Step and flash imprint lithography: Fabrication of patterned media for extremely high density magnetic data storage devices

Currently the data storage industry is facing huge challenges with respect to the conventional method of recording data known as longitudinal magnetic recording. This technology is fast approaching a fundamental physical limit, known as the superparamagnetic limit. A unique way of deferring the superparamagnetic limit incorporates the patterning of magnetic media. This method exploits the use of lithography tools to predetermine the areal density. Various nanofabrication schemes are employed to pattern the magnetic material are Focus Ion Beam (FIB), E-beam Lithography (EBL), UV-Optical Lithography (UVL), Self-assembled Media Synthesis and Nanoimprint Lithography (NIL). Although there are many challenges to manufacturing patterned media, the large potential gains offered in terms of areal density make it one of the most promising new technologies on the horizon for future hard disk drives. Thus, this dissertation contributes to the development of future alternative data storage devices and deferring the superparamagnetic limit by designing and characterizing patterned magnetic media using a novel nanoimprint replication process called "Step and Flash Imprint lithography". As opposed to hot embossing and other high temperature-low pressure processes, SFIL can be performed at low pressure and room temperature. Initial experiments carried out, consisted of process flow design for the patterned structures on sputtered Ni-Fe thin films. The main one being the defectivity analysis for the SFIL process conducted by fabricating and testing devices of varying feature sizes (50 nm to 1 μm) and inspecting them optically as well as testing them electrically. Once the SFIL process was optimized, a number of Ni-Fe coated wafers were imprinted with a template having the patterned topography. A minimum feature size of 40 nm was obtained with varying pitch (1:1, 1:1.5, 1:2, and 1:3). The Characterization steps involved extensive SEM study at each processing step as well as Atomic Force Microscopy (AFM) and Magnetic Force Microscopy (MFM) analysis.

Jet and flash imprint defectivity - Assessment and reduction for semiconductor applications

Defectivity has been historically identified as a leading technical roadblock to the implementation of nanoimprint lithography for semiconductor high volume manufacturing. The lack of confidence in nanoimprint's ability to meet defect requirements originates in part from the industry's past experiences with 1 × lithography and the shortage in enduser generated defect data. SEMATECH has therefore initiated a defect assessment aimed at addressing these concerns. The goal is to determine whether nanoimprint, specifically Jet and Flash Imprint Lithography from Molecular Imprints, is capable of meeting semiconductor industry defect requirements. At this time, several cycles of learning have been completed in SEMATECH's defect assessment, with promising results. J-FIL process random defectivity of < 0.1 def/cm2 has been demonstrated using a 120nm half-pitch template, providing proof of concept that a low defect nanoimprint process is possible. Template defectivity has also improved significantly as shown by a pre-production grade template at 80nm pitch. Cycles of learning continue on feature sizes down to 22nm. © 2011 SPIE.

Integration of room temperature single electron transistor with CMOS subsystem

The single electron transistor (SET) is a charge-based device that may complement the dominant metal-oxide-semiconductor field effect transistor (MOSFET) technology. As the cost of scaling MOSFET to smaller dimensions are rising and the the basic functionality of MOSFET is encountering numerous challenges at dimensions smaller than 10nm, the SET has shown the potential to become the next generation device which operates based on the tunneling of electrons. Since the electron transfer mechanism of a SET device is based on the non-dissipative electron tunneling effect, the power consumption of a SET device is extremely low, estimated to be on the order of 10^-18J. The objectives of this research are to demonstrate technologies that would enable the mass produce of SET devices that are operational at room temperature and to integrate these devices on top of an active complementary-MOSFET (CMOS) substrate. To achieve these goals, two fabrication techniques are considered in this work. The Focus Ion Beam (FIB) technique is used to fabricate the islands and the tunnel junctions of the SET device. A Ultra-Violet (UV) light based Nano-Imprint Lithography (NIL) call Step-and-Flash- Imprint Lithography (SFIL) is used to fabricate the interconnections of the SET devices. Combining these two techniques, a full array of SET devices are fabricated on a planar substrate. Test and characterization of the SET devices has shown consistent Coulomb blockade effect, an important single electron characteristic. To realize a room temperature operational SET device that function as a logic device to work along CMOS, it is important to know the device behavior at different temperatures. Based on the theory developed for a single island SET device, a thermal analysis is carried out on the multi-island SET device and the observation of changes in Coulomb blockade effect is presented. The results show that the multi-island SET device operation highly depends on temperature. The important parameters that determine the SET operation is the effective capacitance Ceff and tunneling resistance Rt . These two parameters lead to the tunneling rate of an electron in the SET device, Γ. To obtain an accurate model for SET operation, the effects of the deviation in dimensions, the trap states in the insulation, and the background charge effect have to be taken into consideration. The theoretical and experimental evidence for these non-ideal effects are presented in this work.

Thermal Degradation Processes in Poly(xylylene sulfides) Investigated by Comparative Direct Pyrolysis MS and Flash Pyrolysis GC/MS Experiments

The thermal degradation processes of two sulfur polymers, poly(xylylene sulfide) (PXM) and poly(xylylene disulfide) (PXD), were investigated in parallel by direct pyrolysis mass spectrometry (DPMS) and flash pyrolysis GC/MS (Py-GC/MS). Thermogravimetric data showed that these polymers decompose with two separate steps in the temperature ranges of 250-280 and 600-650 degrees C, leaving a high amount of residue (about 50% at 800 degrees C). The pyrolysis products detected by DPMS in the first degradation step of PXM and PXD were terminated by three types of end groups, -CH3, -CH2SH, and -CH=S, originating from thermal cleavage reactions involving a series of homolytic chain scissions followed by hydrogen transfer reactions, generating several oligomers containing some intact xylylene sulfide repeating units. The presence of pyrolysis compounds containing some stilbene-like units in the first degradation step has also been observed. Their formation has been accounted for with a parallel cleavage involving the elimination of H2S from the PXM main chains. These unsaturated units can undergo cross-linking at higher temperatures, producing the high amount of char residue observed. The thermal degradation compounds detected by DPMS in the second decomposition step at about 600-650 degrees C were constituted of condensed aromatic molecules containing dihydrofenanthrene and fenanthrene units. These compounds might be generated from the polymer chains containing stilbene units, by isomerization and dehydrogenation reactions. The pyrolysis products obtained in the Py-GC/MS of PXM and PXD at 610 degrees C are almost identical. The relative abundance in the pyrolysate and the spectral properties of the main pyrolysis products were found to be in generally good agreement with those obtained by DPMS. Polycyclic aromatic hydrocarbons (PAHs) were also detected by Py-GC/MS but in minor amounts with respect to DPMS. This apparent discrepancy was due to the simultaneous detection of PAHs together with all pyrolysis products in the Py-GC/MS, whereas in DPMS they were detected in the second thermal degradation step without the greatest part of pyrolysis compounds generated in the first degradation step. The results obtained by DPMS and PSI-GC/MS experiments showed complementary data for the degradation of PXM and PXD and, therefore, allowed the unequivocal formulation of the thermal degradation mechanism for these sulfur-containing polymers.

Substrate Conformal Imprint Lithography als innovatives Verfahren zur Herstellung von Nanospektrometern im sichtbaren Spektralbereich

Selbstbestimmung und -gestaltung des eigenen Alltages gewinnen immer mehr an Bedeutung, insbesondere für ältere Mitmenschen in ländlichen Regionen, die auf ärztliche Versorgung angewiesen sind. Die Schaffung sogenannter smart personal environments mittels einer Vielzahl von, nahezu unsichtbar installierten Sensoren im gewohnten Lebensraum liefert dem Anwender (lebens-) notwendige Informationen über seine Umgebung oder seinen eigenen Körper. Dabei gilt es nicht den Anwender mit technischen Daten, wie Spektren, zu überfordern. Vielmehr sollte die Handhabung so einfach wie möglich gestaltet werden und die ausgewertete Information als Indikationsmittel zum weiteren Handeln dienen. Die Anforderungen an moderne Technologien sind folglich eine starke Miniaturisierung, zur optimalen Integration und Mobilität, bei gleichzeitig hoher Auflösung und Stabilität. Die Zielsetzung der vorliegenden Arbeit ist die Miniaturisierung eines spektroskopischen Systems bei gleichzeitig hohem Auflösungsvermögen für die Detektion im sichtbaren Spektralbereich. Eine Möglichkeit für die Herstellung eines konkurrenzfähigen „Mini-„ oder „Mikrospektrometers“ basiert auf Fabry-Pérot (FP) Filtersystemen, da hierbei die Miniaturisierung nicht wie üblich auf Gittersysteme limitiert ist. Der maßgebliche Faktor für das spektrale Auflösungsvermögen des Spektrometers ist die vertikale Präzision und Homogenität der einzelnen 3D Filterkavitäten, die die unterschiedlichen Transmissionswellenlängen der einzelnen Filter festlegen. Die wirtschaftliche Konkurrenzfähigkeit des am INA entwickelten Nanospektremeters wurde durch die maximale Reduzierung der Prozessschritte, nämlich auf einen einzigen Schritt, erreicht. Erstmalig wird eine neuartige Nanoimprint Technologie, die sog. Substrate Conformal Imprint Lithography, für die Herstellung von wellenlängen-selektierenden Filterkavitäten von stark miniaturisierten Spektrometern eingesetzt. Im Zuge dieser Arbeit wird das Design des FP Filtersystems entwickelt und technologisch mittels Dünnschichtdeposition und der Nanoimprinttechnologie realisiert. Ein besonderer Schwerpunkt liegt hierbei in der Untersuchung des Prägematerials, dessen optische Eigenschaften maßgeblich über die Performance des Filtersystems entscheiden. Mit Hilfe eines speziell gefertigten Mikroskopspektrometers werden die gefertigten Filterfelder hinsichtlich ihrer Transmissionseigenschaften und ihres Auflösungsvermögens hin untersucht. Im Hinblick auf publizierte Arbeiten konkurrierender Arbeitsgruppen konnte eine deutliche Verbesserung des miniaturisierten Spektrometers erreicht werden. Die Minimierung der Prozessschritte auf einen einzigen Prägeschritt sorgt gleichzeitig für eine schnelle und zuverlässige Replikation der wellenlängenselektierenden Filterkavitäten. Im Rahmen dieser Arbeit wurde aufgezeigt, dass das angestrebte Nanospektrometer, trotz der sehr geringen Größe, eine hohe Auflösung liefern kann und gerade wegen der starken Miniaturisierung mit kommerziellen Mini- und Mikro-spektrometern konkurrenzfähig ist.

Detecting distributed Denial-of-Service attacks and Flash Events

This thesis investigates and develops techniques for accurately detecting Internet-based Distributed Denial-of-Service (DDoS) Attacks where an adversary harnesses the power of thousands of compromised machines to disrupt the normal operations of a Web-service provider, resulting in significant down-time and financial losses. This thesis also develops methods to differentiate these attacks from similar-looking benign surges in web-traffic known as Flash Events (FEs). This thesis also addresses an intrinsic challenge in research associated with DDoS attacks, namely, the extreme scarcity of public domain datasets (due to legal and privacy issues) by developing techniques to realistically emulate DDoS attack and FE traffic.

A framework for generating realistic traffic for distributed denial-of-service attacks and flash events

An intrinsic challenge associated with evaluating proposed techniques for detecting Distributed Denial-of-Service (DDoS) attacks and distinguishing them from Flash Events (FEs) is the extreme scarcity of publicly available real-word traffic traces. Those available are either heavily anonymised or too old to accurately reflect the current trends in DDoS attacks and FEs. This paper proposes a traffic generation and testbed framework for synthetically generating different types of realistic DDoS attacks, FEs and other benign traffic traces, and monitoring their effects on the target. Using only modest hardware resources, the proposed framework, consisting of a customised software traffic generator, ‘Botloader’, is capable of generating a configurable mix of two-way traffic, for emulating either large-scale DDoS attacks, FEs or benign traffic traces that are experimentally reproducible. Botloader uses IP-aliasing, a well-known technique available on most computing platforms, to create thousands of interactive UDP/TCP endpoints on a single computer, each bound to a unique IP-address, to emulate large numbers of simultaneous attackers or benign clients.

Thermal degradation products of poly(styrenesulfides) investigated by direct pyrolysis�mass spectrometry and flash pyrolysis�gas chromatography/mass spectrometry

The thermal degradation products of two sulfur polymers, poly(styrenedisulfide) (PSD) and poly(styrenetetrasulfide) (PST), were investigated in parallel by direct pyrolysis-mass spectrometry (DPMS) and by flash pyrolysis-GC/MS (Py-GC/MS). The time-scale of the two pyrolysis techniques is quite different, and therefore they were able to detect significantly different products in the pyrolysis of PSD and PST because of the thermal lability of sulfur-containing compounds. However, the results obtained are not contradictory, and satisfactory mechanisms for the thermal degradation of PSD and PST have been derived from the overall evidence available. Pyrolysis compounds containing sulfur, styrene, and a number of cyclic styrene sulfides and diphenyldithianes have been observed by DPMS. However, in flash pyrolysis-GC/MS, styrene, sulfur, only one cyclic styrene sulfide, and two isomers of diphenylthiophene have been detected. These thiophene derivatives were indeed absent among the compounds obtained by DPMS because they were the terminal (most thermally stable) species arising from further decomposition of the cyclic styrene sulfides formed in the primary thermal degradation processes of PSD and PST.

Thermal degradation processes in polysulfide copolymers investigated by direct pyrolysis mass spectrometry and flash pyrolysis-gas chromatography/mass spectrometry

This is the first report on the analysis of random block polysulfide copolymers containing different amounts of repeating units in the copolymer backbone, which has been studied by direct pyrolysis mass spectrometry (DPMS) and by pyrolysis-gas chromatography/mass spectrometry (Py-GC/MS). The homopolymers such as poly(ethylene sulfide) (PES), poly(styrene sulfide) (PSS), and two random copolymers, viz., poly(ethylene sulfide(x)-co-styrene sulfide(y)) [copolymer I (x = y = 0.5) and copolymer II (x = 0.74, y = 0.26)] were investigated by both DPMS and Py-GC/MS (except copolymer II) techniques. In the case of copolymer I, the thermal degradation products of SE1, SE2, S-2, and S2E (S = styrene sulfide, E = ethylene sulfide) were detected in DPMS, whereas the formation of SE1 and SE2 were observed by Py-GC/MS technique. However, for copolymer II, SE3 was also found along with SE1, SE2, S-2, and S2E in DPMS. The formation of additional product (SE3) observed in copolymer II could be due to an increase in the block length formed during copolymerization. Further, a comparative study on thermal degradation of PES, poly(ethylene disulfide) (PEDS), and poly(ethylene tetrasulfide) (PETS) were investigated by Py-GC/MS. The pyrolysis products detected by both DPMS and Py-GC/MS indicates that the thermal decomposition of these polymers yield cyclic sulfides through an intramolecular exchange or by backbiting processes. The linear products with thiol and vinyl groups were also observed by Py-GC/MS along with the cyclic products via carbon hydrogen transfer reaction.

Improvement in clinical step and shoot intensity modulated radiation therapy delivery accuracy on an integrated linear accelerator control system

Purpose: The dose delivery accuracy of 30 clinical step and shoot intensity modulated radiation therapy plans was investigated using the single integrated multileaf collimator controller of the Varian Truebeam linear accelerator (linac) (Varian Medical Systems, Palo Alto, CA) and compared with the dose delivery accuracy on a previous generation Varian 2100CD C-Series linac.

Methods and Materials: Ten prostate, 10 prostate and pelvic node, and 10 head-and-neck cases were investigated in this study. Dose delivery accuracy on each linac was assessed using Farmer ionization chamber point dose measurements, 2-dimensional planar ionization chamber array measurements, and the corresponding Varian dynamic log files. Absolute point dose measurements, fluence delivery accuracy, leaf position accuracy, and the overshoot effect were assessed for each plan.

Results: Absolute point dose delivery accuracy increased by 1.5% on the Truebeam compared with the 2100CD linac. No improvement in fluence delivery accuracy between the linacs, at a gamma criterion of 3%/3 mm was measured using the 2-dimensional ionization chamber array, with median (interquartile range) gamma passing rates of 98.99% (97.70%-99.72%) and 99.28% (98.26%-99.75%) for the Truebeam and 2100CD linacs, respectively. Varian log files also showed no improvement in fluence delivery between the linacs at 3%/3 mm, with median gamma passing rates of 99.97% (99.93%-99.99%) and 99.98% (99.94%-100%) for the Truebeam and 2100CD linacs, respectively. However, log files revealed improved leaf position accuracy and fluence delivery at 1%/1 mm criterion on the Truebeam (99.87%; 99.78%-99.94%) compared with the 2100CD linac (97.87%; 91.93%-99.49%). The overshoot effect, characterized on the 2100CD linac, was not observed on the Truebeam.

Conclusions: The integrated multileaf collimator controller on the Varian Truebeam improves clinical treatment delivery accuracy of step and shoot intensity modulated radiation therapy fields compared with delivery on a Varian C-series linac. © 2014.

Timing and climatic imprint of Greenland interstadials recorded in stalagmites from Northern Turkey

A 50 kyr-long exceptionally well-dated and highly resolved stalagmite oxygen (δ 18O) and carbon (δ 13C) isotope record from Sofular Cave in northwestern Turkey helps to further improve the dating of Greenland Interstadials (GI) 1, and 3–12. Timing of most GI in the Sofular record is consistent within ±10 to 300 years with the “iconic” Hulu Cave record. Larger divergences (>500 years) between Sofular and Hulu are only observed for GI 4 and 7. The Sofular record differs from the most recent NGRIP chronology by up to several centuries, whereas age offsets do not increase systematically with depth. The Sofular record also reveals a rapid and sensitive climate and ecosystem response in the eastern Mediterranean to GI, whereas a phase lag of ∼100 years between climate and full ecosystem response is evident. Finally, results of spectral analyses of the Sofular isotope records do not support a 1,470-year pacing of GI.

Resin tag length of one-step and self-etching adhesives bonded to unground enamel

Length of resin tags yielded by utilization of an one-step conventional adhesive system and self-etching adhesive system on unground enamel was observed. In study Groups I and III, the enamel surface was etched for 60 seconds with 35% phosphoric acid gel and adhesive systems PQ1 (Ultradent Products, Inc) and Adper Prompt L Pop (3M/ESPE) were applied. Adper Prompt L Pop (3M/ESPE) was also applied in Group II in accordance with the manufacturer's recommendations. After application of these adhesive systems to dental enamel, specimens were prepared for light microscopy analysis to ascertain degree of penetration (x400). The results were submitted to an analysis of variance at the 5% level; whenever there was significance, the Tukey test was applied at the 5% level. It was found that acid etching prior to application of conventional and self-etching adhesive materials provided higher penetration of the adhesive into the unground enamel surface compared to that achieved solely by application of self-etching adhesive.