52 resultados para Raman,
Resumo:
En este trabajo se estudia la preparació n y caracterizació n de las fases de los cristales mixtos de f órmula Li(NH4)1-xKxSO4. La caracterizacói n se ha efectuado por aná lisis té rmico con DSC y ATD, difracci ón de rayos-X sobre polvo cristalino con temperatura variable, difracci n de rayos-X sobre muestra monocristalina a temperatura variable a fin de determina su estructura cristalina y por espectroscop"a Raman a temperatura variable. Se han obtenido dos tipos de fases. Una soluci n s lida con 0.94 < x < 1 que presenta los mismos tipos estructurales que el LiKSO4, pero seg n el m todo de cristalizaci n pueden aparecer nuevas fases que no presenta el LiKSO4. El segundo tipo de compuesto tiene por f rmula Li(NH4)0.53K0.47SO4, el cual presenta una estructura hexagonal con par metro a » 3 aLiKSO4. Este compuesto tiene por encima de la temperatura ambiente una sola transici n a 463K.
Resumo:
A thorough critical analysis of the theoretical relationships between the bond-angle dispersion in a-Si, Δθ, and the width of the transverse optical Raman peak, Γ, is presented. It is shown that the discrepancies between them are drastically reduced when unified definitions for Δθ and Γ are used. This reduced dispersion in the predicted values of Δθ together with the broad agreement with the scarce direct determinations of Δθ is then used to analyze the strain energy in partially relaxed pure a-Si. It is concluded that defect annihilation does not contribute appreciably to the reduction of the a-Si energy during structural relaxation. In contrast, it can account for half of the crystallization energy, which can be as low as 7 kJ/mol in defect-free a-Si
Resumo:
En un món on el ritme de la societat actual ens ha portat a considerar les energies enovables com a prioritat vital i necessària i en el que es preveu que la demanda energètica augmenti un 50% fins al 2030, l'interès en la recerca de materials emiconductors orgànics per aplicacions de captura solar, ha assolit un potencial enorme de cara al futur. Molts són el avantatges que presenten aquest tipus de materials en front als seus homòlegs inorgànics. La facilitat de fabricació, la utilització de materials més econòmics i amb menys impacte ambiental, així com la possibilitat de produir dispositius flexibles, són algunes de les atractives aracterístiques que presenten aquests materials. No obstant, certs inconvenients om les baixes eficiències energètiques dels dispositius, i la inestabilitat ambiental ue es tradueix en un temps de vida molt reduït, fan que encara s'hagi d'invertir sforç per aconseguir que aquests materials puguin ser utilitzats en el camp de la aptura d'energia solar. El material més prometedor fins a data d'avui és el P3HT:PCBM. Es tracta d'un sistema polímer:molècula lleugera, on el P3HT actua com a component donador del sistema i el PCBM actua com a component acceptor. Les propietats optoelectròniques i eficiències energètiques de combinats orgànics P3HT:PCBM epèn en gran mesura de la seva morfologia i microestructura. Paràmetres com la proporció entre els components, el dissolvent utilitzat en la dissolució, així com 'aplicació de determinats tractaments tèrmics afecten de forma crítica a la seva orfologia. Durant el present treball s'han utilitzat diverses tècniques de caracterització per a estudiar determinades propietats que presenten aquest tipus de aterials. Entre les tècniques experimentals utilitzades hi trobem la microscòpia FM, l'espectroscòpia Raman i la conductimetria AFM o current sensing AFM CS-AFM). Els experiments en temps real durant l'escalfament de capes primes 3HT:PCBM, mostren que el P3HT pateix una cristal·lització al voltant dels 140ºC, permetent el reordenament de les molècules i un millor solapament del sorbitals [pi]-[pi]*, que resulta en un increment del transport de forats a través de la fase donadora del material. Paralel·lament, entre els 80-120ºC, el material també presenta determinats canvis tant en el comportament dels enllaços, com en la cristal·linitat del material, provocant una quasi transició de fase que atribuïm a la transició vitrea del material. Per altra banda, experiments amb conductimetria AFM realitzats en sistemes P3HT:HDPE mostren un signicatiu augment en la eva estabilitat ambiental, que es tradueix en un augment del temps de vida, sense una pèrdua considerable en els seus valors de conducció. Tot i la combinació del P3HT amb proporcions de polímers aïllants de fins al 80%, el sistema és capaç de no perdre la capacitat de transport gràcies a la formació de fases i dominis rics en P3HT. El present treball posa de manifest que ens trobem davant d'una tecnologia emergent i que nous estudis i esforços en la recerca d'aquest tipus materials és fonamental per aconseguir nous resultats i posicionar als materials semiconductors orgànics com una alternativa viable en el camp dels dispositus fotovoltaics. Assumint dades procedents de la tecnologia actual utilitzada en aquest tipus de materials, estudis i avaluacions ambientals i econòmiques mostren que petits increments tant en les eficiències com en el temps de vida de dispositius basats en aterials orgànics, posicionarien a aquest material com a alternativa totalment viable en el mercat fotovoltaic d'un futur proper.
Resumo:
We report on the study and modeling of the structural and optical properties of rib-loaded waveguides working in the 600-900-nm spectral range. A Si nanocrystal (Si-nc) rich SiO2 layer with nominal Si excess ranging from 10% to 20% was produced by quadrupole ion implantation of Si into thermal SiO2 formed on a silicon substrate. Si-ncs were precipitated by annealing at 1100°C, forming a 0.4-um-thick core layer in the waveguide. The Si content, the Si-nc density and size, the Si-nc emission, and the active layer effective refractive index were determined by dedicated experiments using x-ray photoelectron spectroscopy, Raman spectroscopy, energy-filtered transmission electron microscopy, photoluminescence and m-lines spectroscopy. Rib-loaded waveguides were fabricated by photolithographic and reactive ion etching processes, with patterned rib widths ranging from 1¿to¿8¿¿m. Light propagation in the waveguide was observed and losses of 11dB/cm at 633 and 780 nm were measured, modeled and interpreted.
Resumo:
We have studied the effects of rapid thermal annealing at 1300¿°C on GaN epilayers grown on AlN buffered Si(111) and on sapphire substrates. After annealing, the epilayers grown on Si display visible alterations with craterlike morphology scattered over the surface. The annealed GaN/Si layers were characterized by a range of experimental techniques: scanning electron microscopy, optical confocal imaging, energy dispersive x-ray microanalysis, Raman scattering, and cathodoluminescence. A substantial Si migration to the GaN epilayer was observed in the crater regions, where decomposition of GaN and formation of Si3N4 crystallites as well as metallic Ga droplets and Si nanocrystals have occurred. The average diameter of the Si nanocrystals was estimated from Raman scattering to be around 3¿nm. Such annealing effects, which are not observed in GaN grown on sapphire, are a significant issue for applications of GaN grown on Si(111) substrates when subsequent high-temperature processing is required.
Resumo:
This paper reports the microstructural analysis of S-rich CuIn(S,Se)2 layers produced by electrodeposition of CuInSe2 precursors and annealing under sulfurizing conditions as a function of the temperature of sulfurization. The characterization of the layers by Raman scattering, scanning electron microscopy, Auger electron spectroscopy, and XRD techniques has allowed observation of the strong dependence of the crystalline quality of these layers on the sulfurization temperature: Higher sulfurization temperatures lead to films with improved crystallinity, larger average grain size, and lower density of structural defects. However, it also favors the formation of a thicker MoS2 interphase layer between the CuInS2 absorber layer and the Mo back contact. Decreasing the temperature of sulfurization leads to a significant decrease in the thickness of this intermediate layer and is also accompanied by significant changes in the composition of the interface region between the absorber and the MoS2 layer, which becomes Cu rich. The characterization of devices fabricated with these absorbers corroborates the significant impact of all these features on device parameters as the open circuit voltage and fill factor that determine the efficiency of the solar cells.
Resumo:
The microstructure of CuInS2-(CIS2) polycrystalline films deposited onto Mo-coated glass has been analyzed by Raman scattering, Auger electron spectroscopy (AES), transmission electron microscopy, and x-ray diffraction techniques. Samples were obtained by a coevaporation procedure that allows different Cu-to-In composition ratios (from Cu-rich to Cu-poor films). Films were grown at different temperatures between 370 and 520-°C. The combination of micro-Raman and AES techniques onto Ar+-sputtered samples has allowed us to identify the main secondary phases from Cu-poor films such as CuIn5S8 (at the central region of the layer) and MoS2 (at the CIS2/Mo interface). For Cu-rich films, secondary phases are CuS at the surface of as-grown layers and MoS2 at the CIS2/Mo interface. The lower intensity of the MoS2 modes from the Raman spectra measured at these samples suggests excess Cu to inhibit MoS2 interface formation. Decreasing the temperature of deposition to 420-°C leads to an inhibition in observing these secondary phases. This inhibition is also accompanied by a significant broadening and blueshift of the main A1 Raman mode from CIS2, as well as by an increase in the contribution of an additional mode at about 305 cm-1. The experimental data suggest that these effects are related to a decrease in structural quality of the CIS2 films obtained under low-temperature deposition conditions, which are likely connected to the inhibition in the measured spectra of secondary-phase vibrational modes.
Resumo:
We perform a structural and optical characterization of InAs1¿xNx epilayers grown by molecular beam epitaxy on InAs substrates x 2.2% . High-resolution x-ray diffraction HRXRD is used to obtain information about the crystal quality and the strain state of the samples and to determine the N content of the films. The composition of two of the samples investigated is also obtained with time-of-flight secondary ion mass spectroscopy ToF-SIMS measurements. The combined analysis of the HRXRD and ToF-SIMS data suggests that the lattice parameter of InAsN might significantly deviate from Vegard"s law. Raman scattering and far-infrared reflectivity measurements have been carried out to investigate the incorporation of N into the InAsN alloy. N-related local vibrational modes are detected in the samples with higher N content. The origin of the observed features is discussed. We study the compositional dependence of the room-temperature band gap energy of the InAsN alloy. For this purpose, photoluminescence and optical absorption measurements are presented. The results are analyzed in terms of the band-anticrossing BAC model. We find that the room-temperature coupling parameter for InAsN within the BAC model is CNM=2.0 0.1 eV.
Resumo:
Liquid pyrolysis is presented as a new production method of SnO2 nanocrystalline powders suitable for gas sensor devices. The method is based on a pyrolytic reaction of high tensioned stressed drops of an organic solution of SnCl4·5(H2O). The main advantages of the method are its capability to produce SnO2 nanopowders with high stability, its accurate control over the grain size and other structural characteristics, its high level of repeatability and its low industrialization implementation cost. The characterization of samples of SnO2 nanoparticles obtained by liquid pyrolysis in the range between 200ºC and 900ºC processing temperature is carried out by X-ray diffraction, transmission electron microscopy, Raman and X-ray photoelectron spectroscopy. Results are analyzed and discussed so as to validate the advantages of the liquid pyrolysis method.
Resumo:
En este trabajo se presenta un estudio detallado de los procesos implicados en la sulfurización de capas metálicas de Cu-In para la fabricación de células solares de CuInS2. Con este objeto, se ha desarrollado un experimento de sulfurización parcial de las capas, que han sido sometidas posteriormente a un tratamiento de selenización. El estudio de estas estructuras mediante Espectroscopía Raman y Espectroscopía de Electrones Auger (AES) ha permitido conocer algunos de los detalles de la reacción química, en concreto la identificación del frente de crecimiento de la reacción de sulfurización. Paralelamente, se ha desarrollado un sistema experimental que ha hecho posible investigar in-situ la reacción de sulfurización por Espectroscopía Raman, lo cual ha permitido un seguimiento preciso de la evolución estructural del material durante el proceso. Los resultados experimentales demuestran que la reacción de sulfurización se inicia en la superficie de la capa, dando lugar a la formación de CuInS2, coexistiendo dos estructuras cristalinas polimórficas (calcopirita y orden catiónico CuAu). Posteriormente la reacción química continúa asistida por la difusión de los metales hacia la superficie, que reaccionan con la atmósfera de azufre, de forma simultánea se produce una transformación de la fase CuAu del compuesto en la estructura calcopirita.
Resumo:
WO3 nanocrystalline powders were obtained from tungstic acid following a sol-gel process. Evolution of structural properties with annealing temperature was studied by X-ray diffraction and Raman spectroscopy. These structural properties were compared with those of WO3 nanopowders obtained by the most common process of pyrolysis of ammonium paratungstate, usually used in gas sensors applications. Sol-gel WO3 showed a high sensor response to NO2 and low response to CO and CH4. The response of these sensor devices was compared with that of WO3 obtained from pyrolysis, showing the latter a worse sensor response to NO2. Influence of operating temperature, humidity, and film thickness on NO2 detection was studied in order to improve the sensing conditions to this gas.
Resumo:
We present our recent achievements in the growing and optical characterization of KYb(WO4)2 (hereafter KYbW) crystals and demonstrate laser operation in this stoichiometric material. Single crystals of KYbW with optimal crystalline quality have been grown by the top-seeded-solution growth slow-cooling method. The optical anisotropy of this monoclinic crystal has been characterized, locating the tensor of the optical indicatrix and measuring the dispersion of the principal values of the refractive indices as well as the thermo-optic coefficients. Sellmeier equations have been constructed valid in the visible and near-IR spectral range. Raman scattering has been used to determine the phonon energies of KYbW and a simple physical model is applied for classification of the lattice vibration modes. Spectroscopic studies (absorption and emission measurements at room and low temperature) have been carried out in the spectral region near 1 µm characteristic for the ytterbium transition. Energy positions of the Stark sublevels of the ground and the excited state manifolds have been determined and the vibronic substructure has been identified. The intrinsic lifetime of the upper laser level has been measured taking care to suppress the effect of reabsorption and the intrinsic quantum efficiency has been estimated. Lasing has been demonstrated near 1074 nm with 41% slope efficiency at room temperature using a 0.5 mm thin plate of KYbW. This laser material holds great promise for diode pumped high-power lasers, thin disk and waveguide designs as well as for ultrashort (ps/fs) pulse laser systems.
Resumo:
InAlAs/InGaAs/InP based high electron mobility transistor devices have been structurally and electrically characterized, using transmission electron microscopy and Raman spectroscopy and measuring Hall mobilities. The InGaAs lattice matched channels, with an In molar fraction of 53%, grown at temperatures lower than 530¿°C exhibit alloy decomposition driving an anisotropic InGaAs surface roughness oriented along [1math0]. Conversely, lattice mismatched channels with an In molar fraction of 75% do not present this lateral decomposition but a strain induced roughness, with higher strength as the channel growth temperature increases beyond 490¿°C. In both cases the presence of the roughness implies low and anisotropic Hall mobilities of the two dimensional electron gas.
Resumo:
Nanocrystalline silicon layers have been obtained by thermal annealing of films sputtered in various hydrogen partial pressures. The as-deposited and crystallized films were investigated by infrared, Raman, x-ray diffraction, electron microscopy, and optical absorption techniques. The obtained data show evidence of a close correlation between the microstructure and properties of the processed material, and the hydrogen content in the as-grown deposit. The minimum stress deduced from Raman was found to correspond to the widest band gap and to a maximum hydrogen content in the basic unannealed sample. Such a structure relaxation seems to originate from the so-called "chemical annealing" thought to be due to Si-H2 species, as identified by infrared spectroscopy. The variation of the band gap has been interpreted in terms of the changes in the band tails associated with the disorder which would be induced by stress. Finally, the layers originally deposited with the highest hydrogen pressure show a lowest stress-which does not correlate with the hydrogen content and the optical band gap¿and some texturing. These features are likely related to the presence in these layers of a significant crystalline fraction already before annealing.