Nanofabrication of Surface-Enhanced Raman Scattering Device by an Integrated Block-Copolymer and Nanoimprint Lithography Method
| Data(s) |
01/12/2010
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|---|---|
| Resumo |
The integration of block-copolymers and nanoimprint lithography presents a novel and cost-effective approach to achieving nanoscale patterning capabilities. The authors demonstrate the fabrication of a surface-enhanced Raman scattering device using templates created by the block-copolymers nanoimprint lithography integrated method. |
| Formato |
application/pdf |
| Identificador |
http://digitalcommons.mtech.edu/gen_engr/4 http://digitalcommons.mtech.edu/cgi/viewcontent.cgi?article=1005&context=gen_engr |
| Publicador |
Digital Commons @ Montana Tech |
| Fonte |
General Engineering |
| Palavras-Chave | #Raman scattering device #block-copolymers (BCPs) #nanoimprint lithography (NIL) #Si #Cr #R6G #Nanotechnology Fabrication |
| Tipo |
text |
