XPS and F-19 NMR study of the photodegradation at 157 nm of photolithographic-grade teflon AF thin films


Autoria(s): Blakey, I.; George, G. A.; Hill, D. J. T.; Liu, H. P.; Rasoul, F.; Whittaker, A. K.; Zimmerman, P.
Contribuinte(s)

T.P. Lodge

Data(s)

01/01/2005

Identificador

http://espace.library.uq.edu.au/view/UQ:77205

Idioma(s)

eng

Publicador

American Chemical Society

Palavras-Chave #Polymer Science #Fluoropolymers #Pellicles #2,2-bis(trifluoromethyl)-4,5-difluoro-1,3-dioxole #Poly(tetrafluoroethylene) #Tetrafluoroethylene #Identification #Transparency #Spectroscopy #Irradiation #Vacuum #C1 #250504 Polymerisation Mechanisms #680303 Polymeric materials (e.g. paints)
Tipo

Journal Article