The influence of tip performance on scanning probe lithography
Data(s) |
2004
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Resumo |
Scanning probe lithography (SPL), employing the tip of an atomic force microscope to mechanically pattern various materials in nanoscale region has provided a simple but significant method for making nanostructures. We use this technique for the lithography of several kinds of substrate surfaces. The tip performance has been found to be a crucial factor in the lithographic process. Four types of cantilevers are employed in nanolithography, including standard silicon nitride (DNP), tapping mode(TM) etched silicon (TESP(W)), uncoated silicon cantilever (NSC21/50) and conductive platinum/iridium-coated probe. Results demonstrate that tips with smaller spring constants can not be used for physically scribing and nanomanipulating in our experiment. The possible mechanism of our experiment is discussed. |
Identificador | |
Idioma(s) |
英语 |
Fonte |
Zhou HL;Li Z;Wu AG;Zheng JP;Zhang J;Wu SF.The influence of tip performance on scanning probe lithography,APPLIED SURFACE SCIENCE,2004,221(1-4):402-407 |
Palavras-Chave | #DIP-PEN NANOLITHOGRAPHY #ATOMIC-FORCE MICROSCOPE #CONSTRUCTIVE NANOLITHOGRAPHY #ASPECT-RATIO #FABRICATION #MONOLAYERS #TEMPLATES #SILICON #SCALE #FILMS |
Tipo |
期刊论文 |