考虑激光下能级弛豫过程的调QNd：YAG速率方程理论分析

本文比较了考虑与不考虑激光下能级弛豫过程的两种形式的调Q速率方程，并以二极管激光侧面泵浦电光调QNd：YAG为例，分别采用两种形式的调Q速率方程，分析了调Q过程中上、下能级粒子数变化过程，计算了输出调Q激光脉冲波形、峰值功率以及能量，进行了比较分析，并解释了调Q“子脉冲”与拖尾现象。

Depolarization loss compensated resonator for electro-optic Q-switched solid-state laser

A novel laser resonator for compensating depolarization loss that is due to thermally induced birefringence in active rod is reported. As this new structure being applied to an electro-optic Q-switched LIDA side-pumped Nd:YAG laser operating at a repetition rate of 1000 Hz, substantial reduction in depolarization loss has been observed, the output pulse energy is improved about 56% from that of a traditional resonator without compensation structure. With incident pump energy of 450 mJ per pulse, linearly polarized output energy of 30 mJ per pulse is achieved, the pulse duration is less than 15 ns, and the peak power of pulse is about 2 MW. The extinction ratio of laser beam is better than 10:1, and the beam divergence is 1.3 mrad with beam diameter of around 2.5 mm. (c) 2006 Published by Elsevier B.V.

Numerical and experimental analysis on green laser crystallization of amorphous silicon thin films

The effect of laser fluence on the crystallization of amorphous silicon irradiated by a frequency-doubled Nd:YAG laser is studied both theoretically and experimentally. An effective numerical model is set up to predict the melting threshold and the optimized laser fluence for the crystallization of 200-nm-thick amorphous silicon. The variation of the temperature distribution with time and the melt depth is analyzed. Besides the model, the Raman spectra of thin films treated with different fluences are measured to confirm the phase transition and to determine the optimized fluence. The calculating results accord well with those obtained from the experimental data in this research. (C) 2008 Elsevier Ltd. All rights reserved.

大尺寸高浓度掺杂Nd：GGG和Nd：YAG晶体的光谱性质(英文)

由于Nd^3＋离子半径0．112nm和Y^3＋离子半径0．101nm相差10．9％，使得Nd^3＋离子非常难于进入YAG晶体中。我们用温度梯度法生长了大尺寸高浓度（2．8 at％）的Nd：YAG晶体，同时与用提拉法Nd：GGG晶体进行了比较。分析了高浓度掺杂Nd：GGG和Nd：YAG晶体浓度猝灭问题。研究了不同浓度掺杂的猝灭效应。在同样的掺杂浓度下，我们发现它们的猝灭程度不同，其原因是两种晶体中△Emism（-）和（＋） △Emism（＋） 不同。

国产Nd：YAG陶瓷获得激光输出

近年来Nd：YAG多晶陶瓷作为激光介质得到了越来越多的重视，我国在这个方向也开展了大量的研究工作，Nd：YAG多晶陶瓷与Nd：YAG单晶相比有很多优点：容易制造、成本低、可以制造大尺寸和高掺杂浓度的材料，且无浓度梯度，机械特性良好，硬度比单晶大1．5倍，断裂韧度比单晶大5倍，并且可制备多层和多功能的陶瓷结构、可大批量生产，已经获得了比Nd：YAG单晶更高的效率，因此钇铝石榴石透明陶瓷是理想的钇铝石榴石单晶激光介质材料替代品。但国产陶瓷由于质量不佳，透明度不是很高，一直未能获得激光输出。

Deposition of Au/TiO2 film by pulsed laser

Au nanoparticles, which were photoreduced by a Nd:YAG laser in HAuCl4 solution containing TiO2 colloid and accompanied by the TiO2 particles, were deposited on the substrate surface. The film consisting of Au/TiO2 particles was characterized by the absorption spectra, scanning electron microscopy (SEM) and X-ray diffraction (XRD) analysis. The adhesion between the film and substrate was evaluated by using adhesive tape test. It was found that the presence of TiO2 dramatically enhanced the adhesion strength between the film and the substrate, as well as the deposition rate of film. The mechanism for the deposition of Au/TiO2 film was also discussed. (c) 2005 Elsevier B.V. All rights reserved.

Nd：YAG透明陶瓷的烧成及其显微结构

由溶胶一凝胶／燃烧合成结合法合成了Nd：YAG(掺钕钇铝石榴石，neodymium—doped yttrium aluminium garnet)粉体，用真空烧结法制备了Nd：YAG透明陶瓷。研究了显微结构随烧结温度和保温时间的变化，并对透明陶瓷的晶界结构和成分分布进行了表征。随着烧结温度的提高和保温时间的延长，Nd：YAG陶瓷的密度增大，晶形发育完整，透过率提高。晶粒内部和晶界的化学组成基本相同。所制备的Nd：YAG透明陶瓷在激光工作波长1064nm的透过率达到75％。

Optimization of thermal environment during crystal growth of large-sized Nd : YAG by Temperature Gradient Technique

A finite-element model is employed to analysis the thermal environments in Temperature Gradient Technique (TGT) furnace during the growth of large-sized Nd:YAG crystal. The obtained results show that when the crucible is located at the lower position inside of the heater, a flatter solid-liquid interface is established, which makes it easier to obtain the core-free Nd:YAG crystal. Meanwhile, the lower crucible position can induce higher axial temperature gradient, which is beneficial to the release of latent heat. (c) 2007 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

温度梯度法生长Nd：YAG激光晶体的核心分布

用温度梯度法生长了直径为75mm大尺寸的Nd：YAG激光晶体，通过退火排除了生长过程中进入晶体的碳原子．用正交偏光显微镜观察了晶体的核心分布以及生长条纹．测试了室温下的吸收谱并利用吸收谱研究了Nd离子在YAG晶体中的分布．比较了温度梯度法与提拉法生长晶体的区别．

Stress, absorptance and laser-induced damage threshold properties of 355-nm HR coatings

A number of 355-nm Al2O3/MgF2 high-reflectance (HR) coatings were prepared by electron-beam evaporation. The influences of the number of coating layers and deposition temperature on the 355-nm Al2O3/MgF2 HR coatings were investigated. The stress was measured by viewing the substrate deformation before and after coating deposition using an optical interferometer. The laser-induced damage threshold (LIDT) of the samples was measured by a 355-nm Nd:YAG laser with a pulse width of 8 ns. Transmittance and reflectance of the samples were measured by a Lambda 900 spectrometer. It was found that absorptance was the main reason to result in a low LIDT of 355-nm Al2O3/MgF2 HR coatings. The stress in Al2O3/MgF2 HR coatings played an unimportant role in the LIDT, although MgF2 is known to have high tensile stress.

Overcoat dependence of laser-induced damage threshold of 355 nm HR coatings

A series of HR coatings, with and without overcoat, were prepared by electron beam evaporation using the same deposition process. The laser-induced damage threshold (LIDT) was measured by a 355 nm Nd:YAG laser with a pulse width of 8 ns. Damage morphologies of samples were observed by Leica-DMRXE Microscope. The stress was measured by viewing the substrate deformation before and after coatings deposition using an optical interferometer. Reflectance of the samples was measured by Lambda 900 Spectrometer. The theoretical results of electric field distributions of the samples were calculate by thin film design software (TFCalc). It was found that SiO2 overcoat had improved the LIDT greatly, while MgF2 overcoat had little effect on the LIDT because of its high stress in the HR coatings. The damage morphologies were different among HR coatings with and without overcoats. (c) 2005 Elsevier B.V. All rights reserved.

单晶硅材料的1064nmNd：YAG脉冲激光损伤特性研究

作为微电子和光电子系统中普遍使用的一种结构材料，单晶硅一直是人们研究的焦点。长期以来，人们对其电学性质进行了非常深入细致的研究，却疏于对其抗击强激光辐照特性的研究。随着激光通讯和光电对抗技术的发展，对光学材料的激光破坏特性和加固技术进行研究的需求也显得越来越迫切。本文主要对单晶硅的抗激光损伤特性进行研究，研究了单晶硅材料在1064nmNd：YAG激光自由脉冲输出模式和单脉冲输出模式作用下的损伤特性，通过对两种激光作用下单晶硅损伤形貌的分析，在热效应与热力耦合模型的基础上，对单晶硅的激光损伤机制进行了探索。

Influence of SiO2 additional layers on the laser induced damage threshold of Ta2O5 films

A series or Ta2O5 films with different SiO2 additional layers including overcoat, undercoat and interlayer was prepared by electron beam evaporation under the same deposition process. Absorption of samples was measured using the surface thermal lensing (STL) technique. The electric field distributions of the samples were theoretical predicted using thin film design software (TFCalc). The laser induced damage threshold (LIDT) was assessed using an Nd:YAG laser operating at 1064 nm with a pulse length of 12 ns. It was found that SiO2 additional layers resulted in a slight increase of the absorption, whereas they exerted little influence on the microdefects. The electric field distribution among the samples was unchanged by adding an SiO2 overcoat and undercoat, yet was changed by adding an interlayer. SiO2 undercoat. The interlayer improved the LIDT greatly, whereas the SiO2 overcoat had little effect on the LIDT. (C) 2007 Elsevier Ltd. All rights reserved.