Molecular hydrogen diffusion in nanostructured amorphous silicon thin films


Autoria(s): Kail, Fatiha; Farjas Silva, Jordi; Roura Grabulosa, Pere
Data(s)

12/11/2013

Resumo

We study hydrogen stability and its evolution during thermal annealing in nanostructured amorphous silicon thin films. From the simultaneous measurement of heat and hydrogen desorption, we obtain the experimental evidence of molecular diffusion in these materials. In addition, we introduce a simple diffusion model which shows good agreement with the experimental data

Identificador

http://hdl.handle.net/10256/8575

Idioma(s)

eng

Publicador

American Physical Society

Direitos

Tots els drets reservats

Palavras-Chave #Hidrogenació #Hydrogenation #Silici #Silicon #Materials nanoestructurals #Nanostructure materials #Thin films #Capes fines
Tipo

info:eu-repo/semantics/article

info:eu-repo/semantics/publishedVersion