General mental ability as moderator of personality traits as predictors of early career success

In this paper, we examine the effects of general mental ability (GMA) and the personality traits defined in the big five model on extrinsic and intrinsic indicators of career success, in a sample of 130 graduates who were in the early stages of their careers. Results from hierarchical regression analyses indicated that GMA does not predict any of the success indicators. In contrast, the combination of GMA and three of the Big Five Personality traits, conscientiousness, neuroticism, and openness, is significantly associated with greater early career success and has incremental predictive validity.

The Influence of Gender, Intellectual Ability, Academic Self-Concept, Self-Regulation, Learning Strategies, Popularity and Parent Involvement in Early Adolescence

The present study examined the predictive effects of gender, intellectual ability, self-concept, motivation, learning strategies, popularity and parent involvement on academic achievement. Hiearchical regression analysis were performed with six steps in which each variable was included, among a sample of 1398 high school students (mean age = 12.5; standard deviation = .67) of eight education centers from the province of Alicante (Spain). The results revealed significant predictive effects of all of the variables, explaining 59.1% of the total variance.

Ultrathin high-index metasurfaces for shaping focused beams

The volume size of a converging wave, which plays a relevant role in image resolution, is governed by the wavelength of the radiation and the numerical aperture (NA) of the wavefront. We designed an ultrathin (λ/8 width) curved metasurface that is able to transform a focused field into a high-NA optical architecture, thus boosting the transverse and (mainly) on-axis resolution. The elements of the metasurface are metal-insulator subwavelength gratings exhibiting extreme anisotropy with ultrahigh index of refraction for TM polarization. Our results can be applied to nanolithography and optical microscopy.