HMDSO plasma polymerization and thin film optical properties
Contribuinte(s) |
Universidade Estadual Paulista (UNESP) |
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Data(s) |
27/05/2014
27/05/2014
01/12/1995
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Resumo |
Thin films were deposited from hexamethyldisiloxane (HMDSO) in a glow discharge supplied with radiofrequency (rf) power. Actino-metric optical emission spectroscopy was used to follow trends in the plasma concentrations of the species SiH (414.2 nm), CH (431.4 nm), CO (520.0 nm), and H (656.3 nm) as a function of the applied rf power (range 5 to 35 W). Transmission infrared spectroscopy (IRS) was employed to characterize the molecular structure of the polymer, showing the presence of Si-H, Si-O-Si, Si-O-C and C-H groups. The deposition rate, determined by optical interferometry, ranged from 60 to 130 nm/min. Optical properties were determined from transmission ultra violet-visible spectroscopy (UVS) data. The absorption coefficient α, the refractive index n, and the optical gap E04 of the polymer films were calculated as a function of the applied power. The refractive index at a photon energy of 1 eV varied from 1.45 to 1.55, depending on the rf power used for the deposition. The absorption coefficient showed an absorption edge similar to other non-crystalline materials, amorphous hydrogenated carbon, and semiconductors. For our samples, we define as an optical gap, the photon energy E04 corresponding to the energy at an absorption of 104 cm-1. The values of E04 decreased from 5.3 to 4.6 as the rf power was increased from 5 to 35 W. © 1995. |
Formato |
109-113 |
Identificador |
http://dx.doi.org/10.1016/0040-6090(95)06938-0 Thin Solid Films, v. 270, n. 1-2, p. 109-113, 1995. 0040-6090 http://hdl.handle.net/11449/64652 10.1016/0040-6090(95)06938-0 WOS:A1995TM18700022 2-s2.0-0029533793 |
Idioma(s) |
eng |
Relação |
Thin Solid Films |
Direitos |
closedAccess |
Palavras-Chave | #Optical properties #Plasma processing and deposition #Amorphous materials #Carbon #Glow discharges #Hydrogenation #Infrared spectroscopy #Interferometry #Molecular structure #Polymerization #Refractive index #Semiconducting silicon compounds #Semiconductor plasmas #Actinometric optical emission spectroscopy #Hexamethyldisoloxane #Optical emission measurements #Optical gap #Optical interferometry #Photon energy #Plasma concentrations #Plasma processing #Ultraviolet visible spectroscopy #Thin films |
Tipo |
info:eu-repo/semantics/article |