Cone Effect in Astronomical Adaptive Optics System Investigated by a Pure Numerical Simulation

It is well-known that cone effect or focus anisoplanatism is produced by the limited distance of a laser guide star (LGS) which is created within the Earth atmosphere and consequently located at a finite distance from the observer. In this paper, the cone effect of the LGS for different vertical profiles of the refractive index structure constant Cn2 is numerically investigated by using a revised computer program of atmospheric propagation of optical wave and an adaptive optics (AO) system including dynamic control process. According to the practice, the overall tilt for the tilt-correction mirror is obtained from a natural star and the aberrated wavefront for phase correction of the deformable mirror is obtained from a LGS in our numerical simulation. It is surprisingly found that the effect of altitude of the LGS on the AO phase compensation effectiveness by using the commonly-available vertical profiles of Cn2 and the lateral wind speed in the atmosphere is relatively weak, and the cone effect for some Cn2 profiles is even negligible. It is found that the cone effect does not have obvious relationship with the turbulence strength, however, it depends on the vertical distribution profile of Cn 2 apparently. On the other hand, the cone effect depends on the vertical distribution of the lateral wind speed as well. In comparison to a longer wavelength, the cone effect becomes more obvious in the case of a shorter wavelength. In all cases concerned in this paper, an AO system by using a sodium guide star has almost same phase compensation effectiveness as that by using the astronomical target itself as a beacon. Effect of dynamic control process in an AO system on the cone effect is studied in this paper for the first time within our knowledge.

Aberration measurement of projection optics in lithographic tools based on two-beam interference theory

The degradation of image quality caused by aberrations of projection optics in lithographic tools is a serious problem in optical lithography. We propose what we believe to be a novel technique for measuring aberrations of projection optics based on two-beam interference theory. By utilizing the partial coherent imaging theory, a novel model that accurately characterizes the relative image displacement of a fine grating pattern to a large pattern induced by aberrations is derived. Both even and odd aberrations are extracted independently from the relative image displacements of the printed patterns by two-beam interference imaging of the zeroth and positive first orders. The simulation results show that by using this technique we can measure the aberrations present in the lithographic tool with higher accuracy. (c) 2006 Optical Society of America.

Aberration measurement of projection optics in lithographic tools by use of an alternating phase-shifting mask

As a critical dimension shrinks, the degradation in image quality caused by wavefront aberrations of projection optics in lithographic tools becomes a serious problem. It is necessary to establish a technique for a fast and accurate in situ aberration measurement. We introduce what we believe to be a novel technique for characterizing the aberrations of projection optics by using an alternating phase-shifting mask. The even aberrations, such as spherical aberration and astigmatism, and the odd aberrations, such as coma, are extracted from focus shifts and image displacements of the phase-shifted pattern, respectively. The focus shifts and the image displacements are measured by a transmission image sensor. The simulation results show that, compared with the accuracy of the previous straightforward measurement technique, the accuracy of the coma measurement increases by more than 30% and the accuracy of the spherical-aberration measurement increases by approximately 20%. (c) 2006 Optical Society of America.

Measurement technique for in situ characterizing aberrations of projection optics in lithographic tools

As the feature size decreases, degradation of image quality caused by wavefront aberrations of projection optics in lithographic tools has become a serious problem in the low-k1 process. We propose a novel measurement technique for in situ characterizing aberrations of projection optics in lithographic tools. Considering the impact of the partial coherence illumination, we introduce a novel algorithm that accurately describes the pattern displacement and focus shift induced by aberrations. Employing the algorithm, the measurement condition is extended from three-beam interference to two-, three-, and hybrid-beam interferences. The experiments are performed to measure the aberrations of projection optics in an ArF scanner. (C) 2006 Optical Society of America.

Microoptical research in Shanghai Institute of Optics and Fine Mechanics

This paper summarized the recent research results of Changhe Zhou's group of Information Optics Lab in Shanghai Institute of Optics and Fine Mechanics (SIOM). The first is about the Talbot self-imaging research. We have found the symmetry rule, the regular-rearranged neighboring phase difference rule and the prime-number decamping rule, which is briefly summarized in a recent educational publication of Optics and Photonics News, pp.46-50, November 2004. The second is about four novel microoptical gratings designed and fabricated in SIOM. The third is about the design and fabrication of novel supperresolution phase plates for beam shaping and possible use in optical storage. The fourth is to develop novel femtosecond laser information processing techniques by incorporating microoptical elements, for example, use of a pair of reflective Dammann gratings for splitting the femtosecond laser pulses. The most attractive feature of this approach is that the conventional beam splitter is avoided. The conventional beam splitter would introduce the unequal dispersion due to the broadband spectrum of ultrashort laser pulses, which will affect the splitting result. We implemented the Dammann splitting apparatus by using two-layered reflective Dammann gratings, which generates the almost same array without angular dispersion. We believe that our device is highly interesting for splitting femtosecond laser pulses.

Coma measurement of projection optics in lithographic tools based on relative image displacements at multiple illumination settings

In this paper, we propose a novel method for measuring the coma aberrations of lithographic projection optics based on relative image displacements at multiple illumination settings. The measurement accuracy of coma can be improved because the phase-shifting gratings are more sensitive to the aberrations than the binary gratings used in the TAMIS technique, and the impact of distortion on displacements of aerial image can be eliminated when the relative image displacements are measured. The PROLITH simulation results show that, the measurement accuracy of coma increases by more than 25% under conventional illumination, and the measurement accuracy of primary coma increases by more than 20% under annular illumination, compared with the TAMIS technique. (c) 2007 Optical Society of America.

Fetntosecond pulse shaping with space-to-time conversion based on planar optics

We propose a novel structure of planar optical configuration for implementation of the space-to-time conversion for femtosecond pulse shaping. The previous apparatuses of femtosecond pulse shaping are 4f Fourier-transforming type system that is usually large, expensive, difficult to align. The planar integration of free-space optical systems on solid substrates is an optical module with the attractive advantages of compact, reliable and robust. This apparatus is analyzed in details and the design of the particular lens for femtosecond pulse shaping based on planar optics is presented. (c) 2006 Elsevier GmbH. All rights reserved.

基于达曼光栅的动态光耦合器

提出了一种基于达曼光栅的动态光耦合器,通过控制装置中达曼光栅位移参量,可实现入射光束的分束或合束以及两者之间的动态转换。适当选择达曼光栅类型可实现任意N×M的动态光耦合。实验中以1550 nm光波长为例,对1×8达曼动态光耦合器进行测量,测得其实现光开关功能时插入损耗为0.43 dB,实现光分束功能时均匀性达到0.03,单路插入损耗均值为10.5 dB。该实验装置易于调节、体积小、能耗低,且关键元件达曼光栅制作工艺成熟,易于批量化生产。特别是在实现中大规模光交换阵列时,该方案就具有更明显的优越性,有实用意

Optical generaton of millimeter-wave pulses using a fiber Bragg grating in a fiber-optics system

A scheme is proposed to transform an optical pulse into a millimeter-wave frequency modulation pulse by using a weak fiber Bragg grating (FBG) in a fiber-optics system. The Fourier transformation method is used to obtain the required spectrum response function of the FBG for the Gaussian pulse, soliton pulse, and Lorenz shape pulse. On the condition of the first-order Born approximation of the weak fiber grating, the relation of the refractive index distribution and the spectrum response function of the FBG satisfies the Fourier transformation, and the corresponding refractive index distribution forms are obtained for single-frequency modulation and linear-frequency modulation millimeter-wave pulse generation. The performances of the designed fiber gratings are also studied by a numerical simulation method for a supershort pulse transmission. (c) 2007 Optical Society of America.

Multi-channel 2-D pattern transfer model based on imaging optics for submarine laser uplink communication

An optical communication scheme of 2-D pattern transfer based on imaging optics for submarine laser uplink communication (SLUC) is suggested. Unlike the methods aiming at avoiding neighboring crosstalk used in traditional multi-channel optical beam transferring, we make full use of the overlapping of each spreading beam other than controlling divergence effect of each beam to avoid interference noise. The apparent parameters have been introduced to simplify theoretical analysis of optical pattern transfer problem involving underwater condition, with the help of which the complex beam propagation inside two kinds of mediums can be easily reduced to brief beam transfer only inside air medium. In this paper, optical transmission path and receiver terminal optics geometry have been described in detail. The link range equation and system uplink performance analysis have also been given. At last, results of a proof-of-concept experiment indicate good feasibility of the proposed SLUC model. © 2007 Elsevier GmbH. All rights reserved.

Phase interpretation for polarization-dependent near-field images of high-density gratings

It has been described that the near-field images of a high-density grating at the half self-imaging distance could be different for TE and TM polarization states. We propose that the phases of the diffraction orders play an important role in such polarization dependence. The view is verified through the coincidence of the numerical result of finite-difference time-domain method and the reconstructed results from the rigorous coupled-wave analysis. Field distributions of TE and TM polarizations are given numerically for a grating with period d = 2.3 lambda, which are verified through experiments with the scanning near-field optical microscopy technique. The concept of phase interpretation not only explains the polarization dependence at the half self-imaging distance of gratings with a physical view, but also, it could be widely used to describe the near-field diffraction of a variety of periodic diffractive optical elements whose feature size comparable to the wavelength. (C) 2008 Elsevier B.V. All rights reserved.