Molecular hydrogen diffusion in nanostructured amorphous silicon thin films
Data(s) |
12/11/2013
|
---|---|
Resumo |
We study hydrogen stability and its evolution during thermal annealing in nanostructured amorphous silicon thin films. From the simultaneous measurement of heat and hydrogen desorption, we obtain the experimental evidence of molecular diffusion in these materials. In addition, we introduce a simple diffusion model which shows good agreement with the experimental data |
Identificador | |
Idioma(s) |
eng |
Publicador |
American Physical Society |
Direitos |
Tots els drets reservats |
Palavras-Chave | #Hidrogenació #Hydrogenation #Silici #Silicon #Materials nanoestructurals #Nanostructure materials #Thin films #Capes fines |
Tipo |
info:eu-repo/semantics/article info:eu-repo/semantics/publishedVersion |