Raman study on residual strains in thin 3C-SiC epitaxial layers grown on Si(001)

Raman scattering measurement has been used to study the residual strains in the thin 3C-SiC/Si(001) epilayers with a variation of film thickness from 0.1 to 1.2 mu m. which were prepared by chemical vapor deposition (CVD)growth. Two methods have been exploited to figure our the residual strains and the exact LO bands. The final analyzing results show that residual strains exist in the 3C-SiC epilayers. The average stress is 1.3010 GPa, and the relative change of the lattice constant is 1.36 parts per thousand. Our measurements also show that 3C-SiC phonons are detectable even for the samples with film thickness in the range of 0.1 to 0.2 mu m. (C) 2000 Published by Elsevier Science S.A. All rights reserved.

The influence of substrate nucleation on HVPE-grown GaN thick films - art. no. 684105

Thick GaN films were grown on sapphire in a home-made vertical HVPE reactor. Effect of nucleation treatments on the properties of GaN films was investigated, including the nitridation of sapphire, low temperature GaN buffer and MOCVD-template. Various material characterization techniques, including AFM, SEM, XRD, CL and PL have been used to assess these GaN epitaxial films. It was found that the surface of sapphire after high temperature nitridation was flat and showed high density nucleation centers. In addition, smooth Ga-polarity surface of epitaxial layer can be obtained on the nitridation sapphire placed in air for several days due to polarity inversion. This may be caused by the atoms re-arrangement because of oxidation. The roughness of N-polarity film was caused by the huge inverted taper domains, which can penetrate up to the surface. The low temperature GaN buffer gown at 650 degrees C is favorable for subsequent epitaxial film, which had narrow FWHM of 307 arcsec. The epitaxial growth on MOCVD-template directly came into quasi-2D growth mode due to enough nucleation centers, and high quality GaN films were acquired with the values of the FWHM of 141 arcsec for (002) reflections. After etching in boiled KOH, that the total etch-pit density was only 5 x 106 cm(-2) illustrated high quality of the thick film on template. The photoluminescence spectrum of GaN film on the MOCVD-template showed the narrowest line-width of the band edge emission in comparison with other two growth modes.

An experimental study of ultrashort pulsed ytterbium-doped fibre laser and amplifier

We report the generation of ultrashort pulses in ytterbium-doped fibre oscillator emitting around 1.05 mum at a repetition rate of 17.6MHz. A diode laser with single silica fibre at 976 nm pumps the ytterbium fibre laser, the all-fibre picosecond pulsed oscillator has excellent stability and compact size, and freedom from misalignment. After amplifying, pulse energy of 3.4 nJ and an average power of 60mW are obtained. The compression is obtained with a grating pair out of the cavity. The compressor produces 307 fs with the peak power 5.47 kW. A practical fibre-based source with good performance is thus demonstrated.

黄土旱塬Hybrid-Maize模型适应性及春玉米生产潜力估算

通过对Hybrid-Maize玉米高产模型进行田间验证,应用该模型对黄土旱塬春玉米生产潜力进行初步估算。结果表明,Hybrid-Maize模型在黄土旱塬表现出较好模拟效果,总生物量、秸秆生物量和籽粒产量模拟值与实测值间具有极显著线性相关性,其决定系数分别为0.9469、0.8164和0.9650,回归系数分别为1.0198、0.9787和1.1844,接近于1。黄土旱塬区多年光温生产潜力和气候生产潜力因品种不同有所差别,对多年平均光温籽粒和总生物量生产潜力,紧凑型玉米品种分别为13.25和22.45t/hm2,平展型玉米品种分别为12.32和20.62t/hm2,年际变化小;对多年平均气候籽粒和总生物量生产潜力,紧凑型玉米品种分别为11.97和19.94t/hm2,平展型玉米品种分别为11.37和18.63t/hm2,年际波动大。在黄土旱塬区,玉米产量潜力挖掘的主要途径应集中在提高密度和水分限制条件下,Hybrid-Maize玉米模型在指导玉米高产栽培上具有较好应用。

An investigation of the formation mechanisms of electric field domains in GaAs/AlAs superlattices

We have studied the vertical transport and formation mechanisms of electric field domains in doped weakly-coupled GaAs/AlAs superlattices. Under hydrostatic pressure two kinds of sequential resonant tunneling are observed within the pressure range from 0 to 4.5 kbar. A transition from Gamma-Gamma to Gamma-X sequential resonant tunneling occurs at P-t approximate to 1.6 kbar. For P < P-t, the high electric field domain is formed by the Gamma-Gamma process, while for P > P-t it is preferentially formed by the Gamma-X process.

高功率VCSEL中应变补偿量子阱的理论设计

利用模型固体理论、k．p理论和Pikus-Bir理论，研究了InGaAs／GaAsP应变补偿量子阱，得出了较为简单通用的设计方法；进而研究了阱宽、InGaAs中In组分和GaAsP中P组分等参数对跃迁波长的影响。理论计算发现，与InGaAs／GaAs普通量子阱相比，InGaAs／GaAsP应变补偿量子阱能提供更深的载流子阱和更大的增益。按照提出的理论设计方法，研制了含InGaAs／GaAsP应变补偿量子阱的垂直腔面发射激光器（VCSEL），理论计算和实验结果相吻合。

3μm GaInNAs/GasAs Quantum Well Resonant Cavity Enhanced Photodetector

A 1.3μm GaInNAs resonant cavity enhanced (RCE) photodetector (PD) has been grown by molecular beam epitaxy (MBE) monolithically on (100) GaAs substrate using a home-made ion-removed dc-plasma cell as nitrogen source. A transfer matrix method was used to optimize the device structure. The absorption region is composed of three GaInNAs quantum wells separated by GaAs layers. Devices were isolated by etching 130μm-diameter mesas and filling polyamide into grooves. The maximal quantum efficiency of the device is about 12% at 1.293μm. Full width at half maximum (FWHM) is 5.8nm and 3dB bandwidth is 304MHz. Dark current is 2 * 10~(-11) A at zero bias voltage. Further improvement of the performance of the RCE PD can be obtained by optimizing of the structure design and MBE growth conditions.

In_(0.5)Ga_(0.5)P/GaAs 材料系中有序结构的研究

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