410 resultados para Mn doping


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Chemical-looping reforming (CLR) is a technology that can be used for partial oxidation and steam reforming of hydrocarbon fuels. It involves the use of a metal oxide as an oxygen carrier, which transfers oxygen from combustion air to the fuel. Composite oxygen carriers of cerium oxide added with Fe, Cu, and Mn oxides were prepared by co-precipitation and investigated in a thermogravimetric analyzer and a fixed-bed reactor using methane as fuel and air as oxidizing gas. It was revealed that the addition of transition-metal oxides into cerium oxide can improve the reactivity of the Ce-based oxygen carrier. The three kinds of mixed oxides showed high CO and H-2 selectivity at above 800 degrees C. As for the Ce-Fe-O oxygen carrier, methane was converted to synthesis gas at a H-2/CO molar ratio close to 2:1 at a temperature of 800-900 degrees C; however, the methane thermolysis reaction was found on Ce-Cu-O and Ce-Mn-O oxygen carriers at 850-900 degrees C. Among the three kinds of oxygen carriers, Ce-Fe-O presented the best performance for methane CLR. On Ce-Fe-O oxygen carriers, the CO and H-2 selectivity decreased as the Fe content increased in the carrier particles. An optimal range of the Ce/Fe molar ratio is Ce/Fe > 1 for Ce-Fe-O oxygen carriers. Scanning electron microscopy (SEM) analysis revealed that the microstructure of the Ce-Fe-O oxides was not dramatically changed before and after 20 cyclic reactions. A small amount of Fe3C was found in the reacted Ce-Fe-O oxides by X-ray diffraction (XRD) analysis.

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利用金属型铸造制备了Mg-5Al-0.3Mn-xRE (x = 0~4, wt%,RE = Ce, Nd, Sm, Y和(CeLa)混合稀土)系列合金,研究了铸态合金的组织和力学性能。利用轧制和挤压技术对优化出的合金进行了变形加工处理,并研究了合金加工后的组织和力学性能。 对于铸态合金,稀土元素不仅可以细化合金的晶粒,而且形成不同类型的Al-RE化合物,含Ce的合金中生成Al11Ce3相,含Nd或Sm的合金中,主要生成Al11Nd3 (Al11Sm3)相和少量的Al2Nd (Al2Sm)相,含Y的合金中生成Al2Y相。另外,添加稀土可以改变Mg17Al12相的形貌,使其变得更加细小、弥散。添加适量的稀土可以明显提高铸态合金在室温和150℃下的力学性能,Mg-5Al-0.3Mn-1.5Ce, Mg-5Al-0.3Mn-2Nd和Mg-5Al-0.3Mn-2Sm合金在各自的体系中具有最佳的综合力学性能。合金力学性能提高的主要原因是细晶强化、Al-RE化合物第二相强化以及减弱Mg17Al12相对合金高温力学性能的不利影响。 对Mg-5Al-0.3Mn-(1.0, 1.5, 2.0)Ce,Mg-5Al-0.3Mn-2Nd,Mg-5Al-0.3Mn-1.5(CeLa)和Mg-5Al-0.3Mn-3Y合金在300-400℃下进行了热轧制或挤压变形,与铸态合金相比,轧制和挤压合金具有更高的力学性能。轧制合金的室温抗拉强度为290-340 MPa,较铸态合金提高约50%,屈服强度约为210-260 MPa,较铸态合金提高约2倍。挤压态合金的抗拉强度为260-270 MPa,屈服强度为160-190MPa,伸长率为20-22%;150℃的力学性能也得到了明显改善。 结合热力学计算、合金化元素之间的电负性差、化合物相的生成焓数据以及相图计算,阐述了稀土化合物相的生成机制,稀土元素与Al元素之间的电负性差大于其与Mg之间的电负性差,且Al-RE相的生成焓远低于Mg-RE和Mg-Al相的生成焓,因此在Mg-Al合金中加入RE后,RE优先与Al形成Al-RE化合物。从晶粒细化、化合物强化相的生成和演变、变形加工处理的位错交互作用等方面讨论了合金的强化机制,认为细晶强化、第二相强化及形变强化是提高合金力学性能的主要机制。

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、I钠原子激光增强电离光谱(LEIS)方法的研究-以石墨杯为原子化器在LEIS方法中,最常见的原子化器是火焰。但由于火焰背景噪声严重且难以克服,在火焰原子化过程中,雾化和热离解不充分,仅有10~(-2)%的分析溶液参与吸收以及火焰气体使测定元素受到高度稀释等不利因素的影响,火焰原子化限制了LEIS方法灵敏度的进一步提高。考虑到石墨炉原子化器较火焰具有取样量少,绝对灵敏度高;样品(包括固态、液态)可直接引入石墨炉内;不会发生如同火焰中所存在的干扰效应;蒸发效率和原子化效率较高,几乎全部样品都能参与吸收等优点,本工作在已建立火焰LEIS方法的实验基础上,将原子化器改换为石墨杯进行了钠原子LEIS方法的研究。到目前为止,国内外仅有的几篇有关石黑炉LEIS的研究报告中,都报导了该方法对钠原子的检出限估计可达到10~(-14)-10~(-15)克,由于此项研究尚处于探索性研究阶段,故有关方法性的系统研究几乎还未见报导。本工作在未使用任何放大器的情况下(实验条件限制)对影响钠原子LEIS信号强度的诸因互进行了实验观察。主要包括:钠原子化条件;激光束位置、阳极电压、激光输出能量、电极位置以及激光脉冲重复率对LEIS信号强度的影响等。并绘制了校准曲线,统计方法的相对标准偏差分别为11%(高浓度)18.2%(低浓度),在现有仪器条件下,还不能测出检出限,测定下限为3*10~(-9)克。对固体粉末直接进行了尝试,检测下限为5*10~(-8)克,进样是为5毫克。在进一步的研究工作中,如有条件使用低噪声的放大器及Bxear积分器,选择门检时间窗,或采用分步激发等手段,估计本方法定会达到预想的高灵敏度,检敏度至少提高了个数量级。对石墨炉原子化LEIS法来说,似比较详细的研究报告,截至实验停止时还未见报导。II原子吸收光谱法对发样中Zn、Cu、Mn、Al的测定发中微量元素ZN、Cu、Mn均属人体必需元素,与人体的生长发育和多种生理功能,临床医学等方面有着极为密切的关系,而Al则被认为是异致某种疾病的元素之一。本工作报告了用火焰法测定Zn、Cu;石墨炉法测定Al、Mn的结果,其中,对Al的测定,为摆脱基体干扰,加入改进剂Mg(NO_3)_2,并采用平台石墨炉进行试验,得到了线性较好的工作曲线,但在实际测定时,由于实验条件的限制,只能采用一般石墨管加基体改进剂对少娄样品中Al含量进行测定。Zn、Cu、Al三种元素由标准曲线法测定;而Mn由于Fe的干扰无法消除而采用标准加入法测定,并因此限制了测定样品数。Cu、ZN、Mn三种元素的回收率分别为102.8%, 99.7%, 102.5%,变异系数为9.6%, 11.3%, 9.7%,对本地居民发中(30个发样)Zn、Cu含量进行测定,Zn、Cu的含量范围为148-318ppm,7.2-15ppm,并计算了Zn/Cu比。本方法对发样中四种元素的测定结果与ICP法进行对照。两种方法测定结果吻合得较好。

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钙钛石型复合氧化物由于具有许多独特的物理化学性质,如多种类型的磁性和导电性、对多种物理和化学因素的敏感性、高温下的稳定性和结构的明确易调性等长期以来一直受到固体物理、固体化学和催化科技工作者重视,本文第一部分详细总结了文献中有关这类氧化物的结构、电子状态、电磁性质、表面吸附性能、稳定性以及反应机理和催化性能等方面的重要结果。第二部分为催化剂的制备和表征方法。第三部分针对文献中研究较少的B位取代钙钛石型氧化物,系统研究了系列化合物LaM_yM'_(1-y)O_a (M, M' = Mn, Fe, Co)的固体物理化学性质和对NH3和CO氧化反应的催化性能,讨论了它们之间的关系。1. 催化剂的制备、晶体结构与光谱性质。2. LaM_yM'_(1-y)O_3(M、M' = Mn、Fe、Co)r的氧化还原性质和稳定性。3. 过渡金属离子的状态及其之间的相互作用。4. 催化剂中氧的形态。5. 氨氧化性能与固体物化性质之间的关系。6. 一氧化碳氧化与固体物化性质之间的关系。

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A theoretical description of chloride vapour-phase epitaxy (CVPE) has been proposed which contains two-dimensional (2D) gas-dynamic equations for transport of reactive components and kinetic equations for surface growth processes connected by nonlinear adiabatic boundary conditions. No one of these stages is supposed to be the limiting one. Calculated variations of growth rate and impurity concentrations along the growing layer fit experimental data well.

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We have studied the photovoltaic effects in Si doping superlattices (nipi) under different excitation conditions with and without additional cw optical biasing using a He-Ne laser. On the basis of the photovoltaic theory of carrier spatial separation in superlattices, we propose the concept of spatial fixity of the photovoltage polarity in type-II superlattices and examine the experimental results. The photovoltaic effect in Si nipi is found mainly from the direct transitions related with shallow impurities in real space, not the electron-hole band-to-band process as in GaAs nipi.

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Solid films containing phosphorus impurities were formed on p-type silicon wafer surface by traditional spin-on of commercially available dopants. The doping process is accomplished by irradiating the sample with a 308 nm XeCl pulsed excimer laser. Shallow junctions with a high concentration of doped impurities were obtained. The measured impurity profile was ''box-like'', and is very suitable for use in VLSI devices. The characteristics of the doping profile against laser fluence (energy density) and number of laser pulses were studied. From these results, it is found that the sheet resistance decreases with the laser fluence above a certain threshold, but it saturates as the energy density is further increased. The junction depth increases with the number of pulses and the laser energy density. The results suggest that this simple spin-on dopant pre-deposition technique can be used to obtain a well controlled doping profile similar to the technique using chemical vapor in pulsed laser doping process.

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