1 resultado para Block perturbations

em Digital Commons - Montana Tech


Relevância:

20.00% 20.00%

Publicador:

Resumo:

The integration of block-copolymers and nanoimprint lithography presents a novel and cost-effective approach to achieving nanoscale patterning capabilities. The authors demonstrate the fabrication of a surface-enhanced Raman scattering device using templates created by the block-copolymers nanoimprint lithography integrated method.