Aberration measurement of projection optics in lithographic tools based on two-beam interference theory

The degradation of image quality caused by aberrations of projection optics in lithographic tools is a serious problem in optical lithography. We propose what we believe to be a novel technique for measuring aberrations of projection optics based on two-beam interference theory. By utilizing the partial coherent imaging theory, a novel model that accurately characterizes the relative image displacement of a fine grating pattern to a large pattern induced by aberrations is derived. Both even and odd aberrations are extracted independently from the relative image displacements of the printed patterns by two-beam interference imaging of the zeroth and positive first orders. The simulation results show that by using this technique we can measure the aberrations present in the lithographic tool with higher accuracy. (c) 2006 Optical Society of America.

Diffraction properties of volume holographic gratings for an ultrashort pulsed beam with different polarization states readout

The diffraction properties of volume holographic gratings are studied when the gratings are illuminated by an ultrashort pulsed beam with different polarization states. The developed coupled wave theory of Kogelnik is used. Considering the dispersion effect of the grating media, solutions for the diffracted and transmitted intensities, diffraction efficiencies and the bandwidths of the gratings are given in transmission volume holographic gratings and reflection volume holographic gratings. The bandwidths of the gratings are reduced by the dispersion effect of the grating media. They also have different influences on the diffraction of an ultrashort pulsed beam with different polarization states. For different values of the ratio of the spectral bandwidth of the input pulse to that of the grating, the changes of the spectral and temporal distributions of the diffracted intensities, as well as the diffraction efficiencies of the gratings are shown.

Distortion of beam shape by a rotating double-prism wide-angle laser beam scanner

We describe the rigorous results of a wide-angle laser beam scanner, obtained with the help of the vector refraction theory. Using the rigorous results, the distortion of the beam shape is discussed. The distortion to the beam varies with the different relative angles of double prisms. The scanner expands the beam in some directions while it contracts the beam in other directions. According to the conservation of energy, the distribution of the laser intensity is changed as well. (c) 2006 Society of Photo-Optical Instrumentation Engineers.

Diffraction of an ultrashort pulsed beam with arbitrary polarization state from a volume holographic grating in LiNbO3 crystals

Based on a modified coupled wave theory of Kogelnik, we have studied the diffraction of an ultrashort pulsed beam with an arbitrary polarization state from a volume holographic grating in photorefractive LiNbO3 crystals. The results indicate that the diffracted intensity distributions in the spectral and temporal domains and the diffraction efficiency of the grating are both changed by the polarization state and spectral bandwidth of the input pulsed beam. A method is given of choosing the grating parameters and input conditions to obtain a large variation range of the spectral bandwidth of the diffracted pulsed beam with an appropriate diffraction efficiency. Our study presents a possibility of using a volume holographic grating recorded in anisotropic materials to shape a broadband ultrashort pulsed beam by modulating its polarization state.

Laser beam shaping system with a radial birefringent filter

Reshaping of a Gaussian laser beam into a uniform or other intensity distribution is required for various applications. The laser beam shaping system with a radial birefringent filter is presented in this paper. With such a system the Gaussian beams can be transformed into uniform or annular beams. The theory and simulation of the proposed systems are described in detail. The primary advantage of such a system is that the out beam pro. le can be tunable with the rotation of the radial birefringent element.

Analysis of an ultrashort pulsed finite beam diffracted by volume gratings

We obtain analytical solutions of the coupled wave equations that describe the Bragg diffraction of ultrashort pulsed finite beams by a thick planar grating, using two-dimensional coupled wave theory. The diffraction properties for the case of an ultrashort pulsed finite beam with Gaussian profiles in both the time and spatial domains are investigated. The spectral bandwidth of the diffracted beam, the Bragg selectivity bandwidth and the diffraction efficiency of the volume grating are influenced by the geometry parameter and the input bandwidth. Therefore extra attention should be paid to designing optical elements based on volume gratings for use with ultrashort pulsed waves in applications of pulse shaping and processing.

Three-dimensional coupled wave study for finite-sized anisotropic volume holographic gratings under ultrashort pulsed beam readout

The three-dimensional coupled wave theory is extended to systematically investigate the diffraction properties of finite-sized anisotropic volume holographic gratings (VHGs) under ultrashort pulsed beam (UPB) readout. The effects of the grating geometrical size and the polarizations of the recording and readout beams on the diffraction properties are presented, in particular under the influence of grating material dispersion. The wavelength selectivity of the finite-sized VHG is analyzed. The wavelength selectivity determines the intensity distributions of the transmitted and diffracted pulsed beams along the output face of the VHG. The distortion and widening of the diffracted pulsed beams are different for different points on the output face, as is numerically shown for a VHG recorded in a LiNbO3 crystal. The beam quality is analyzed, and the variations of the total diffraction efficiency are shown in relation to the geometrical size of the grating and the temporal width of the readout UPB. In addition, the diffraction properties of the finite-sized and one-dimensional VHG for pulsed and continuous-wave readout are compared. The study shows the potential application of VHGs in controlling spatial and temporal features of UPBs simultaneously. (C) 2007 Optical Society of America

Polarizing beam splitter of a deep-etched fused-silica grating

We described a highly efficient polarizing beam splitter (PBS) of a deep-etched binary-phase fused-silica grating, where TE- and TM-polarized waves are mainly diffracted in the -1st and 0th orders, respectively. Tb achieve a high extinction ratio and diffraction efficiency, the grating depth and period are optimized by using rigorous coupled-wave analysis, which can be well explained based on the modal method with effective indices of the modes for TE/TM polarization. Holographic recording technology and inductively coupled plasma etching are employed to fabricate the fused-silica PBS grating. Experimental results of diffraction efficiencies approaching 80% for a TE-polarized wave in the -1st order and more than 85% for a TM-polarized wave in the 0th order were obtained at a wavelength of 1550 nm. Because of its compact structure and simple fabrication process, which is suitable for mass reproduction, a deep-etched fused-silica grating as a PBS should be a useful device for practical applications. (C) 2007 Optical Society of America

Series representation of the Gaussian beam far-field diffracted by annular aperture

Accurate, analytical series expressions for the far-field diffraction of it Gaussian beam normally incident on a circular and central obscured aperture are derived with the help of the integration of parts method. With this expression, the far-field intensity distribution pattern can be obtained and the divergence angle is deduced too. Using the first five items of the series, the accuracy can satisfy most laser application fields. Compared with the conventional numerical integral method, the series representation is very convenient for understanding the physical meanings. (C) 2007 Elsevier GmbH. All rights reserved.

基于掺镧锆钛酸铅电光材料的光学相控阵光束扫描器

基于掺镧锆钛酸铅(PLZT)电光陶瓷材料的光学特性,提出了一种具有上下电极结构的光学相控阵高速光束扫描器。在理论上,分析了具有这种结构的光学相控阵的光束电光偏转特性和机制;在实验上,分析了掺镧锆钛酸铅材料的相位调制特性和损耗特性,制作了相关的光学相控阵器件,并构建了相应的测试系统,获得了光束在空间的角度偏转,与理论分析结果相符。

Wideband two-port beam splitter of a binary fused-silica phase grating

The usual beam splitter of multilayer-coated film with a wideband spectrum is not easy to achieve. We describe the realization of a wideband transmission two-port beam splitter based on a binary fused-silica phase grating. To achieve high efficiency and equality in the diffracted 0th and -1st orders, the grating profile parameters are optimized using rigorous coupled-wave analysis at a wavelength of 1550 nm. Holographic recording and the inductively coupled plasma dry etching technique are used to fabricate the fused-silica beam splitter grating. The measured efficiency of (45% x 2) = 90% diffracted into the both orders can be obtained with the fabricated grating under Littrow mounting. The physical mechanism of such a wideband two-port beam splitter grating can be well explained by the modal method based on two-beam interference of the modes excited by the incident wave. With the high damage threshold, low coefficient of thermal expansion, and wideband high efficiency, the presented beam splitter etched in fused silica should be a useful optical element for a variety of practical applications. (C) 2008 Optical Society of America.

Modal analysis of deep-etched low-contrast two-port beam splitter grating

Modal analysis of a deep-etched low-contrast two-port beam splitter grating under Littrow Mounting is presented. The guideline for the design of a subwavelength transmission fused-silica phase grating as high-efficiency grating, polarizing beam splitter (PBS), and two-port beam splitter, is summarized. As an example, a polarization-independent two-port beam splitter grating is designed at wavelength of 1064 nm. We firstly analyzed the physical essence of the grating by the simplified modal method. The guideline for the grating design and the approximate grating parameters are obtained. Then using the rigorous coupled-wave analysis (RCWA) with parameters varying around the approximate ones, Optimum grating parameters can be determined. With the design guideline, the time for the rigorous calculation of the grating profile parameters can be reduced significantly. (C) 2008 Elsevier B.V. All rights reserved

Polarizing beam splitter of deep-etched triangular-groove fused-silica gratings

We investigated the use of a deep-etched fused-silica grating with triangular-shaped grooves as a highly efficient polarizing beam splitter (PBS). A triangular-groove PBS grating is designed at a wavelength of 1550 nm to be used in optical communication. When it is illuminated in Littrow mounting, the transmitted TE- and TM-polarized waves are mainly diffracted in the minus-first and zeroth orders, respectively. The design condition is based on the average differences of the grating mode indices, which is verified by using rigorous coupled-wave analysis. The designed PBS grating is highly efficient over the C+L band range for both TE and TM polarizations (> 97.68 %). It is shown that such a triangular-groove PBS grating can exhibit a higher diffraction efficiency, a larger extinction ratio, and less reflection loss than the binary-phase fused-silica PBS grating. (C) 2008 Optical Society of America.

Three-port beam splitter of a binary fused-silica grating

A deep-etched polarization-independent binary fused-silica phase grating as a three-port beam splitter is designed and manufactured. The grating profile is optimized by use of the rigorous coupled-wave analysis around the 785 nm wavelength. The physical explanation of the grating is illustrated by the modal method. Simple analytical expressions of the diffraction efficiencies and modal guidelines for the three-port beam splitter grating design are given. Holographic recording technology and inductively coupled plasma etching are used to manufacture the fused-silica grating. Experimental results are in good agreement with the theoretical values. (c) 2008 Optical Society of America.