3 resultados para Argon gas
em Universidade Federal do Rio Grande do Norte(UFRN)
Resumo:
The technique of surface coating using magnetron sputtering is one of the most widely used in the surface engineering, for its versatility in obtaining different films as well as in the micro / nanometric thickness control. Among the various process parameters, those related to the active species of the plasma are of the most fundamental importance in the mechanism and kinetics of deposition. In order to identify the active species of the plasma, parameters such as gas flow, pressure and density of electric power were varied during titanium coating on glass substrate. By flowing argon gas of 10, 20, 30, 40 and 50 sccm (cubic centimeters per minute) for each gas flow a sequential scan of the electric current of 0.10, 0.20, 0.30, 0.40 , 0.50 A. The maximum value of 0.50 A was chosen based both on literature data and on limitations of the equipment. The monitoring of plasma species present during the deposition was carried out in situ by the technique of optical emission spectroscopy (OES) through the spectrometer Ocean Optics USB2000 Series. For this purpose, an apparatus was developed to adapt the OES inside the plasma reactor to stay positioned closest to the target. The radiations emitted by the species were detected by an optical fiber placed behind the glass substrate and their intensities as a function of wavelength were, displayed on a monitor screen. The acquisition time for each condition of the plain parameters was related to the minima of spectral lines intensities due to the film formed on the substrate. The intensities of different emission lines of argon and titanium were then analyzed as a function of time, to determine the active species and estimate the thickness of the deposited films. After the deposition, the coated glasses thin films were characterized by optical transmittance through an infrared laser. It was found that the thickness and deposition rate determined by in situ analysis were consistent with the results obtained by laser transmittance
Resumo:
The nanometric powders have special features that usually result in new properties, originating applications or expanding them in various fields of knowledge. Because having a high area/volume ratio, phenomena such as superficial strength of adsorption becomes greater than the weight of the powder which makes more difficult its handling. The high power of agglomeration of these powders requires study and development of equipments to enable its management into the plasma torch. The objective of this work is to develop a powder feeder which can solve the mainly problems about insertion of powder into the thermal spray developed in the laboratory of plasmas, which are carried out with plasma torch arc not transferred (plasma spray). Therefore, it was made a aluminum s powder feeder and tests were performed to verify their operation and determine its rate of deposition by spraying powders of niobium pentoxide (Nb2O5) and titanium dioxide (TiO2) with particle sizes less than 250 mesh (<0.063 mm). We used masses of 0.5 g - 1.0 g and 1.5 g of each powder in tests lasting 15 seconds - 20 to 25 seconds for each mass. The tests were performed in two ways: at atmospheric pressure using argon gas with a flow of 9 l / min as carrier gas and through a Venturi pipe also using argon gas with a flow of 9 l / min as carrier gas and with a flow of 20 l/min as the feed gas passing through the Venturi pipe. The powder feeder developed in this paper is very easy to be handling and building, resulting in feeding rate of 0.25 cm3/min - 1.37 cm3/min. The TiO2 showed higher feeding rates than the Nb2O5 in all tests, and the best rates were obtained with tests using mass 1.5 g and time of 15 seconds, reaching feeding rate of 1.37 cm3/min. The flow of feed had low interference in feeding rate during the tests
Resumo:
The technique of surface coating using magnetron sputtering is one of the most widely used in the surface engineering, for its versatility in obtaining different films as well as in the micro / nanometric thickness control. Among the various process parameters, those related to the active species of the plasma are of the most fundamental importance in the mechanism and kinetics of deposition. In order to identify the active species of the plasma, parameters such as gas flow, pressure and density of electric power were varied during titanium coating on glass substrate. By flowing argon gas of 10, 20, 30, 40 and 50 sccm (cubic centimeters per minute) for each gas flow a sequential scan of the electric current of 0.10, 0.20, 0.30, 0.40 , 0.50 A. The maximum value of 0.50 A was chosen based both on literature data and on limitations of the equipment. The monitoring of plasma species present during the deposition was carried out in situ by the technique of optical emission spectroscopy (OES) through the spectrometer Ocean Optics USB2000 Series. For this purpose, an apparatus was developed to adapt the OES inside the plasma reactor to stay positioned closest to the target. The radiations emitted by the species were detected by an optical fiber placed behind the glass substrate and their intensities as a function of wavelength were, displayed on a monitor screen. The acquisition time for each condition of the plain parameters was related to the minima of spectral lines intensities due to the film formed on the substrate. The intensities of different emission lines of argon and titanium were then analyzed as a function of time, to determine the active species and estimate the thickness of the deposited films. After the deposition, the coated glasses thin films were characterized by optical transmittance through an infrared laser. It was found that the thickness and deposition rate determined by in situ analysis were consistent with the results obtained by laser transmittance
