46 resultados para Verrazzano, Giovanni da, 1485-1528.


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公平性、透明性是联合决策的基本安全需求.结合多机构商务合作背景,利用具有同态性质的Paillier公钥密码系统和门限密码技术,提出了面向有差异群体的联合决策策略与方案,并对其安全性进行了分析和证明.

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An actively mode-locked fiber ring laser based on cross-gain modulation (XGM) in a semiconductor optical amplifier (SOA) is demonstrated to operate stably with a simple configuration. By forward injecting an easily-generated external pulse train, the mode-locked fiber laser can generate an optical-pulse sequence with pulsewidth about 6 ps and average output power about 7.9 mW. The output pulses show an ultra-low RMS jitter about 70.7 fs measured by a RF spectrum analyzer. The use of the proposed forward-injection configuration can realize the repetition-rate tunability from I to 15 GHz for the generated optical-pulse sequences. By employing a wavelength-tunable optical band-pass filter in the laser cavity, the operation wavelength of the designed SOA-based actively mode-locked fiber laser can be tuned continuously in a wide span between 1528 and 1565 nm. The parameters of external-injection optical pulses are studied experimentally to optimize the mode-locked fiber laser. (C) 2009 Elsevier B.V. All rights reserved.

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提出了一种多环形腔(MRC)结构的稳定可调的单纵模(SLM)掺铒光纤激光器,多环形腔结构由双环形有源腔和两个次级无源腔组成。这种激光器是利用光纤法布里-珀罗可调滤波器(FFP-TF)以及光学光栅滤波器(OGF)两种滤波器和多环形腔结构相结合来共同选模。可实现波长调节范围为1528~1565 nm,在整个波长调节范围内边模抑制比大于44.53 dB,在1554 nm附近边模抑制比可以达到最大值51.18 dB, 输出功率为-8.84 dBm,通过应用多环型腔结构,激光器的输出很稳定,在18 min的观察时间内,中心波长的变化小于0.02 nm,输出功率的变化小于0.04 dBm,实现了稳定且可调谐的单纵模输出。

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The molecular beam epitaxial growth of high quality epilayers on (100) InP substrate using a valve phosphorous cracker cell over a wide range of P/In BEP ratio (2.0-7.0) and growth rate (0.437 and 0. 791μm/h). Experimental results show that electrical properties exhibit a pronounced dependence on growth parameters,which are growth rate, P/In BEP ratio, cracker zone temperature, and growth temperature. The parameters have been optimized carefully via the results of Hall measurements. For a typical sample, 77K electron mobility of 4.57 × 10^4 cm^2/(V · s) and electron concentration of 1.55×10^15 cm^-3 have been achieved with an epilayer thickness of 2.35μm at a growth temperature of 370℃ by using a cracking zone temperature of 850℃.