Fabrication, patterning and luminescence properties of X-2-Y2SiO5 : A (A = Eu3+, Tb3+, Ce3+) phosphor films via sol-gel soft lithography

X-2-y(2)SiO(5):A (A = Eu3+, Tb3+, Ce3+) phosphor films and their patterning were fabricated by a sol-gel process combined with a soft lithography. X-ray diffraction (XRD), Fourier transform infrared spectroscopy (FT-IR), atomic force microscopy (AFM), scanning electron microscopy (SEM) optical microscopy and photoluminescence (PL) were used to characterize the resulting films. The results of XRD indicated that the films began to crystallize at 900 degreesC with X-1-Y2SiO5, which transformed completely to X-2-Y2SiO5 at 1250 degreesC. Patterned thin films with different band widths (5 pin spaced by 5 pm and 16 pm spaced by 24 pm) were obtained by a soft lithography technique (micromoulding in capillaries, MIMIC). The SEM and AFM study revealed that the nonpattemed phosphor films were uniform and crack free, and the films mainly consisted of closely packed grains with an average size of 350 run. The doped rare earth ions (A) showed their characteristic emissions in X-2-Y2SiO5 phosphor films, i.e., D-5(0)-F-7(J) (J = 0, 1, 2,3,4) for Eu3+, D-5(3), (4)-F-7(J) (J = 6, 5, 4, 3) for Tb3+ and 5d (D-2)-4f (F-2(2/5),(2/7)) for Ce3+, respectively. The optimum doping concentrations for EU3+, Tb3+ were determined to be 13 and 8 mol% of Y3+ in X-2-Y2SiO5 films, respectively.

Preparation, patterning and luminescent properties of oxyapatite La-9.33(SiO6)(4)O-2 : A (A = Eu3+, Tb3+, Ce3+) phosphor films by sol-gel soft lithography

Silicate oxyapatite La-9.33 (SiO6)(4)O-2:A (A = Eu3+, Tb3+ and/or Ce3+) phosphor films and their patterning were fabricated by a sol-gel process combined with soft lithography. X-ray diffraction (XRD), Fourier transform infrared spectroscopy, atomic force microscopy, optical microscopy and photoluminescence spectra, as well as lifetimes, were used to characterize the resulting films. The results of XRD indicated that the films began to crystallize at 800degreesC and the crystallinity increased with the increase in annealing temperatures. Transparent nonpatterned phosphor films were uniform and crack-free, which mainly consisted of rodlike grains with a size between 150 and 210 nm. Patterned thin films with different bandwidths (20, 50 mum) were obtained by the micromoulding in capillaries technique. The doped rare earth ions (Eu3+, Tb3+ and Ce3+) showed their characteristic emission in crystalline La-9.33(SiO6)(4)O-2 phosphor films, i.e. Eu3+ D-5(0)-F-7(J) (J = 0, 1, 2, 3, 4), Tb3+ D-5(3,4)-F-7(J) (J = 3, 4, 5, 6) and Ce3+ 5d (D-2)-4f (F-2(2/5), F-2(2/7)) emissions, respectively. Both the lifetimes and PL intensity of the Eu3+, Tb3+ ions increased with increasing annealing temperature from 800 to 1100 degreesC, and the optimum concentrations for Eu3+, Tb3+ were determined to be 9 and 7 mol% of La3+ in La-9.33(SiO6)(4)O-2 films, respectively. An energy transfer from Ce3+ to Tb3+ was observed in the La-9.33(SiO6)(4)O-2:Ce, Tb phosphor films, and the energy transfer efficiency was estimated as a function of Tb3+ concentration.

Patterning and luminescent properties of nanocrystallineY(2)O(3): Eu3+ phosphor films by sol-gel soft lithography

Nanocrystalline Y2O3:Eu3+ phosphor films and their patterning were fabricated by a Pechini sol-gel process combined with a soft lithography. X-ray diffraction (XRD), thermogravimetric and differential thermal analysis (TG-DTA), atomic force microscopy (AFM), optical microscopy, UV/vis transmission and photoluminescence (PL) spectra as well as lifetimes were used to characterize the resulting films. The results of XRD indicated that the films began to crystallize at 500 degreesC and the crystallinity increased with the elevation of annealing temperatures. Uniform and crack free non-patterned phosphor films were obtained, which mainly consisted of grains with an average size of 70 nm. Using micro-molding in capillaries technique, we obtained homogeneous and defects-free patterned gel and crystalline phosphor films with different stripe widths (5, 10, 20 and 50 mum). Significant shrinkage (50%) was observed in the patterned films during the heat treatment process. The doped Eu3+ showed its characteristic emission in crystalline Y2O3 phosphor films due to an efficient energy transfer from Y2O3 host to them. Both the lifetimes and PL intensity of the Eu3+ increased with increasing the annealing temperature from 500 to 900 degreesC, and the optimum concentrations for Eu3+ were determined to be 5 mol%.

Preparation, patterning and luminescent properties of nanocrystalline Gd2O3 : A (A = Eu3+, Dy3+, Sm3+, Er3+) phosphor films via Pechini sol-gel soft lithography

Nanocrystalline Gd2O3:A (A = Eu3+, Dy3+, Sm3+, Er3+) phosphor films and their patterning were fabricated by a Pechini sol-gel process combined with a soft lithography. X-ray diffraction (XRD), atomic force microscopy (AFM), scanning electron microscopy (SEM) and optical microscopy, UV/vis transmission and photoluminescence (PL) spectra as well as lifetimes were used to characterize the resulting films. The results of XRD indicated that the films began to crystallize at 500 degreesC and that the crystallinity increased with the elevation of annealing temperatures. Uniform and crack free non-patterned phosphor films were obtained by optimizing the composition of the coating sol, which mainly consisted of grains with an average size of 70 nm and a thickness of 550 nm. Using micro-molding in capillaries technique, we obtained homogeneous and defects-free patterned gel and crystalline phosphor films with different stripe widths (5, 10, 20 and 50 mum). Significant shrinkage (50%) was observed in the patterned films during the heat treatment process. The doped rare earth ions (A) showed their characteristic emission in crystalline Gd2O3 phosphor films due to an efficient energy transfer from Gd2O3 host to them. Both the lifetimes and PL intensity of the rare earth ions increased with increasing the annealing temperature from 500 to 900 degreesC, and the optimum concentrations for Eu3+, Dy3+, sm(3+), Er3+ were determined to be 5, 0.25, 1 and 1.5 mol% of Gd3+ in Gd2O3 films, respectively.

Patterning and optical properties rhodamine B-doped organic-inorganic silica films fabricated by sol-gel soft lithography

Rhodamine B (RB)-doped organic-inorganic silica films and their patterning were fabricated by a sol-gel process combined with a soft lithography. The resulted film samples were characterized by atomic force microscope (AFM), optical microscope and UV/Vis absorption and photoluminescence excitation and emission spectra. The effects of the concentration of the RB dye and heat treatment temperature on the optical properties of the hybrid silica films have been studied. Four kinds of patterning structures with film line widths of 5, 10, 20 and 50 mum have been obtained by micromolding in capillaries by a soft lithography technique. The RB-doped hybrid silica films present a red color, with an excitation and emission bands around 564 and 585 mum, respectively. With increasing the RB concentration, the emission intensity of the RB-doped hybrid silica films increases and the emission maximum presents a red shift. The emission intensity of the films decreases with increasing the heat treatment temperatures.

Fabrication, patterning, and optical properties of nanocrystalline YVO4 : A (A = Eu3+, Dy3+, Sm3+, Er3+) phosphor films via sol-gel soft lithography

Nanocrystalline YVO4:A (A = Eu3+, Dy3+, Sm3+, Er3+) phosphor films and their patterning were fabricated by a Pechini sol-gel process combined with soft lithography. X-ray diffraction (XRD), Fourier transform infrared spectroscopy (FT-IR), thermogravimetric and differential thermal analysis (TG-DTA), atomic force microscopy (AFM) and optical microscopy, UV/vis transmission and absorption spectra, photoluminescence (PL) spectra, and lifetimes were used to characterize the resulting films. The results of XRD indicated that the films began to crystallize at 400 degreesC and the crystallinity increased with the increase of annealing temperatures. Transparent nonpatterned phosphor films were uniform and crack-free, which mainly consisted of grains with an average size of 90 nm. Patterned gel and crystalline phosphor film bands with different widths (5-60 mum) were obtained. Significant shrinkage and a few defects were observed in the patterned films during the heat treatment process. The doped rare earth ions (A) showed their characteristic emission in crystalline YVO4 phosphor films because of an efficient energy transfer from vanadate groups to them. The Sm3+ and Er3+ ions also showed upconversion luminescence in a YVO4 film host. Both the lifetimes and PL intensity of the rare earth ions increased with increasing annealing temperature from 400 to 800 degreesC, and the optimum concentration for Eu3+ was determined to be 7 mol % and those for Dy3+, Sm3-, and Er3+ were 2 Mol % of Y3- in YVO4 films, respectively.

Preparation, patterning and luminescence properties of rare earth-doped YVO4 nanocrystalline phosphor films via sol-gel soft lithography

In this presentation, nanocrystalline YVO4:A (A=Eu3+, Dy3+, SM3+, Er3+) phosphor films and their patterning were fabricated by a Pechini sol-gel process combined with a soft lithography (micro-molding in capillaries). XRD, FT-IR, AFM and optical microscope, absorption spectra, photoluminescence (PL) spectra as well as lifetimes were used to characterize the resulting films. The results of XRD indicated that the films began to crystallize at 400 degrees C and the crystallinity increased with the increase of annealing temperatures. Transparent nonpattemed phosphor films were uniform and crack free, which mainly consisted of grains with an average size of 90nm. Patterned crystalline phosphor film bands with different widths (5-30 mu m) were obtained. The doped rare earth ions (A) showed their characteristic emission in crystalline YVO4 phosphor films due to an efficient energy transfer from vanadate groups to them. The Sm3+ and Er3+ ions also showed upconversion luminescence in YVO4 film host. The optimum concentration for Eu3+ was determined to be 7 mol% and those for Dy3+, Sm3+, Er3+ were 2 Mol% of Y3+ in YVO4 films, respectively.

High-fidelity replication of Dammann gratings using soft lithography

We report the experimental results of using the soft lithography method for replication of Dammann gratings. By using an elastomeric stamp, uniform grating structures were transferred to the LTV-curable polymer. To evaluate the quality of the replication, diffraction images and light intensity were measured. Compared with the master devices, the replicas of Dammann gratings show a slight deviation in both surface relief profile and optical performance. Experimental results demonstrated that high-fidelity replication of Dammann gratings is realized by using soft lithography with low cost and high throughput. (C) 2008 Optical Society of America.

Microlenses fabricated by discontinuous dewetting and soft lithography

This letter describes an approach to fabricating microlens arrays with low cost and large area through the combination of discontinuous dewetting and reversible water-ice transition via a soft lithography replica process. Microlenses with different curvature can be tuned by the modulation of the wettability of the substrates. The microlenses fabricated can project clear miniaturized images.

Patterning and photolumine scent properties of perovskite-type organic/inorganic hybrid luminescent films by soft lithography

Perovskite-type organic/inorganic hybrid layered compound (C6H5C2H4NH3)(2)PbI4 was synthesized. The patterning Of (C6H5C2H4NH3)(2)PbI4 thin films on silicon substrate was realized by the micromolding in capillaries (MIMIC) process, a kind of soft lithography. Bright green luminescent stripes with different widths (50, 15, 0.8 mum) have been obtained. The structure and optical properties Of (C6H5C2H4NH3)(2)PbI4 films were characterized by X-ray diffraction (XRD), UV/Vis absorption and photoluminescence excitation and emission spectra, respectively. It is shown that the organic-inorganic layered (C6H5C2H4NH3)(2)PbI4 film was c-axis oriented, paralleling to the substrate plane. Green exciton emission at 525 nm was observed in the film, and the explanations for it were given.

Embossing of polymers using a thermosetting polymer mold made by soft lithography

In this article we present a mechanical pattern transfer process where a thermosetting polymer mold instead of a metal, dielectric, ceramic, or semiconductor master made by conventional lithography was used as the master to pattern thermoplastic polymers in hot embossing lithography. The thermosetting polymer mold was fabricated by a soft lithography strategy, microtransfer molding. For comparison, the thermosetting polymer mold and the silicon wafer master were both used to imprint the thermoplastic polymer, polymethylmethacrylate. Replication of the thermosetting polymer mold and the silicon wafer master was of the same quality. This indicates that the thermosetting polymer mold could be used for thermoplastic polymer patterning in hot embossing lithography with high fidelity.

Soft lithography and its application

软刻蚀是一类基于自组装和复制模塑等原理的非光刻微米和纳米加工方法。

溶胶-凝胶软石印法制备稀土发光薄膜及其图案化

利用溶胶-凝胶法合成了一系列稀土离子掺杂的发光薄膜，包括三元氧磷灰石稀土硅酸盐Ca2RS（SiO4）6O2（R＝YGd）体系，YVO4体系，LaPO4体系以及钒磷酸盐形成的固熔体体系1并研究了稀土离子Eu3+，Tb3+，Dy3+，Sm3+，Er3+和类汞离子Pb2＋在这些薄膜中的发光性质和能量传递性质。同时利用软石印法结合毛细管微模板技术实现了发光薄膜的图案化。SEM以及AFM结果表明，利用溶胶一凝胶法制备的发光薄膜表面致密均匀，无开裂。通过增加镀膜溶液的粘度、镀膜的次数可以有效的控制薄膜的厚度，使其达到理想的范围。由此可见溶胶一凝胶法是一种比较理想的制备发光薄膜的方法。在三元氧磷灰石稀土硅酸盐Ca2R8（SiO4）6O2（R＝YGd）体系中，稀土离子Eu3+，Tb3+在Ca2Y8（SiO4）6O2基质中占据低刘·称性格位6h（Cs）和4f（C3），并以其特征的红光发射（5Do-7F2）和绿光发射（5D4-7F5）为主。Eu3+，Tb3+发光的最佳浓度分别为Y3+的10mol％和6mol％，Ca2Y8（51O4）6O2:Eu3＋薄膜样品的发光强度和寿命随着烧结温度的升高而增加，Ca2Y8（SiO4）6O2:Tb3+薄膜样品的发光强度和寿命在800℃时最大，随后又随烧结温度的升高有所下降，Pb2＋可以敏化Ca2Gd8（SiO4 ）6O2中Gd3+的基质晶格，通过Pb2＋→Gd3十→（Gd3＋）n→A3＋形式传递和转移能量。在YVO4体系中，利用Pechini溶胶一凝胶法以无机盐为主要原料，柠檬酸为络合剂，利用聚乙二醇调节镀膜溶液的粘度，制备了YvO4:A（A＝Eu3＋ Dy3＋，Sm3＋，Er3＋）纳米发光薄膜。结合软石印法，通过简单工艺实现了发光薄膜图案化烧结过程中图案化薄膜有一定程度的收缩，存在一定的缺陷。得到的条纹在紫外灯下发出明亮的红光。掺杂的稀土离子在YVO4薄膜中显示它们特征发射，同时VO43-和稀土离子之间存在能量传递。Dy3＋，Sm3＋，Er3十发光的最佳浓度皆为Y3+的2mol％，这三者的发光淬灭是由交叉驰豫引起的。在LaPO4发光薄膜中，Etl3+以591nm的5Do-7Fl跃迁发射为主，呈现红橙光；Tb3＋以543nm的5D4-7F5发射为主，属于绿光发射。Ce3＋则由其特有的5d-4f双峰发射组成。Tb3＋和Eu3+掺杂的样品发光强度和荧光寿命随烧结温度的升局而增加。Tb3+和Eu3+的寿命曲线符合指数衰减，但Tb3十在LaPO4:Ce，Tb薄膜中，所得的寿命曲线不符合单指数衰减。Ce3+和Tb3+之间存在吸收能量传递。通过计算得到能量传递效率可以达到95％以上。XRD结果表明，从x＝0到x＝1 YVxP1-xO4:Eu3+薄膜形成了一系列具有错石结构的固熔体。在YVxP1-xO4:Eu3+（0≤x≤1）系列薄膜中，随着x值的增加，Eu3+的发光强度和红橙比逐渐增大。除x＝0，其它的Eu3+的红橙比都大于1，说明在发射光谱中，以Eu3+禁戒5Do一7F2电偶极跃迁为主，Etls十在基质中处于低对称性格位。当x＝0时，即Y0.98Eu0.l2PO4薄膜中，Eu3+，仍处于D2d低对称性格位，但5D0一7FI橙光发射却比SD0一7F2红光发射强。x对Y0.98Eu0.02VxP1-xO4（0≤x≤l）薄膜寿命曲线有很大的影响，当0≤x≤0.5时，Eu3+5 D0-7F2发射呈单指数衰减；当x≥0.6时，Eu3+5D0-7F2发射的衰减曲线比较复杂，不能用单指数拟合。YVxP1-xO4:A3＋（0≤x≤1，A＝Er，Sm）薄膜中，由于存在VO43-A3+，以及VO43-（VO43-）n-A3+（n≥1）形式的能量传递，同时由于浓度淬灭，VO43-的蓝光发射在0.1≤x≤1范围内，随x的增加而减弱，当x＝1时，VO43-的蓝光发射被完全淬灭，而A3+发光强度随x的增加而增加。在RVO4:A3+（R＝Y，La，Gd，A＝Eu，Sm，Er）纳米发光薄膜中，R对稀土离子发光性质的影响主要是由于基质晶体结构的不同。A3+在YVO4和GdVO4中属于D2d对称性，在YVO4和GdVO4薄膜中A3+的光谱性质基本相同，而LaVO4属于单斜晶系，具有独居石结构。A3+在LaVO4中属于C1对称性。C1对称性比D2d对称性低，A3+的发光光谱中谱线的位置以及谱线的劈裂数目都略有不同。由于Gd3+和发光离子之间的能量传递，A3+在GdVO4基质中的发光最强。

溶胶-凝胶软石印法制备硅酸盐发光薄膜及其图案化

利用瑞利波信息反演层状半空间介质的性质和状态，是地震勘探、岩土工程、及超声检测领域关注的研究课题。本文由层状半空间瑞利波的实验数据，分析给出了层状半空间中瑞利波的传播模式和频散曲线，并进而利用基阶和（或）高阶模式瑞利波频散曲线反演了层状介质参数。本文分别用数值模拟和实验分析进行了深入的研究。在数值模拟中，采用地震勘探中常用的爆炸点源激发产生的瑞利波，利用频率波数分析方法分析了层状半空间瑞利波的频散，考察了源检距，道间距，接收道数目等因素对频散曲线的影响，给出了这些参数的定量要求。研究表明频率波数分析方法得到的频散曲线和按激发强度占主导的模式随频率的变化而形成的跳跃频散曲线一致。对于速度递增的层状半空间，反演时可以仅考虑基阶模式的瑞利波频散曲线，对于含有低速层的层状半空间，则必须考虑模式跳跃后形成的“之”字形频散曲线。在用遗传算法反演介质参数时，也必须考虑激发强度占主导地位的模式随频率的变化，从而恰当地设计目标函数，才能得出对层状介质参数的正确反演。在超声实验中，用表面圆形法向力源激发的瑞利波，对三个层状半空间模型，即均匀半空间，速度递增的两层半空间，含低速层的三层半空间，利用我们实验室自行研制的数字式多通道发射和接收系统，进行了超声探测实验。通过对实验得到的多道瑞利波信号，利用频率波数分析的方法得到了和理论结果一致的实验频散曲线，并基此利用遗传算法实现了层状介质参数的正确反演，得到了和实际介质参数相符的反演结果。数值模拟和实验研究的结果均表明，由实验数据正确给出频散曲线和相应的采用遗传算法发展的适合层状半空间介质的反演方法，是一种优良的反演方法，一般可以找到全局的最优解。获得介质性状较好反演结果的原因，是因为我们首次考虑到了由激发强度决定的占主导地位的模式随频率的变化规律，对应地我们建立了爆炸点源和表面法向力源激发下，分层半空间多模瑞利波模式分析及频散曲线获取和介质参数反演的系统方法。此外，本文最后为了与频率波数分析的结果进行对比，研究了时频分析方法一魏格纳维尔分布，用数值模拟和实验结果分析了层状介质中瑞利波的频散曲线。结果表明时频分析方法获得的频散曲线不及多道频率波数分析得到的瑞利波频散曲线准确。不过由于时频分析仅需要一个接收道的数据就能给出结果，比多道频率波数分析方法要简便，如果能对此方法加以改进，还是一种具有前景的分析方法。总的来说，本文系统地给出了用瑞利波反演分层半空间介质性质和层厚的方法，并给出了相应的软件。数值模拟和实验研究表明，本文给出的建立在严格理论基础上的方法，为用瑞利波探测地层和超声探测层状介质，奠定了可靠的基础。在此基础上，进一步发展相应的系统解释软件，可望能提供给地层勘探，层状材料和薄膜的超声探测等领域应用。

Hydrothermal synthesis and luminescent properties of LuBO3: Tb3+ microflowers

Hexagonal vaterite-type LuBO3:Tb3+ microflower-like phosphors have been successfully prepared by an efficient surfactant- and template-free hydrothermal process directly without further sintering treatment. X-ray diffraction (XRD), Fourier transform infrared spectroscopy (FT-IR), thermogravimetric analysis (TGA), scanning electron microscopy (SEM), energy-dispersive X-ray (EDX) spectrometry transmission electron microscopy (TEM), high-resolution transmission electron microscopy (HRTEM), selected area electron diffraction (SAED), photoluminescence(PL) and cathodoluminescence (CL) spectra as well as kinetic decays were used to characterize the samples.