141 resultados para High quality (HQ)
Resumo:
The molecular beam epitaxial growth of high quality epilayers on (100) InP substrate using a valve phosphorous cracker cell over a wide range of P/In BEP ratio (2.0-7.0) and growth rate (0.437 and 0. 791μm/h). Experimental results show that electrical properties exhibit a pronounced dependence on growth parameters,which are growth rate, P/In BEP ratio, cracker zone temperature, and growth temperature. The parameters have been optimized carefully via the results of Hall measurements. For a typical sample, 77K electron mobility of 4.57 × 10^4 cm^2/(V · s) and electron concentration of 1.55×10^15 cm^-3 have been achieved with an epilayer thickness of 2.35μm at a growth temperature of 370℃ by using a cracking zone temperature of 850℃.
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A Si doped AlGaN/GaN HEMT structure with high Al content (x= 44%) in the barrier layer is grown on sapphire substrate by RF-MBE. The structural and electrical properties of the heterostructure are investigated by the triple axis X-ray diffraction and Van der Pauw-Hall measurement, respectively. The observed prominent Bragg peaks of the GaN and AlGaN and the Hall results show that the structure is of high quality with smooth interface.fabricated and characterized. Better DC characteristics, maximum drain current of 1.0A/mm and extrinsic transconductance of 218mS/mm are obtained when compared with HEMTs fabricated using structures with lower Al mole fraction in the AlGaN barrier layer. The results suggest that the high Al content in the AlGaN barrier layer is promising in improving material electrical properties and device performance.
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The high temperature (300~480K) characteristics of the n-3C-SiC/p-Si heterojunction diodes (HJD) fabricated by low-pressure chemical vapor deposition on Si (100) substrates are investigated.The obtained diode with best rectifying properties has 1.8×104 of ratio at room temperature,and slightly rectifying characteristics with 3.1 of rectification ratio is measured at 480K of an ambient temperature .220V of reverse breakdown voltage is acquired at 300K.Capacitance-voltage characteristics show that the abrupt junction model is applicable to the SiC/Si HJD structure and the built-in voltage is 0.75V.An ingenious equation is employed to perfectly simulate and explain the forward current density-voltage data measured at various temperatures.The 3C-SiC/Si HJD represents a promising approach for the fabrication of high quality heterojunction devices such as SiC-emitter heterojunction bipolar transistors.
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High quality cubic GaN (c-GaN) is grown by metalorganic vapor deposition (MOCVD) at an increased growth temperature of 900 ℃, with the growth rate of 1.6 μm/h. The full width at half maximum (FWHM) of room temperature photoluminescence (PL) for the high temperature grown GaN film is 48meV. It is smaller than that of the sample grown at 830 ℃. In X-ray diffraction (XRD) measurement, the high temperature grown GaN shows a (002) peak at 20° with a FWHM of 21'. It can be concluded that, although c-GaN is of metastable phase, high growth temperature is still beneficial to the improvement in its crystal quality. The relationship between the growth rate and growth temperature is also discussed.
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GaN epilayers were grown on (0001) sapphire substrates by NH3-MBE and RF-MBE (radio frequency plasma). The polarities of the epilayers were investigated by in-situ RHEED, chemical solution etching and AFM surface examination. By using a RF-MBE grown GaN layer as template to deposit GaN epilayer by NH3-MBE method, we found that not only Ga-polarity GaN films were repeatedly obtained, but also the electron mobility of these Ga-polarity films was significantly improved with a best value of 290 cm(2)/V.s at room temperature. Experimental results show it is an easy and stable way for growth of high quality Ga-polarity GaN films.
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The organic films of vanadyl-phthalocyanine (VOPc) compounds showed weak epitaxy growth (WEG) behavior on thin ordered para-sexiphenyl (p-6P) layer with high substrate temperature. The WEG of VOPc molecules standing up on the p-6P layer leaded to high in-plane orientation and their layer-by-layer growth behavior. In consequence, high quality VOPc films were obtained, which were consisted of lamellar crystals. Organic field-effect transistors with VOPc/p-6P films as active layers realized high mobility of above 1 cm(2)/V s. This result indicated that nonplanar compounds can obtain a device performance better than planar compounds, therefore, it may provide a rule to find disklike organic semiconductor materials.
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实验研究了连续波Nd:YAG激光焊接速度、侧吹保护气流量和离焦量等参量对激光穿透焊接K418和42CrMo焊缝成形的影响。结果表明,K418与42CrMo激光穿透焊接有X形和T形两种典型的焊缝形貌,且焊缝形貌是不对称的。随着焊接速度的提高,焊接线能量降低,焊缝尺寸变小,且焊缝上部尺寸变化比下部尺寸变化慢,焊缝形貌由X形过渡到T形。当离焦量在瑞利长度范围内时,焊缝正面宽度变化很小;当离焦量超出瑞利长度范围时,在足够高的激光功率密度下,焊缝正面宽度快速增加。在激光功率为3kW,侧吹保护气角度为35°条件下,通过优化焊接速度、侧吹保护气流量和离焦量等参量可以得到最佳焊缝质量。
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Bulk single crystals b-FeSi2, as a new photoelectric and thermoelectric material, has been successfully grown using chemical vapor transport technique by using iodine as transport agent in a sealed ampoule. The effects of crystal growth condition on quality and morphologies of the single crystals were studied. Both needle-like and grain-like single crystals were gained. By changing substrate temperature, tetrahedral high quality a-FeSi2 single crystals were also obtained.
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In the current paper, we have primarily addressed one powerful simulation tool developed during the last decades-Large Eddy Simulation (LES), which is most suitable for unsteady three-dimensional complex turbulent flows in industry and natural environment. The main point in LES is that the large-scale motion is resolved while the small-scale motion is modeled or, in geophysical terminology, parameterized. With a view to devising a subgrid-scale(SGS) model of high quality, we have highlighted analyzing physical aspects in scale interaction and-energy transfer such as dissipation, backscatter, local and non-local interaction, anisotropy and resolution requirement. They are the factors responsible for where the advantages and disadvantages in existing SGS models come from. A case study on LES of turbulence in vegetative canopy is presented to illustrate that LES model is more based on physical arguments. Then, varieties of challenging complex turbulent flows in both industry and geophysical fields in the near future-are presented. In conclusion; we may say with confidence that new century shall see the flourish in the research of turbulence with the aid of LES combined with other approaches.
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The usual plasma spraying methods often involve entrainment of the surrounding air into the turbulent plasma core and result in coated materials having relatively high porosity and low adhesive strength. Therefore, exploration of new plasma spraying methods for fabricating high quality coatings to meet the requirement of special applications will be quite important. In this study, an alternative plasma spraying method, i.e. the low-pressure laminar plasma spraying process, is investigated and used in an attempt for spraying thermal barrier coatings (TBCs). Investigations on the characteristics of the laminar plasma jets, feeding methods for the ceramic powder and the formation process of the individual quenched splats have been carried out. The properties of the TBCs sprayed by laminar plasma jet process, such as the adhesive strength at the interface of the ceramic coating/bond coat, the surface roughness and microstructure, are examined by tensile tests and scanning electron microscope (SEM) observations.
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The growth of InAsxSb1-x films on (100) GaSb substrates by liquid-phase epitaxy (LPE) has been investigated and epitaxial InAs0.3Sb0.7 films with InAs0.9Sb0.09 buffer layers have been successfully obtained. The low X-ray rocking curve FHWM values of InAs0.3Sb0.7 layer shows the high quality of crystal-orientation structure. Hall measurements show that the highest electron mobility in the samples obtained is 2.9 x 10(4) cm(2) V-1 s(-1) and the carrier density is 2.78 x 10(16)cm(-3) at room temperature (RT). The In As0.3Sb0.7 films grown on (10 0) GaSb substrates exhibit excellent optical performance with a cut-off wavelength of 12 mu m. (c) 2007 Elsevier B.V. All rights reserved.
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During its 1990 operation, 2 large RF systems were available on JET. The Ion Cyclotron Resonance Heating (ICRH) system was equipped with new beryllium screens and with feedback matching systems. Specific impurities generated by ICRH were reduced to negligible levels even in the most stringent H-mode conditions. A maximum power of 22 MW was coupled to L-mode plasmas. High quality H-modes (tau-E greater-than-or-equal-to 2.5 tau-EG) were achieved using dipole phasing. A new high confinement mode was discovered. It combines the properties of the H-mode regime to the low central diffusivities obtained by pellet injection. A value of n(d) tau-E T(i) = 7.8 x 10(20) m-3 s keV was obtained in this mode with T(e) approximately T(i) approximately 11 keV. In the L-mode regime, a regime, a record (140 kW) D-He-3 fusion power was generated with 10 - 14 MW of ICRH at the He-3 cyclotron frequency. Experiments were performed with the prototype launcher of the Lower Hybrid Current Drive (LHCD) systems with coupled power up to 1.6 MW with current drive efficiencies up to < n(e) > R I(CD)/P = 0.4 x 10(20) m-2 A/W. Fast electrons are driven by LHCD to tail temperatures of 100 keV with a hollow radial profile. Paradoxically, LHCD induces central heating particularly in combination with ICRH. Finally we present the first observations of the synergistic acceleration of fast electrons by Transit Time Magnetic Pumping (TTMP) (from ICRH) and Electron Landau Damping (ELD) (from LHCD). The synergism generates TTMP current drive even without phasing the ICRH antennae.
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GaN can be used to fabricate blue/green/UV LEDs and high temperature, high power electronic devices. Ideal substrates are needed for high quality III-nitride epitaxy, which is an essential step for the manufacture of LEDs. GaN substrates are ideal to be lattice matched and isomorphic to nitride-based films. Bulk single crystals of GaN can be grown from supercritical fluids using the ammonothermal method, which utilizes ammonia as fluid rather than water as in the hydrothermal process. In this process, a mineralizer such as amide, imide or azide is used to attack a bulk nitride feedstock at temperatures from 200 - 500癈 and pressures from 1 - 4 kbar. Baffle design is essential for successful growth of GaN crystals. Baffle is used to separate the dissolving zone from the growth zone, and to maintain a temperature difference between the two zones. For solubility curve with a positive coefficient with respect to temperature, the growth zone is maintained at a lower temperature than that in the dissolving zone, thus the nutrient becomes supersaturated in the growth zone. The baffle opening is used to control the mixing of nutrients in the two zones, thus the transfer of nutrient from the lower part to the upper part. Ammonothermal systems have been modeled here using fluid dynamics, thermodynamics and heat transfer models. The nutrient is considered as a porous media bed and the flow is simulated using the Darcy-Brinkman-Forchheimer model. The resulting governing equations are solved using the finite volume method. We investigated the effects of baffle opening and position on the transport phenomena of nutrient from dissolving zone to the growth zone. Simulation data have been compared qualitatively with experimental data.
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Table of Contents
1 | Introduction | 1 |
1.1 | What is an Adiabatic Shear Band? | 1 |
1.2 | The Importance of Adiabatic Shear Bands | 6 |
1.3 | Where Adiabatic Shear Bands Occur | 10 |
1.4 | Historical Aspects of Shear Bands | 11 |
1.5 | Adiabatic Shear Bands and Fracture Maps | 14 |
1.6 | Scope of the Book | 20 |
2 | Characteristic Aspects of Adiabatic Shear Bands | 24 |
2.1 | General Features | 24 |
2.2 | Deformed Bands | 27 |
2.3 | Transformed Bands | 28 |
2.4 | Variables Relevant to Adiabatic Shear Banding | 35 |
2.5 | Adiabatic Shear Bands in Non-Metals | 44 |
3 | Fracture and Damage Related to Adiabatic Shear Bands | 54 |
3.1 | Adiabatic Shear Band Induced Fracture | 54 |
3.2 | Microscopic Damage in Adiabatic Shear Bands | 57 |
3.3 | Metallurgical Implications | 69 |
3.4 | Effects of Stress State | 73 |
4 | Testing Methods | 76 |
4.1 | General Requirements and Remarks | 76 |
4.2 | Dynamic Torsion Tests | 80 |
4.3 | Dynamic Compression Tests | 91 |
4.4 | Contained Cylinder Tests | 95 |
4.5 | Transient Measurements | 98 |
5 | Constitutive Equations | 104 |
5.1 | Effect of Strain Rate on Stress-Strain Behaviour | 104 |
5.2 | Strain-Rate History Effects | 110 |
5.3 | Effect of Temperature on Stress-Strain Behaviour | 114 |
5.4 | Constitutive Equations for Non-Metals | 124 |
6 | Occurrence of Adiabatic Shear Bands | 125 |
6.1 | Empirical Criteria | 125 |
6.2 | One-Dimensional Equations and Linear Instability Analysis | 134 |
6.3 | Localization Analysis | 140 |
6.4 | Experimental Verification | 146 |
7 | Formation and Evolution of Shear Bands | 155 |
7.1 | Post-Instability Phenomena | 156 |
7.2 | Scaling and Approximations | 162 |
7.3 | Wave Trapping and Viscous Dissipation | 167 |
7.4 | The Intermediate Stage and the Formation of Adiabatic Shear Bands | 171 |
7.5 | Late Stage Behaviour and Post-Mortem Morphology | 179 |
7.6 | Adiabatic Shear Bands in Multi-Dimensional Stress States | 187 |
8 | Numerical Studies of Adiabatic Shear Bands | 194 |
8.1 | Objects, Problems and Techniques Involved in Numerical Simulations | 194 |
8.2 | One-Dimensional Simulation of Adiabatic Shear Banding | 199 |
8.3 | Simulation with Adaptive Finite Element Methods | 213 |
8.4 | Adiabatic Shear Bands in the Plane Strain Stress State | 218 |
9 | Selected Topics in Impact Dynamics | 229 |
9.1 | Planar Impact | 230 |
9.2 | Fragmentation | 237 |
9.3 | Penetration | 244 |
9.4 | Erosion | 255 |
9.5 | Ignition of Explosives | 261 |
9.6 | Explosive Welding | 268 |
10 | Selected Topics in Metalworking | 273 |
10.1 | Classification of Processes | 273 |
10.2 | Upsetting | 276 |
10.3 | Metalcutting | 286 |
10.4 | Blanking | 293 |
Appendices | 297 | |
A | Quick Reference | 298 |
B | Specific Heat and Thermal Conductivity | 301 |
C | Thermal Softening and Related Temperature Dependence | 312 |
D | Materials Showing Adiabatic Shear Bands | 335 |
E | Specification of Selected Materials Showing Adiabatic Shear Bands | 341 |
F | Conversion Factors | 357 |
References | 358 | |
Author Index | 369 | |
Subject Index | 375 |
Resumo:
The damage mechanisms and micromachining of 6H SiC are studied by using femtosecond laser pulses at wavelengths between near infrared (NIR) and near ultraviolet (NUV) delivered from an optical parametric amplifier (OPA). Our experimental results indicate that high quality microstructures can be fabricated in SiC crystals. On the basis of the dependence of the ablated area and the laser pulse energy, the threshold fluence of SiC is found to increase with the incident laser wavelength in the visible region, while it remains almost constant for the NIR laser. For the NIR laser pulses, both photoionization and impact ionization play important roles in electronic excitation, while for visible lasers, photoionization plays a more important role.