Simultaneous multiwavelength observations of sagittarius A

We observed Sgr A* using the Very Large Array (VLA) and the Giant Metrewave Radio Telescope (GMRT) at multiple centimeter and millimeter wavelengths on 2003 June 17. The measured flux densities of Sgr A*, together with those obtained from the Submillimeter Array (SMA) and the Keck II 10 m telescope on the same date, are used to construct a simultaneous spectrum of Sgr A* from 90 cm to 3.8 mu m. The simultaneous spectrum shows a spectral break at about 3.6 cm, a possible signature of synchrotron self-absorption of the strong radio outburst that occurred near epoch 2003 July 17. At 90 cm, the flux density of Sgr A* is 0.22 +/- 0.06 Jy, suggesting a sharp decrease in flux density at wavelengths longer than 47 cm. The spectrum at long cm wavelengths appears to be consistent with free-free absorption by a screen of ionized gas with a cutoff similar to 100 cm. This cutoff wavelength appears to be three times longer than that of similar to 30 cm suggested by Davies, Walsh, & Booth based on observations in 1974 and 1975. Our analysis suggests that the flux densities of Sgr A* at wavelengths longer than 30 cm could be attenuated and modulated by stellar winds from massive stars close to Sgr A*.

不同培肥措施下种植制度及撂荒对土壤微生物量碳氮的影响

以黄土高原南部半湿润易旱区已进行17年的田间定位试验为研究对象,研究了不同培肥措施(不施肥、施用氮磷钾及氮磷钾与有机肥配合施用)下两种种植制度(一年1熟及一年两熟)和撂荒对土壤微生物量碳、氮(SMBC、SMBN)及可溶性有机碳、氮(SOC、SON)等含量的影响。结果表明,与一年1熟的小麦-休闲种植制度相比,一年两熟小麦-玉米轮作提高了0~10cm土层SMBC、SMBN、有机碳(TOC)、全氮(TN)和土壤SOC、SON的含量,而对10~20cm土层上述测定指标影响不大。与不施肥(CK)或单施化肥处理(NPK)下小麦-休闲和小麦-玉米轮作方式相比,撂荒处理显著提高了0~10cm土层各测定指标的含量。不同培肥措施相比,氮磷钾配施有机肥显著提高了0~10cm、10~20cm土层SMBC、SMBN含量;NPK处理0~10cm土层SMBN含量显著增加,10~20cm土层SMBN和0~10cm、10~20cm土层SMBC含量增加但未达显著水平。不同培肥措施和种植制度对SMBC/TOC和SMBN/TN的比例无明显影响。

STUDY ON PREPARATION OF GAN AND COSI2 EPITAXIAL-FILMS BY MASS ANALYZED LOW-ENERGY DUAL ION-BEAM EPITAXY

The Mass Analyzed Low Energy Dual Ion Beam Epitaxy (MALE-DIBE) system has been designed and constructed in our laboratory. We believe that the system, which was installed and came into full operation in 1988, is the first facility of this kind. With our system we have carried out studies, for the first time, on compound synthesis of GaN and CoSi2 epitaxial thin films. RHEED and AES results show that GaN films, which were deposited on Si and sapphire substrates, are monocrystalline and of good stoichiometry. To our knowledge, GaN film heteroepitaxially grown on Si. which is more lattice-mismatched than GaN on sapphire, has not been reported before by other authors. RBS and TEM investigations indicated a rather good crystallinity of CoSi2 with a distinct interface between CoSi2 and the Si substrate. The channelling minimum yield chi(min) from the Co profile is approximately 4%. The results showed that the DIBE system with simultaneous arrival of two beams at the target is particularly useful in the formation of novel compounds at a relatively low substrate temperature.

DIRECT ION-BEAM DEPOSITION OF CARBON-FILMS ON SILICON IN THE ION ENERGY-RANGE OF 15-500 EV

Direct ion beam deposition of carbon films on silicon in the ion energy range of 15-500 eV and temperature range of 25-800-degrees-C has been studied. The work was carried out using mass-separated C+ and CH3+ ions under ultrahigh vacuum. The films were characterized with x-ray photoelectron spectroscopy, Raman spectroscopy, transmission electron microscopy, and transmission electron diffraction analysis. In the initial stage of the deposition, carbon implanted into silicon induced the formation of silicon carbide, even at room temperature. Further carbon ion bombardment then led to the formation of a carbon film. The film properties were sensitive to the deposition temperature but not to the ion energy. Films deposited at room temperature consisted mainly of amorphous carbon. Deposition at a higher temperature, or post-deposition annealing, led to the formation of microcrystalline graphite. A deposition temperature above 800-degrees-C favored the formation of microcrystalline graphite with a preferred orientation in the (0001) direction. No evidence of diamond formation in these films was observed.

CONSTRUCTION AND APPLICATIONS OF A DUAL MASS-SELECTED LOW-ENERGY ION-BEAM SYSTEM

A direct ion beam deposition system designed for heteroepitaxy at a low substrate temperature and for the growth of metastable compounds has been constructed and tested. The system consists of two mass-resolved low-energy ion beams which merge at the target with an incident energy range 50-25 000 eV. Each ion beam uses a Freeman ion source for ion production and a magnetic sector for mass filtering. While a magnetic quadrupole lens is used in one beam for ion optics, an electrostatic quadrupole lens focuses the other beam. Both focusing approaches provide a current density more than 100-mu-A/cm2, although the magnetic quadrupole gives a better performance for ion energies below 200 eV. The typical current of each beam reaches more than 0.3 mA at 100 eV, with a ribbon beam of about 0.3-0.5 x 2 cm2. The target is housed in an ultrahigh vacuum chamber with a base pressure of 1 x 10(-7) Pa and a typical pressure of 5 x 10(-6) Pa when a noncondensable beam like argon is brought into the chamber. During deposition, the target can be heated to 800-degrees-C and scanned mechanically with an electronic scanning control unit. The dual beam system has been used to grow GaN using a Ga+ and a N+ beam, and to study the oxygen and hydrogen ion beam bombardment effects during carbon ion beam deposition. The results showed that the simultaneous arrival of two beams at the target is particularly useful in compound formation and in elucidation of growth mechanisms.

Diamond growth by carbon ion implantation of diamond

Medium energy (5-25 keV) C-13(+) ion implantation into diamond (100) to a fluence ranging from 10(16) cm(-2) to 10(18) cm(-2) was performed for the study of diamond growth via the approach of ion beam implantation. The samples were characterized with Rutherford backscattering/channelling spectroscopy, Raman spectroscopy, X-ray photoemission spectroscopy and Auger electron spectroscopy. Extended defects are formed in the cascade collision volume during bombardment at high temperatures. Carbon incorporation indeed induces a volume growth but the diamond (100) samples receiving a fluence of 4 x 10(17) to 2 x 10(18) at. cm(-2) (with a dose rate of 5 x 10(15) at. cm(-2) s(-1) at 5 to 25 keV and 800 degrees C) showed no He-ion channelling. Common to these samples is that the top surface layer of a few nanometers has a substantial amount of graphite which can be removed by chemical etching. The rest of the grown layer is polycrystalline diamond with a very high density of extended defects.

Raman scattering and infrared absorption of silicon nanocrystals in silicon oxide matrix

Structural dependence on annealing of a-SiOx:H was studied by using infrared absorption and Raman scattering. The appearance of Raman peaks in the range of 513-519cm(-1) after 1170 degreesC annealing was interpreted as the formation nanocrystalline silicon with the sizes from 3-10nm. The Raman spectra also show the existence of amorphous-like silicon phase, which is associated with Si-Si bond re-construction at boundaries of silicon nanocrystallites. The presence of the shoulder at 980cm(-1) of Si-O-Si stretching vibration at 1085cm(-1) in infrared spectra imply that except that SiO2 phase, there is silicon sub-oxide phase in the films annealed at 1170 degreesC. This sub-oxide phase is located at the interface between Si crystallites and SiO2, and thus support the shell model for the mixed structures of Si grains and SiO2 matrix.