超连续谱干涉方法测量古依相移

利用两束超连续光干涉得到的信号,测量了透镜焦点附近飞秒激光脉冲的古依(Gouy)相移。根据得到的光谱干涉信号,利用傅里叶变换得到相对相位值。激光光束在聚焦透镜后的束腰半径可以由成像方法测得。根据测量得到的激光光束束腰半径,用非线性拟合的方法得到了古依相移曲线,拟合曲线与实验结果符合得非常好。给出了古依相位在焦点前后1 mm区域内的移动量。

超分辨远场生物荧光成像——突破光学衍射极限

长期以来,远场光学荧光显微镜凭借其非接触、无损伤、可探测样品内部等优点,一直是生命科学中最常用的观测工具。但由于衍射极限的存在,使传统的宽场光学显微镜横向和纵向的分辨率分别仅约为230 nm和1000 nm。为了揭示细胞内分子尺度的动态和结构特征,提高光学显微镜分辨率成为生命科学发展的迫切要求,在远场荧光显微镜的基础上,科学家们已经发展出许多实用的提高分辨率甚至超越分辨率极限的成像技术。例如,采用横向结构光照明提高横向分辨率到约100 nm,利用纵向驻波干涉效应将纵向分辨率提高5~10倍。然而,直到在光学荧光显微镜中引入非线性效应后,衍射极限才被真正突破,如受激荧光损耗显微镜利用非线性效应实现了30~50 nm的三维分辨率。另外应用荧光分子之间能量转移共振原理以及单荧光分子定位技术也可以突破衍射极限,甚至可以将分子定位精度提高到几个纳米的量级。

Nonlinear propagation of ultraslow pulses in media with electromagnetically induced transparency

The nonlinear behavior of a probe pulse propagating in a medium with electromagnetically induced transparency is studied both numerically and analytically. A new type of nonlinear wave equation is proposed in which the noninstantaneous response of nonlinear polarization is treated properly. The resulting nonlinear behavior of the propagating probe pulse is shown to be fundamentally different from that predicted by the simple nonlinear Schrodinger-like wave equation that considers only instantaneous Kerr nonlinearity. (c) 2005 Optical Society of America.

Nonlinear dynamics of negatively refracted light in a resonantly absorbing Bragg reflector

The evolution of nonlinear light fields traveling inside a resonantly absorbing Bragg reflector is studied by use of Maxwell-Bloch equations. Numerical results show that a pulse initially resembling a light bullet may effectively experience negative refraction and anomalous dispersion in the resonantly absorbing Bragg reflector. (c) 2007 Optical Society of America.

Nonlinear spectroscopy of cold atoms in diffuse laser light

The nonlinear spectroscopy of cold atoms in the diffuse laser cooling system is studied in this paper. We present the theoretical models of the recoil-induced resonances (RIR) and the electromagnetically-induced absorption (EIA) of cold atoms in diffuse laser light, and show their signals in an experiment of cooling Rb-87 atomic vapor in an integrating sphere. The theoretical results are in good agreement with the experimental ones when the light intensity distribution in the integrating sphere is considered. The differences between nonlinear spectra of cold atoms in the diffuse laser light and in the optical molasses are also discussed. (c) 2009 Optical Society of America

Aberration measurement of projection optics in lithographic tools based on two-beam interference theory

The degradation of image quality caused by aberrations of projection optics in lithographic tools is a serious problem in optical lithography. We propose what we believe to be a novel technique for measuring aberrations of projection optics based on two-beam interference theory. By utilizing the partial coherent imaging theory, a novel model that accurately characterizes the relative image displacement of a fine grating pattern to a large pattern induced by aberrations is derived. Both even and odd aberrations are extracted independently from the relative image displacements of the printed patterns by two-beam interference imaging of the zeroth and positive first orders. The simulation results show that by using this technique we can measure the aberrations present in the lithographic tool with higher accuracy. (c) 2006 Optical Society of America.

Aberration measurement of projection optics in lithographic tools by use of an alternating phase-shifting mask

As a critical dimension shrinks, the degradation in image quality caused by wavefront aberrations of projection optics in lithographic tools becomes a serious problem. It is necessary to establish a technique for a fast and accurate in situ aberration measurement. We introduce what we believe to be a novel technique for characterizing the aberrations of projection optics by using an alternating phase-shifting mask. The even aberrations, such as spherical aberration and astigmatism, and the odd aberrations, such as coma, are extracted from focus shifts and image displacements of the phase-shifted pattern, respectively. The focus shifts and the image displacements are measured by a transmission image sensor. The simulation results show that, compared with the accuracy of the previous straightforward measurement technique, the accuracy of the coma measurement increases by more than 30% and the accuracy of the spherical-aberration measurement increases by approximately 20%. (c) 2006 Optical Society of America.

Measurement technique for in situ characterizing aberrations of projection optics in lithographic tools

As the feature size decreases, degradation of image quality caused by wavefront aberrations of projection optics in lithographic tools has become a serious problem in the low-k1 process. We propose a novel measurement technique for in situ characterizing aberrations of projection optics in lithographic tools. Considering the impact of the partial coherence illumination, we introduce a novel algorithm that accurately describes the pattern displacement and focus shift induced by aberrations. Employing the algorithm, the measurement condition is extended from three-beam interference to two-, three-, and hybrid-beam interferences. The experiments are performed to measure the aberrations of projection optics in an ArF scanner. (C) 2006 Optical Society of America.

Phase-step calibration technique based on a two-run-times-two-frame phase-shift method

A novel phase-step calibration technique is presented on the basis of a two-run-times-two-frame phase-shift method. First the symmetry factor M is defined to describe the distribution property of the distorted phase due to phase-shifter miscalibration; then the phase-step calibration technique, in which two sets of two interferograms with a straight fringe pattern are recorded and the phase step is obtained by calculating M of the wrapped phase map, is developed. With this technique, a good mirror is required, but no uniform illumination is needed and no complex mathematical operation is involved. This technique can be carried out in situ and is applicable to any phase shifter, whether linear or nonlinear. (c) 2006 Optical Society of America.

Microoptical research in Shanghai Institute of Optics and Fine Mechanics

This paper summarized the recent research results of Changhe Zhou's group of Information Optics Lab in Shanghai Institute of Optics and Fine Mechanics (SIOM). The first is about the Talbot self-imaging research. We have found the symmetry rule, the regular-rearranged neighboring phase difference rule and the prime-number decamping rule, which is briefly summarized in a recent educational publication of Optics and Photonics News, pp.46-50, November 2004. The second is about four novel microoptical gratings designed and fabricated in SIOM. The third is about the design and fabrication of novel supperresolution phase plates for beam shaping and possible use in optical storage. The fourth is to develop novel femtosecond laser information processing techniques by incorporating microoptical elements, for example, use of a pair of reflective Dammann gratings for splitting the femtosecond laser pulses. The most attractive feature of this approach is that the conventional beam splitter is avoided. The conventional beam splitter would introduce the unequal dispersion due to the broadband spectrum of ultrashort laser pulses, which will affect the splitting result. We implemented the Dammann splitting apparatus by using two-layered reflective Dammann gratings, which generates the almost same array without angular dispersion. We believe that our device is highly interesting for splitting femtosecond laser pulses.

Coma measurement of projection optics in lithographic tools based on relative image displacements at multiple illumination settings

In this paper, we propose a novel method for measuring the coma aberrations of lithographic projection optics based on relative image displacements at multiple illumination settings. The measurement accuracy of coma can be improved because the phase-shifting gratings are more sensitive to the aberrations than the binary gratings used in the TAMIS technique, and the impact of distortion on displacements of aerial image can be eliminated when the relative image displacements are measured. The PROLITH simulation results show that, the measurement accuracy of coma increases by more than 25% under conventional illumination, and the measurement accuracy of primary coma increases by more than 20% under annular illumination, compared with the TAMIS technique. (c) 2007 Optical Society of America.