The cellular structure of a two-dimensional H2/O2/Ar detonation wave

In this paper, the cellular structure of a two-dimensional detonation wave in a low pressure H2/O2/Ar mixture calculated with a detailed chemical reaction model, high order scheme and high resolution grids is investigated. The regular cellular structure is produced about 1 ms after introducing perturbations in the reaction zone of a steady one-dimensional detonation wave. It is found from the present resolution study that the discrepancies concerning the structure type arising from the coarser grid employed can be resolved using a sufficiently fine grid size of 0.05 mm and below and shows a double-Mach-like strong-type configuration. During the structure evolution process, the structure configuration does not change much in the periods before and after the triple point collision. Through the triple point collision, three regular collision processes are observed and are followed by a quick change to the double-Mach-like configuration. The simulated structure tracks show that there are three different tracks associated with different triple points or the kink on the transverse wave. Comparisons with previous work and experiments indicate the presence of a strong structure for an ordinary detonation.

The Structure and Evolution of a Two-Dimensional H2/O2/Ar Cellular Detonation

This paper reports on two-dimensional numerical simulation of cellular detonation wave in a / / mixture with low initial pressure using a detailed chemical reaction model and high order WENO scheme. Before the final equilibrium structure is produced, a fairly regular but still non-equilibrium mode is observed during the early stage of structure formation process. The numerically tracked detonation cells show that the cell size always adapts to the channel height such that the cell ratio is fairly independent of the grid sizes and initial and boundary conditions. During the structural evolution in a detonation cell, even as the simulated detonation wave characteristics suggest the presence of an ordinary detonation, the evolving instantaneous detonation state indicates a mainly underdriven state. As a considerable region of the gas mixture in a cell is observed to be ignited by the incident wave and transverse wave, it is further suggested that these two said waves play an essential role in the detonation propagation.

Comparative observation of Ar, Ar-H-2 and Ar-N-2 DC arc plasma jets and their arc root behaviour at reduced pressure

Results observed experimentally are presented, about the DC arc plasma jets and their arc-root behaviour generated at reduced gas pressure without or with an applied magnetic field. Pure argon, argon-hydrogen or argon- nitrogen mixture was used as the plasma-forming gas. A specially designed copper mirror was used for a better observation of the arc-root behaviour on the anode surface of the DC non-transferred arc plasma torch. It was found that in the cases without an applied magnetic field, the laminar plasma jets were stable and approximately axisymmetrical. The arc-root attachment on the anode surface was completely diffusive when argon was used as the plasma-forming gas, while the arc-root attachment often became constrictive when hydrogen or nitrogen was added into the argon. As an external magnetic field was applied, the arc root tended to rotate along the anode surface of the non-transferred arc plasma torch.

Ar原子光电流效应的研究

<正> 在十种染料波长范围内对应阴极放电中Ar原子光电流谱进行了观察,比较了Ar与Ne光电流效应的异同,提出了理论模型,并求得了放电电流与激光功率关系。

空阴极放电中Ar光电流谱的研究

在十种染料的波长范围内对空阴极放电中Ar的光电流谱、光电流信号与时间、放电电流及入射激光功率关系进行了实验观测,比较了Ne与Ar光电流效应的异同,在其共同点的基础上讨论了Ne与Ar光电流效应的机理,提出了理论模型并求得了放电电流与入射激光功率密度的关系。

Behavior of ar plasma formed in a high-density plasma source - an ecr reactor

In order to develop the ultra-large scale integration(ULSI), low pressure and high density plasma apparatus are required for etching and deposit of thin films. To understand critical parameters such as the pressure, temperature, electrostatic potential and energy distribution of ions impacting on the wafer, it is necessary to understand how these parameters are influenced by the power input and neutral gas pressure. In the present work, a 2-D hybrid electron fluid-particle ion model has been developed to simulate one of the high density plasma sources-an Electron Cyclotron Resonance (ECR) plasma system with various pressures and power inputs in a non-uniform magnetic field. By means of numerical simulation, the energy distributions of argon ion impacting on the wafer are obtained and the plasma density, electron temperature and plasma electrostatic potential are plotted in 3-D. It is concluded that the plasma density depends mainly on both the power input and neutral gas pressure. However, the plasma potential and electron temperature can hardly be affected by the power input, they seem to be primarily dependent on the neutral gas pressure. The comparison shows that the simulation results are qualitatively in good agreement with the experiment measurements.

7 fs超快强激光驱动Ar原子产生支持单个阿秒脉冲的高次谐波连续谱

采用脉冲宽度为7 fs，脉冲能量为0．4mJ的超快强激光脉冲与气体盒子中Ar原子作用获得了高次谐波截止区连续谱，并发现当驱动激光稳定在不同的载波包络相位时，高次谐波的谱结构、谱调制深度和连续谱的带宽都有很大区别。在某些载波包络相位时获得了平滑的连续谱，调制深度小于17％，连续带宽达10eV，从而支持时域上获得变换极限500as的单个阿秒脉冲。

Ridge optical waveguide in an Er3+/Yb3+ co-doped phosphate glass produced by He+ ion implantation combined with Ar+ ion beam etching

This paper reports on the fabrication and characterization of a ridge optical waveguide in an Er3+/Yb3+ co-doped phosphate glass. The He+ ion implantation (at energy of 2.8 MeV) is first applied onto the sample to produce a planar waveguide substrate, and then Ar+ ion beam etching (at energy of 500 eV) is carried out to construct rib stripes on the sample surface that has been deposited by a specially designed photoresist mask. According to a reconstructed refractive index profile of the waveguide cross section, the modal distribution of the waveguide is simulated by applying a computer code based on the beam propagation method, which shows reasonable agreement with the experimentally observed waveguide mode by using the end-face coupling method. Simulation of the incident He ions at 2.8 MeV penetrating into the Er3+/Yb3+ co-doped phosphate glass substrate is also performed to provide helpful information on waveguide formation.

Bunga rus bunga roides , A Record New to China ( Xizang AR) with a Note on Trimeresurus tibeta nus( Plate Ⅵ, lower)

1998 年在西藏墨脱县海拔1000 m 左右地方采到成年雌性环蛇1 号, 系我国新纪录。该蛇全长/ 尾长(mm) 1095/ 112 (尾尖断) 。通身背面黑褐色, 后3/ 4 有由背鳞白色点斑缀成的窄横纹约40 个; 腹面浅黑 色, 每隔3 或4 枚腹鳞有不规则的黄白色横斑。尾背有少数不完整的白色纹, 但尾腹面有7 条很明显的横斑。头 部斑纹与M. Smith (1943 : 410) 描述一致, 可能由于蛇龄较老而不清晰。背鳞通身15 行, 脊鳞略扩大; 腹鳞 233 , 尾下鳞35 (略低于文献记载的44～51 , 可能与尾尖断有关) , 除前端第三、四两枚成单外, 其余均成对。 没有颊鳞; 眶前鳞1 , 眶后鳞2 ; 颞鳞1 + 2 ; 上唇鳞7 (22223 式) ; 下唇鳞7 , 第一对在颏鳞后彼此相接, 前4 对 接前颔片; 前颔片大于后颔片, 后者后半介一小鳞。检查一侧, 除前沟牙及其预备牙外, 没有发现其他上颌齿。

电子级气体N2、H2、O2、Ar、He、HCl、CO2、NH3 28种杂质分析技术及质量监控

于G批量导入至Hzhangdi

Cl2／Ar／BCl3ICP刻蚀对AIGaN的损伤研究

感应耦合等离子体（ICP）刻蚀在AlGaN基紫外探测器台面制作中起着重要作用，初步研究了Cl2／Ar／BCl3ICP刻蚀对A1GaN材料的损伤。运用X射线光电子能谱（XPS）对ICP刻蚀前后的n型Al0.45Ga0．55N表面进行了分析，并对刻蚀后AlGaN材料在N2气中快速热退火进行了研究。结果表明，在N2气中550℃退火3min对材料的电学性能有明显的改善作用。