学性质。研究了高能60Co伽玛射线和p-射线辐照下，稀土离子激活的碱土硼酸盐 MB407：Dy（M=Sr，Ba）；过渡金属硼酸盐Zn4B6O13:Dy；Zn（BO2）2：Dy，Zn毋o承：Tb； 碱土磷酸盐Sr3（PO4）2:Dy的三维热释光谱及MB4O7:Dy（M=Sr，B）的电子顺磁共 振谱（EPR）的性质。发现稀土离子激活剂的浓度在一定的范围内增加时，能够改变陷阱的分布，不同深度陷阱的相对分布发生变化，使峰温向高温方向移动，这可提高剂量器的 热稳定性。发现稀土离子对材料的热释发光亦存在浓度碎灭作用。通过热释发光曲线；结合定量公式，计算了一些硼酸盐化合物的动力学参数。首次应用荧光、三维热释光谱等手段确证了高能60Co伽玛射线和p-射线辐 照没有导致稀土离子D3+和Tb3+的价态变化，即未改变为二价或四价化合物。研究了这类电子俘获材料的存储机理和辐照前后，基质和稀土离子的物理、化学 变化。通过电子顺磁共振谱卿）分析了缺陷的类型，即在高能60Co伽玛射线和p 一射线辐照下，存在空穴和电子两类陷阱中心。热释发光曲线与电子顺磁共振谱 的快衰退部分对应着浅陷阱能级，而慢衰退部分对应着深陷阱能级，陷阱能级是 连续分布的。在个人防护和临床治疗剂量范围内，筛选出7个60Co伽玛射线和中能x一射 线辐照下具有应用前景的高效热释发光材料，为深入研究打下基础。研究了高能p-射线辐照下，两．种潜在的具有应用前景的用于辐射加工剂量范围的p-射线固体剂量计材料。