U型凹槽电极硅MSM结构光电探测器的研制

为了提高硅MSM结构光电探测器的光电响应度,制备了U型凹槽电极结构的探测器。5 V偏压下,对650 nm波长入射光的绝对光电响应度测试表明,凹槽电极结构的探测器最大光电响应度值为0.486 A/W,比同样尺寸的平版结构光电探测器提高了约6倍。文中也对比了具有抗反射膜和不具有抗反射膜的器件相对响应光谱的差别,并且比较分析了叉指间隙分别为5μm和10μm器件光电响应的不同。

LCD-TV用直下式LED背光源的光学设计

三基色LED背光源是成就高品质液晶显示器的关键技术之一，其色域是传统CCFL背光源的150％以上。其中直下式背光源具有结构简单、光利用率高的特点，是目前大尺寸液晶显示背光源的首选，但是由于没有导光板，直下式背光源的光均匀性变得较差。通过对LED光场分布的模拟和分析，得出了一种新型LED光场分布设计，对由此光场分布的三基色LED组成的66cm（26in）背光源模拟表明，该背光源在未加扩散膜前，灯箱厚度为20～28mm时，亮度均匀度大于83％，△U’V’值在0．01左右；加上扩散膜之后，灯箱厚度为20mm时，均匀度可达到89．58％，△U’V’值达到0．0041。

U-transformation-finite element method in 3-dimensional analysis of orthotropic laminates

For an orthotropic laminate, an equivalent system with doubly cyclic periodicity is introduced. Then a 3-dimensional finite element model for the equivalent system is transformed into the unitary space, where the large finite element matrix equation is decoupled into some small matrix equations. Such a decoupling very efficiently reduces the computational effort. For an orthotropic laminate with four clamped edges, no exact elasticity solution is available, and the deflection values predicted by different methods have a considerable difference each other for a small length-to-thickness ratio. The present predictions are the largest because the present method is a full 3-dimensional finite element analysis without superfluous constraints. Illustrative numerical examples are presented to observe the distributions of stresses through the thickness of the laminates. (C) 2010 Elsevier Ltd. All rights reserved.

Design of the IMP microbeam irradiation system for 100 MeV/u heavy ions

Abstract A state-of-the-art high energy heavy ion microbeam irradiation system is constructed at the Institute of Modern Physics of the Chinese Academy of Sciences. This microbeam system operates in both full current intensity mode and single ion mode. It delivers a predefined number of ions to preselected targets for research in biology and material science. The characteristic of this microbeam system is high energy and vertical irradiation. A quadrupole focusing system, in combination with a series of slits, has been designed to optimize the spatial resolution. A symmetrically achromatic system leads the beam downwards and serves simultaneously as an energy analyzer. A high gradient quadrupole triplet finally focuses a C6+ ion beam to 1 µm in the vacuum chamber within the energy range from 10 MeV/u to 100 MeV/u. In this paper, the IMP microbeam system is described in detail. A systematic investigation of the ion beam optics of this microbeam system is presented together with the associated aberrations. Comparison is made between the IMP microbeam system and the other existing systems to further discuss the performance of this microbeam. Then the optimized initial beam parameters are given for high resolution and high hitting efficiency. At last, the experiment platform is briefly introduced.