Pattern formation in polymer films under the mask

This paper presents a straightforward method for patterning thin films of polymers, i.e. a prepatterned mask is used to induce self-assembly of polymers and the resulting pattern is the same as the lateral structures in the mask on a submicrometre length scale, The patterns can be formed at above T-g + 30 degreesC in a short time and the external electric field is not crucial. Electrostatic force is assumed to be the driving force for the pattern transfer. Viscous fingering and novel stress-relief lateral morphology induced under the featureless mask are also observed and the formation mechanisms are discussed.

A new method for fabrication of three-dimensional polymer micropatterning - Microtransfer molding

Microtransfer molding (muTM) is a kind of soft lithography for polymer micropatterning. In muTM, a liquid prepolymer(or concentrated polymer solution) is applied to the patterned surface of an elastomeric mold and then brought into the contact with a substrate. After prepolymer is cured thermally or by UV light, the elastomeric mold is peeled away. A pattern is left on the surface of the substrate. In this study, similar to300 nm lines and three-dimensional patterns of PMMA and epoxy on planar and/or non-planar substrates are realized.

Possibility of design of nanodevices by confined macromolecular self-assembly

Computer simulation has revealed that dual nanostructures for the development of nanodevices as nanowires, optical nanofibres and nanobatteries be obtained by the self-assembly of block copolymers confined geometry. The formation of individual nanostructures depends on the structures of block copolymers the confinement geometry and the interactions block copolymers and the boundary of the confinement geometry. In order to obtain individual nanostructures experimentally, attention needs to be paid to the manufacture of the confinement geometry and the design of the interactions between block copolymers and the boundary of the confinement geometry, The recently developed lithography technique should make experiments successful.