Symmetry of the Talbot effect and its applications

The Talbot effect is one of the most basic optical phenomena that has received extensive investigations both because its new results provide us more understanding of the fundamental Fresnel diffraction and also because of its wide applications. We summarize our recent results on this subject. Symmetry of the Talbot effect, which was reported in Optics Communications in 1995, is now realized as the key to reveal other rules for explanation of the Talbot effect for array illumination. The regularly rearranged-neighboring-phase-differences (RRNPD) rule, a completely new set of analytic phase equations (Applied Optics, 1999), and the prime-number decomposing rule (Applied Optics, 2001) are the newly obtained results that reflect the symmetry of the Talbot effect in essence. We also reported our results on the applications of the Talbot effect. Talbot phase codes are the orthogonal codes that can be used for phase coding of holographic storage. A new optical scanner based on the phase codes for Talbot array illumination has unique advantages. Furthermore, a novel two-layered multifunctional computer-generated hologram based on the fractional Talbot effect was proposed and implemented (Optics Letters, 2003). We believe that these new results should bring us more new understanding of the Talbot effect and help us to design novel optical devices that should benefit practical applications. (C) 2004 Society of Photo-Optical Instrumentation Engineers.

Readout of a real-time hologram in bacteriorhodopsin film with high diffraction efficiency and intensity

A scheme for the readout of a hologram recorded in bacteriorhodopsin film with high diffraction efficiency and intensity is suggested and demonstrated. Two weak coherent continuous beams function as the recording beams, and a strong light pulse is used to read the real-time hologram. The width of the readout light pulse is modulated to be short compared with the erase time of the reading beam; the time space between two adjacent pulses is ensured to be longer than the time the beams take to recover the hologram, and high diffraction efficiency and intensity (similar to 11 mW/cm(2)) can be obtained. (C) 1996 Optical Society of America.

Effect of absorption on the diffraction efficiency in Fe : LiNbO3 crystal with 90 degrees recording geometry

In this paper the saturated diffraction efficiency has been optimized by considering the effect of the absorption of the recording light on a crossed-beam grating with 90 degrees recording geometry in Fe:LiNbO3 crystals. The dependence of saturated diffraction efficiency on the doping levels with a known oxidation-reduction state, as well as the dependence of saturated diffraction efficiency on oxidation-reduction state with known doping levels, has been investigated. Two competing effects on the saturated diffraction efficiency were discussed, and the intensity profile of the diffracted beam at the output boundary has also been investigated. The results show that the maximal saturated diffraction efficiency can be obtained in crystals with moderate doping levels and modest oxidation state. An experimental verification is performed and the results are consistent with those of the theoretical calculation.

Optimized condition for etching fused-silica phase gratings with inductively coupled plasma technology

Polymer deposition is a serious problem associated with the etching of fused silica by use of inductively coupled plasma (ICP) technology, and it usually prevents further etching. We report an optimized etching condition under which no polymer deposition will occur for etching fused silica with ICP technology. Under the optimized etching condition, surfaces of the fabricated fused silica gratings are smooth and clean. Etch rate of fused silica is relatively high, and it demonstrates a linear relation between etched depth and working time. Results of the diffraction of gratings fabricated under the optimized etching condition match theoretical results well. (c) 2005 Optical Society of America.

Wave-front analysis method of circular aperture sampling for collimation testing

A new type of wave-front analysis method for the collimation testing of laser beams is proposed. A concept of wave-front height is defined, and, on this basis, the wave-front analysis method of circular aperture sampling is introduced. The wave-front height of the tested noncollimated wave can be estimated from the distance between two identical fiducial diffraction planes of the sampled wave, and then the divergence is determined. The design is detailed, and the experiment is demonstrated. The principle and experiment results of the method are presented. Owing to the simplicity of the method and its low cost, it is a promising method for checking the collimation of a laser beam with a large divergence. © 2005 Optical Society of America.

径向双折射滤波器的超分辨性能研究

超分辨技术因其可以超越经典的衍射极限而为人们所熟知．并且．在光存储和共焦扫描成像系统中有着广泛的应用。把由两个偏振器和一个圆对称的双折射元件组成的径向双折射滤波器引入超分辨技术，借助琼斯算法推导出其光瞳函数的表达式。由分析得出通过改变径向双折射滤波器中偏振器的偏振方向和双折射元件的主轴之间的夹角，即可实现光学系统的横向超分辨或轴向超分辨。同时对评价该器件超分辨性能的参量第一零点比、斯特尔比和旁瓣强度抑制比做了详细的讨论。该滤波器用于超分辨技术的优点在于其制作不涉及相位的变化而比较简单，且费用比较低。缺点是

High-efficiency reflective diffraction gratings in fused silica as (de)multiplexers at 1.55 mu m for dense wavelength division multiplexing application

We describe high-efficiency, high-dispersion reflection gratings fabricated in bulk fused Silica illuminated by incident lights in the C + L bands as (de)multiplexers for dense wavelength division multiplexing (DWDM) application. Based on the phenomenon of total internal reflection, gratings with optimized profile parameters exhibit diffraction efficiencies of more than 90% under TM- and TE-polarized incident lights for 101-nm spectral bandwidths (1520-1620 nm) and can reach an efficiency of greater than 97% for both polarizations at a wavelength of 1550 nm. Without loss of metal absorption, without coating of dielectric film layers, and independent of tooth shape, this new kind of grating should be of great interest for DWDM application. (C) 2005 Optical Society of America.

提高能量密度的超衍射极限激光光束相位补偿技术

定义了激光光束衍射远场光斑压缩前后的能量比以及能量密度比来衡量超衍射极限激光光束的质量。通过利用反向传递算法设计了合适的补偿相位板，不但对准直放大的单一横模激光光束进行小于光学衍射极限的发散度的压缩，同时又保证光束能量集中于压缩后的远场衍射主瓣中，使压缩后的远场衍射光斑的能量密度增加。给出了相应的实例。这一结论不但解决了光学超分辨中光束压缩与能量损失不可避免这一矛盾，而且为发散度小且能量密度高的超衍射极限激光光束的实验工作以及该类光束的实际应用提供了理论基础。

Highly sensitive wave-front sensor with a non-zero-order phase plate

We propose a novel highly sensitive wave front detection method for a quick check of a flat wave front by taking advantage of a non-zero-order pi phase plate that yields a non-zero-order diffraction pattern. When a light beam with a flat wave front illuminates a phase plate, the zero-order intensity is zero. When there is a slight distortion of the wave front, the zero-order intensity increases. The ratio of first-order intensity to that of zero-order intensity is used as the criterion with which to judge whether the wave front under test is flat, eliminating the influence of background light. Experimental results demonstrate that this method is efficient, robust, and cost-effective and should be highly interesting for a quick check of a flat wave front of a large-aperture laser beam and adaptive optical systems. (c) 2005 Optical Society of America.

Optimizations for the uniformity of the non-volatile volume grating in doubly doped LiNbO3 crystals

The formation of the non-uniformity of the non-volatile volume grating in doubly doped LiNbO3 crystals is studied in detail. We find that the non-uniformity of the grating is mainly caused by strong ultraviolet light absorption, and the average saturation space-charge field is small and the diffraction efficiency is low as a result of the non-uniformity of the grating. In order to optimize the uniformity of the grating, we propose the recording scheme by using two sensitizing beams simultaneously from the two opposite sides of the crystals. Theoretical simulations and experimental verifications are performed. Results show that the well uniformed grating with high diffraction efficiency can be obtained by using this optimization scheme. (c) 2004 Elsevier B.V. All rights reserved.

Influence of recording conditions on crossed-beam photorefractive gratings in doubly doped LiNbO3 crystals

The influence of the recording conditions, including the widths of the recording beams, the width ratio of the recording beams, and the recording angles, on the properties of crossed-beam photorefractive gratings in doubly doped LiNbO3 crystals is studied. A theoretical model that combines the band transport model with two-dimensional coupled-wave theory is proposed. The numerical calculations of the space-charge field, the intensity profiles of the diffracted beam, and the diffraction efficiency are presented. (C) 2006 Optical Society of America.

Aberration measurement of projection optics in lithographic tools based on two-beam interference theory

The degradation of image quality caused by aberrations of projection optics in lithographic tools is a serious problem in optical lithography. We propose what we believe to be a novel technique for measuring aberrations of projection optics based on two-beam interference theory. By utilizing the partial coherent imaging theory, a novel model that accurately characterizes the relative image displacement of a fine grating pattern to a large pattern induced by aberrations is derived. Both even and odd aberrations are extracted independently from the relative image displacements of the printed patterns by two-beam interference imaging of the zeroth and positive first orders. The simulation results show that by using this technique we can measure the aberrations present in the lithographic tool with higher accuracy. (c) 2006 Optical Society of America.

Aberration measurement of projection optics in lithographic tools by use of an alternating phase-shifting mask

As a critical dimension shrinks, the degradation in image quality caused by wavefront aberrations of projection optics in lithographic tools becomes a serious problem. It is necessary to establish a technique for a fast and accurate in situ aberration measurement. We introduce what we believe to be a novel technique for characterizing the aberrations of projection optics by using an alternating phase-shifting mask. The even aberrations, such as spherical aberration and astigmatism, and the odd aberrations, such as coma, are extracted from focus shifts and image displacements of the phase-shifted pattern, respectively. The focus shifts and the image displacements are measured by a transmission image sensor. The simulation results show that, compared with the accuracy of the previous straightforward measurement technique, the accuracy of the coma measurement increases by more than 30% and the accuracy of the spherical-aberration measurement increases by approximately 20%. (c) 2006 Optical Society of America.

Measurement of the diffraction-limit wavefront with double-shearing interferometers

In order to measure the diffraction-limit wavefront, we present three types of common-path double-shearing interferometers based on the theory of double shearing. Two pairs of half-aperture or whole-aperture wedge plates are used to introduce opposite tilt to realize the double-shearing function. By comparing the fringe widths in two fields, the marginal wavefront aberration can be obtained. In the paper, we give three different configurations: half-aperture configuration, whole-field configuration and double-interferometer configuration. The half-aperture configuration has the features of high sensitivity, stabilization and easy alignment. For the whole-field configuration, the interference fringes are displayed in two whole fields. Consequently, the divergent or convergent characteristic and aberration types of a wavefront can be identified visually. The whole-field configuration can be changed to the double-interferometer configuration for continuous test. Both small and large wavefront aberrations can be measured by the double-interferometer configuration. The minimum detectable wavefront aberration (W-0)(min) comes to 0.03 lambda. Lastly, we present the experimental results for the three types of double-shearing interferometers.

Measurement technique for in situ characterizing aberrations of projection optics in lithographic tools

As the feature size decreases, degradation of image quality caused by wavefront aberrations of projection optics in lithographic tools has become a serious problem in the low-k1 process. We propose a novel measurement technique for in situ characterizing aberrations of projection optics in lithographic tools. Considering the impact of the partial coherence illumination, we introduce a novel algorithm that accurately describes the pattern displacement and focus shift induced by aberrations. Employing the algorithm, the measurement condition is extended from three-beam interference to two-, three-, and hybrid-beam interferences. The experiments are performed to measure the aberrations of projection optics in an ArF scanner. (C) 2006 Optical Society of America.