XPS and F-19 NMR study of the photodegradation at 157 nm of photolithographic-grade teflon AF thin films

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Autoria(s): Blakey, I.; George, G. A.; Hill, D. J. T.; Liu, H. P.; Rasoul, F.; Whittaker, A. K.; Zimmerman, P.

Contribuinte(s)	T.P. Lodge
Data(s)	01/01/2005
Identificador	http://espace.library.uq.edu.au/view/UQ:77205
Idioma(s)	eng
Publicador	American Chemical Society
Palavras-Chave	#Polymer Science #Fluoropolymers #Pellicles #2,2-bis(trifluoromethyl)-4,5-difluoro-1,3-dioxole #Poly(tetrafluoroethylene) #Tetrafluoroethylene #Identification #Transparency #Spectroscopy #Irradiation #Vacuum #C1 #250504 Polymerisation Mechanisms #680303 Polymeric materials (e.g. paints)
Tipo	Journal Article