Modal analysis of deep-etched low-contrast two-port beam splitter grating

Modal analysis of a deep-etched low-contrast two-port beam splitter grating under Littrow Mounting is presented. The guideline for the design of a subwavelength transmission fused-silica phase grating as high-efficiency grating, polarizing beam splitter (PBS), and two-port beam splitter, is summarized. As an example, a polarization-independent two-port beam splitter grating is designed at wavelength of 1064 nm. We firstly analyzed the physical essence of the grating by the simplified modal method. The guideline for the grating design and the approximate grating parameters are obtained. Then using the rigorous coupled-wave analysis (RCWA) with parameters varying around the approximate ones, Optimum grating parameters can be determined. With the design guideline, the time for the rigorous calculation of the grating profile parameters can be reduced significantly. (C) 2008 Elsevier B.V. All rights reserved

Polarizing beam splitter of deep-etched triangular-groove fused-silica gratings

We investigated the use of a deep-etched fused-silica grating with triangular-shaped grooves as a highly efficient polarizing beam splitter (PBS). A triangular-groove PBS grating is designed at a wavelength of 1550 nm to be used in optical communication. When it is illuminated in Littrow mounting, the transmitted TE- and TM-polarized waves are mainly diffracted in the minus-first and zeroth orders, respectively. The design condition is based on the average differences of the grating mode indices, which is verified by using rigorous coupled-wave analysis. The designed PBS grating is highly efficient over the C+L band range for both TE and TM polarizations (> 97.68 %). It is shown that such a triangular-groove PBS grating can exhibit a higher diffraction efficiency, a larger extinction ratio, and less reflection loss than the binary-phase fused-silica PBS grating. (C) 2008 Optical Society of America.

Deep silicon grating as high-extinction-ratio polarizing beam splitter

A deep binary silicon grating as high-extinction-ratio reflective polarizing beam splitter (PBS) at the wavelength of 1550 nm is presented. The design is based on the phenomenon of total internal reflection (TIR) by using the rigorous coupled wave analysis (RCWA). The extinction ratio of the rectangular PBS grating can reach 2.5×105 with the optimum grating period of 397 nm and groove depth of 1.092 μm. The effciencies of TM-polarized wave in the 0th order and TE-polarized wave in the −1st order can both reach unity at the Littrow angle. Holographic recording technology and inductively coupled plasma (ICP) etching could be used to fabricate the silicon PBS grating.