Super-resolution scanning laser microscopy with a third-order optical nonlinear thin film

In a configuration of optical far-field scanning microscopy, super-resolution achieved by inserting a third-order optical nonlinear thin film is demonstrated and analyzed in terms of the frequency response function. Without the thin film the microscopy is diffraction limited; thus, subwavelength features cannot be resolved. With the nonlinear thin film inserted, the resolution is dramatically improved and thus the microscopy resolves features significantly smaller than the smallest spacing allowed by the diffraction limit. A theoretical model is established and the device is analyzed for the frequency response function. The results show that the frequency response function exceeds the cutoff spatial frequency of the microscopy defined by the laser wavelength and the numerical aperture of the convergent lens. The main contribution to the improvement of the cutoff spatial frequency is from the phase change induced by the complex transmission of the nonlinear thin film. Experimental results are presented and are shown to be consistent with the results of theoretical simulations.

Si underlayer induced nano-ablation in AgInSbTe thin films

AgInSbTelSi thin films on glass substrates are prepared by dc magnetron sputtering at room temperature. Using Si underlayer as the thermal diffusion layer, the super-resolution nano-ablation holes with a size of 70nm in the AgInSbTe phase change films are obtained by a far-field focused laser experimental setup, with laser wavelength 405nm and objective-lens numerical aperture 0.90. The nano-ablation formation mechanism is analysed and discussed via the thermal diffusion of sample structures.

脉冲激光晶化非晶硅薄膜的有限差分模拟

根据热传导原理，建立了脉冲激光晶化非晶硅薄膜的理论模型。运用有限差分方法研究了不同激光波长、能量密度等因素对薄膜温度变化及相变过程的影响。计算了不同波长激光器对厚度500nm非晶硅晶化的阈值能量密度。结果发现，准分子晶化的阈值能量密度最低，但是在同样的能量密度下，熔融深度却不及使用更长波长的激光器。计算并分析了升高衬底温度对结晶速度和晶粒尺寸的影响，模拟结果较好地验证了实验结论和规律。

飞秒激光辐照ZnO晶体

利用飞秒激光对ZnO晶体进行辐照，对辐照前后的晶体样品进行发光光谱及拉曼光谱检测。辐照后发光光谱的某些发光峰强度有明显增强，但未产生新的发光峰，表明没有新的缺陷结构产生，但晶体内锌空位、间隙位锌、间隙位缺陷浓度增加。拉曼光谱结果表明，辐照后ZnO晶体未产生相变，但随着辐照激光功率的增大，拉曼峰327 cm-1，437 cm-1强度明显减弱，表明在飞秒激光辐照作用下氧化锌的结晶程度下降。但574 cm-1峰值却随着辐照功率的增大而变大，分析表明该拉曼峰很可能是由于晶体内间隙位缺陷所致。同时实验过程中观察到飞

Precise determination of anomalous scattering factors of Ge by using X-ray resonant scattering

Variations of peak position of the rocking curve in the Bragg case are measured from a Ge thin crystal near the K-absorption edge. The variations are caused by a phase change of the real part of the atomic scattering factor. Based on the measurement, the values of the real part are determined with an accuracy of better than 1%. The values are the most reliable ones among those reported values so far as they are directly determined from the normal atomic scattering factors.

Thermodynamic damage mechanism of transparent films caused by a low-power laser

A new model for analyzing the laser-induced damage process is provided. In many damage pits, the melted residue can been found. This is evidence of the phase change of materials. Therefore the phase change of materials is incorporated into the mechanical damage mechanism of films. Three sequential stages are discussed: no phase change, liquid phase change, and gas phase change. To study the damage mechanism and process, two kinds of stress have been considered: thermal stress and deformation stress. The former is caused by the temperature gradient and the latter is caused by high-pressure drive deformation. The theory described can determine the size of the damage pit. (c) 2006 Optical Society of America.

吸收杂质热辐射诱导光学薄膜破坏的热力机制

光学元件的破坏是限制高功率激光系统发展的主要问题,理解光学元件的破坏机制对于高功率激光系统的设计、运行参量选择以及器件技术发展有重要影响。以热辐射模型为基础研究了杂质吸收诱导光学薄膜破坏的热力过程。研究发现薄膜发生初始破坏所需时间很短,脉冲的大部分时间是引起薄膜发生更大的破坏。在考虑吸收杂质发生相变的情况下,计算了吸收杂质汽化对薄膜产生的蒸汽压力,论证了薄膜发生宏观破坏的可能性。此模型能很好地解释光学薄膜的平底坑破坏形貌。

Investigation on thermal stability of TiO2 films for application at high temperature

The thermal stability of electron beam deposited TiO2 monolayers and TiO2/SiO2 high reflectors (HR) during 300 to 1100 degrees C annealing is studied. It is found that the optical loss of film increases with the increase in annealing temperature, due to the phase change, crystallisation and deoxidising of film. Scattering loss dominates the optical property degradation of film below 900 degrees C, while the absorption is another factor at 1100 degrees C. The increase in refractive index and decrease in physical thickness of TiO2 layer shift the spectra of HR above 900 degrees C. The possible crack mechanism on the surface of HR during annealing is discussed. Guidance for application on high temperature stable optical coatings is given.

热学微流控系统中瞬态相变传热研究

微尺度相变传热广泛存在于微反应器、微型燃料电池、微蒸发器、微冷凝器、微热管、微汽泡执行器等微流控器件中，研究微流控系统中的相变问题对于微流控器件的设计和运行具有重要的科学意义。本文针对三类典型的微尺度相变问题，即微尺度流动沸腾、微尺度流动凝结以及微加热器上的汽泡动力学进行了深入细致的研究，实验研究中所采用的实验件均为标准MEMS微加工工艺制作，克服了常规机械加工所造成的表面粗糙度的影响。 考虑到微流控系统中大量应用交叉型、弯曲型等复杂结构的微通道，在微尺度流动沸腾研究中，设计了一种具有交错微通道结构的微流控芯片，并以丙酮为工质，对该芯片内的流动沸腾进行了研究。发现了周期为毫秒量级微时间尺度的流型结构，整个周期包括单相液体充液、两相分层流以及部分蒸干的液膜流三个阶段；在单个微通道区域，由于蒸发动量力的作用，液膜沿流动方向呈非均匀分布，蒸干首先发生在上游；由于液相弗劳德数较小，导致微通道中依然存在分层流流型。由于毕渥数较小，芯片背面温度几乎与芯片内壁面温度保持同步变化。虽然红外热像仪的响应频率较低，但仍然可以鉴别出由于流型周期性转换导致的壁面温度脉动。 在微尺度流动凝结换热研究中，为便于获取凝结过程的动态流动特性，设计了一种低高宽比的单微通道，并以水为工质，对该微通道中的流动凝结换热进行了研究。实验中采取了空气自然对流冷却和 水强制对流冷却两种冷却强度。研究发现，该微通道中的凝结换热呈周期性，其周期在毫秒量级。在通道上游入口处，存在一个呈准静止状态的长汽弹，汽弹前端周期性脱离汽泡。增加冷却强度会使汽泡的脱离频率增大，脱离直径减小；长汽弹前端周期性脱离汽泡是由于汽液界面具有较大的韦伯数。汽泡在该微通道内的运动过程中直径基本不变是由于汽泡在通道内的滞留时间远小于汽泡完全冷凝所需的总时间。 为澄清并联通道的多通道效应对微尺度凝结换热的影响，作者设计了由三个矩形通道组成的并联微通道冷凝器。研究发现，通道中的流型结构与单通道凝结过程类似，均为上游呈准静止状态的长汽弹和下游周期性的汽泡脱离。在中间通道和侧通道中，总共发现了三种不同的汽泡脱离模式，即单汽丝断裂模式、双汽丝同步断裂模式以及双汽丝非同步断裂模式。多通道效应主要表现在由于硅基固体导热的影响，三个通道中具有不同的温度分布，中间通道的温度关于其中心线成对称分布，而两侧通道中的高温区域均靠向中间通道。虽然硅具有良好的导热性，整个硅基上的温差很小，但在微尺度下，小温差依然可以导致较大的温度梯度，造成中间通道的双汽丝关于其中心线成对称分布，并且总是发生同步断裂；侧通道中的双汽丝偏向中间通道，并且在靠近中间通道的一侧汽丝总是首先发生断裂。由于温度梯度引起的Maragnoni对流效应，侧通道中的汽泡脱离后便靠向高温侧。 在微汽泡动力学研究中，设计了一种尺寸为 的Pt薄膜微加热器，研究了脉冲控制参数对微加热器上汽泡动力学特性的影响。研究发现在该微加热器上发生汽泡核化时，核化温度均达到液体的过热极限，因此为均质核化过程。在不同的脉冲控制参数下，存在三类不同的汽泡动力学特性，即（1）汽泡爆炸性生长和冷凝以及汽泡二次生长；（2）汽泡爆炸性生长继而分裂、吸引并聚合；（3）汽泡振荡生长而后持续生长并最终达到稳定状态。在第（1）类中，汽泡二次生长是由于脉冲加热过程中在玻璃基片上储存了热量；在第（2）类中，汽泡冷凝过程中的Marangoni效应导致分裂后的汽泡互相吸引并最终聚合。在第（3）类中，汽泡尺寸最终达到稳定是由于汽泡内蒸汽的发生量与汽液界面上蒸汽的凝结量相等。 本文的研究将为微反应器、微型燃料电池、微换热器、微汽泡执行器等相变微流控系统的设计和运行提供科学指导。

Multi-channel effect of condensation flow in a micro triple-channel condenser

Multi-channel effect is important to understand transport phenomenon in phase change systems with parallel channels. In this paper, visualization studies were performed to study the multi-channel effect in a silicon triple-channel condenser with an aspect ratio of 0.04. Saturated water vapor was pumped into the microcondenser, which was horizontally positioned. The condenser was cooled by the air natural convention heat transfer in the air environment. Flow patterns are either the annular flow at high inlet vapor pressures, or a quasi-stable elongated bubble at the microchannel upstream followed by a detaching or detached miniature bubble at smaller inlet vapor pressures. The downstream miniature bubble was detached from the elongated bubble tip induced by the maximum Weber number there. It is observed that either a single vapor thread or dual vapor threads are at the front of the elongated bubble. A miniature bubble is fully formed by breaking up the vapor thread or threads. The transient vapor thread formation and breakup process is exactly symmetry against the centerline of the center channel. In side channels, the Marangoni effect induced by the small temperature variation over the channel width direction causes the vapor thread formation and breakup process deviating from the side channel centerline and approaching the center channel. The Marangoni effect further forces the detached bubble to rotate and approach the center channel, because the center channel always has higher temperatures, indicating the multi-channel effect. 

蒸发相变与界面流动耦合机理研究

本文提出了一种新模型来研究液层在其纯蒸气中的蒸发热动力学特征,尤其是当蒸发界面张力驱动流占主导作用时(如微重力环境中)液层热毛细对流和界面蒸发始终耦合在一起. 气一液界面的传热传质规律有待深入研究. 本文数值模拟研究了蒸发相变界面热毛细对流与蒸发效应的耦合机质,得到了不同蒸发模式和不同强度热毛细对流蒸发液层的温度分布、蒸发速率以及对流流场分布的数值解. 论述了蒸发Biot数和Marangoni数对界面传热传质的影响,发现并解释了蒸发和热毛细耦合的三种模式

快重离子辐照引起Ni/SiO2界面原子混合及相变研究

Ni/SiO2 interface were irradiated at room temperature with 308 MeV Xe ions to 1×1012,5×1012 Xe/cm2 and 853 MeV Pb ions to 5×1011 Pb/cm2,respectively.These samples were analyzed using Rutherford Backscattering Spectrometry(RBS) and X-ray diffraction spectroscopy(XRD),from which the intermixing and phase change were investigated.The obtained results show that both Xe-and Pb-ions could induce diffusion of Ni atoms to SiO2 substrates and result in intermixing of Ni with SiO2.Furthermore,1.0×1012 Xe/cm2 irradiat...中文摘要：在室温下用308 MeV的Xe离子和853 MeV的Pb离子辐照Ni/SiO2样品,用卢瑟福背散射和X射线衍射技术对样品进行了分析。通过分析Ni/SiO2样品中元素成分分布和结构随离子辐照剂量和电子能损的变化,探索了离子辐照在Ni/SiO2样品中引起的界面原子混合与结构相变现象。实验结果显示,Xe和Pb离子辐照均能引起明显的Ni原子向SiO2基体的扩散并导致界面附近Ni,Si和O原子的混合。实验观测到低剂量Xe离子辐照可产生NiSi2相,而高剂量Xe离子辐照则导致了Ni3Si和NiO相的形成。根据热峰模型,Ni原子的扩散和新相的形成可能由沿离子入射路径强电子激发引起的瞬间热峰过程驱动。