GaAs基上的InAs量子环制备

在分子束外延系统中,利用3 nm GaAs薄盖层将InAs自组装量子点部分覆盖,然后在500℃以及As_2气氛中退火一分钟,制成纳米尺度的InAs量子环.这一形成敏感地依赖于退火时的生长条件和生长InAs自组装量子点时的淀积量.InAs在GaAs表面的扩散以及同时发生的In-Ga互混控制着InAs量子环的形成.

Electrical properties of GaN deposited on nitridated sapphire by molecular beam epitaxy using NH3 cracked on the growing surface

We have found that GaN epilayers grown by NH3-source molecular beam epitaxy (MBE) contain hydrogen. Dependent on the hydrogen concentration, GaN on (0001) sapphire can be either under biaxially compressive strain or under biaxially tensile strain. Furthermore, we notice that background electrons in GaN increase with hydrogen incorporation. X-ray photoelectron spectroscopy (XPS) measurements of the N1s region indicate that hydrogen is bound to nitrogen. So, the microdefect Ga...H-N is an effective nitrogen vacancy in GaN, and it may be a donor partly answering for the background electrons. (C) 1999 Elsevier Science B.V. All rights reserved.

突出电极对四杆型RFQ腔体并联阻抗及场平整性的影响；Influence of projecting electrodes on shunt impedance and flatness of 4-rod radiofrequency quadrupole cavity

中国科学院近代物理研究所正在进行等离子体直接注入方案的研究,以便为重离子物理研究提供稳定可靠的高流强束流。由于工作频率较低,用于等离子体直接注入方案的RFQ腔体采用了适合于低频的四杆型结构。在完成束流动力学设计的前提下,研究了RFQ腔体支撑臂的各参数对并联阻抗的影响。由于突出电极之间存在着一定大小的电容,会对腔体的性能产生影响,为使腔体达到最优化的设计,进行了突出电极对并联阻抗及场平整性的影响的研究,并给出了突出电极的取值范围。