Note on the instability of capillary jet with thermocapillarity

In this paper, we examine a new basic state of long axisymmetric liquid zone, subjected to axial temperature gradients which induce steady viscous flow driven by thermocapillarity. Axial velocity 1/4S-1/2R(B) of liquid zone connects pulling velocity of single crystal. The stability of liquid zone with pulling velocity 1/4S-1/2R(B) to small axisymmetric disturbance is examined The eigenvalue problems on the stability are derived. A special case (eta = 0) is discussed.

2000年国内期刊力学类论文情况分析

<正>本文以包括《爆炸与冲击》、《工程力学》、《固体力学学报》、《计算力学学报》、《空气动力学学报}}、《力学季刊》、《力学进展}）、《力学学报》、《力学与实践》、《实验力学》和《医用生物力学》等（按拼音顺序排列）国内力学类核心期刊在内的128种国内科技期刊为统计期刊源,统计了2000

低渗透多孔介质和微管液体流动尺度效应

常规多孔介质和圆管中液体的流动都遵循Hagen_Poisseuille定理 ,即液体流速和压力梯度成正比 .而对于低渗透多孔介质中液体渗流 ,存在拟启动压力梯度 ,即存在微尺度效应 .那么对于微圆管 ,由于流动的通道具有较小的空间尺度 ,因此在物理本质上 ,也应该存在微尺度效应 ,但由于目前实验手段的局限 ,还未能证明这一点 .本文通过对比和分析低渗透多孔介质和微管中液体流动规律 ,预测了微管中液体流动出现微尺度效应的尺度约为 1微米

燃烧物理学基础

Angular distribution and conversion of multi-keV L-shell X-ray sources produced from nanosecond laser irradiated thick-foil targets

An experimental study on the angular distribution and conversion of multi-keV X-ray sources produced from 2 ns-duration 527nm laser irradiated thick-foil targets on Shenguang II laser facility (SG-II) is reported. The angular distributions measured in front of the targets can be fitted with the function of f(theta) = alpha+ (1- alpha)cos(beta) theta (theta is the viewing angle relative to the target normal), where alpha = 0.41 +/- 0.014, beta = 0.77 +/- 0.04 for Ti K-shell X-ray Sources (similar to 4.75 keV for Ti K-shell), and alpha = 0.085 +/- 0.06, beta = 0.59 +/- 0.07 for Ag/Pd/Mo L-shell X-ray Sources (2-2.8 keV for Mo L-shell, 2.8-3.5 keV for Pd L-shell, and 3-3.8 keV for Ag L-shell). The isotropy of the angular-distribution of L-shell emission is worse than that of the K-shell emission at larger viewing angle (>70 degrees), due to its larger optical depth (stronger self-absorption) in the cold plasma side lobe Surrounding the central emission region, and in the central hot plasma region (emission region). There is no observable difference in the angular distributions of the L-shell X-ray emission among Ag, Pd, and Mo. The conversion efficiency of Ag/Pd/Mo L-shell X-ray sources is higher than that of the Ti K-shell X-ray sources, but the gain relative to the K-shell emission is not as high as that by using short pulse lasers. The conversion efficiency of the L-shell X-ray sources decrease, with increasing atomic numbers (or X-ray photon energy), similar to the behavior of the K-shell X-ray Source.

Ground-state energy shifts of H-like Ti under dense and hot plasma conditions

In this study, by adopting the ion sphere model, the self-consistent. field method is used with the Poisson-Boltzmann equation and the Dirac equation to calculate the ground-state energies of H-like Ti at a plasma electron density from 10(22) cm(-3) to 10(24) cm(-3) and the electron temperature from 100 eV to 3600 eV. The ground-state energy shifts of H-like Ti show different trends with the electron density and the electron temperature. It is shown that the energy shifts increase with the increase in the electron density and decrease with the increase in the electron temperature. The energy shifts are sensitive to the electron density, but only sensitive to the low electron temperature. In addition, an accurately fitting formula is obtained to fast estimate the ground-state energies of H-like Ti. Such fitted formula can also be used to estimate the critical electron density of pressure ionization for the ground state of H-like Ti.

利用本征脸方法减少冷原子云吸收成像照片中的干涉条纹

本征脸方法是广泛应用于人脸识别的一种图像处理方法，本文将其引入到原子芯片上囚禁的冷原子云吸收成像照片的图像处理中，以减少其中的干涉条纹，增加信噪比。本文首先介绍了吸收成像照片的标准处理方法以及干涉条纹的产生原因，由于参考照片和吸收成像照片中的干涉条纹会发生随机的相对变化，处理后干涉条纹难以消除。和标准的处理方法相比，本征脸方法不是使用1张而是50张参考照片，利用这些照片重构出一张新的参考照片，这张照片比那50张中的任何一张都更近似于吸收成像照片，因此和只使用1张参考照片相比，处理之后的干涉条纹对比度明显降

Thermal, structural and optical properties of NiOx thin films deposited by reactive dc-magnetron sputtering

The NiOx thin films were deposited by reactive dc-magnetron sputtering from a nickel metal target in Ar + O-2 with the relative O-2 content 5%. The as-deposited NiOx, thin films could represent a two-component system comprising crystalline NiO particles dispersed in an amorphous Ni2O3. Decomposition temperature of the as-deposited NiO, thin films was at about 263 degrees C. After annealed at 400 degrees C for 30 min in air, the surface morphology of the films became very rough due to the decomposition of the Ni2O3, leading to the changes of the optical properties of the NiO, thin films. The reflectivity of the films annealed at 400 degrees C was lower than that of the as-deposited one and the optical contrast was 52% at 405 nm. (c) 2006 Elsevier B.V. All rights reserved.

改善高功率激光二极管阵列光束质量的一种新方法

根据波导模理论,推导了高功率激光二极管阵列的远场分布,根据其分布特点,设计了一种离轴外腔.运用这种外腔,在工作电流为17A时,光束的束宽积从自由运转时的1100mm.mrad减小到128mm.mrad,二极管阵列的光束质量提高了8.5倍左右,输出功率约为自由运转时的75%.

不同氧磷比对磷酸盐包边玻璃性质的影响规律

包边技术是提高大尺寸激光玻璃饱和增益系数的关键技术。采用传统的方法熔制玻璃,研究了 P2O5含量对 P2O5-Al2O3-B2O3-CuCl-Na2O-ZnO磷酸盐包边玻璃的折射率、热膨胀系数、玻璃转变温度、膨胀软化温度以及化学稳定性的影响。结果表明：当 P2O5的摩尔分数为 60%左右,玻璃样品具有最高的折射率（1.522 0）、最低的玻璃转变温度（352.4 ℃）、较好的化学稳定性[0.52 mg/（cm^2·d）]和适宜的热膨胀系数（128.427×10^-7/℃）,是用作钕磷酸盐激光玻璃硬包边的理

Epitaxial growth of ZnO thin films on LiGaO2 substrates by pulsed-laser deposition

Lattice-matched (Delta(a/a) = 1.8-3.4%) (001) LiGaO2 substrates have been employed for the first time to grow ZnO thin films by pulsed-laser deposition at 350-650 degrees C with oxygen partial pressure of 20Pa. XRD shows that a highly c-axis-oriented ZnO film can be deposited on (001) LiGaO2 substrate at 500 degrees C. AFM images reveal the surfaces of as-deposited ZnO films are smooth and root-mean-square values are 6.662, 5.765 and 6.834 nm at 350, 500 and 650 degrees C, respectively. PL spectra indicate only near-band-edge UV emission appears in the curve of ZnO film deposited at 500 degrees C. The deep-level emission of ZnO film deposited at 650 degrees C probably results from Li diffusion into the film. All the results illustrate substrate temperature plays a pretty important role in obtaining ZnO film with a high quality on LiGaO2 substrate by pulsed-laser deposition. (c) 2006 Elsevier B.V. All rights reserved.