High performance 1.55 mu m InGaAsP/InP strained layer quantum well laser diodes fabricated by MOCVD overgrowth method


Autoria(s): Ma XY; Cao Q; Wang ST; Guo L; Wang ZM; Wang LM; He GP; Yang YL; Zhang HQ; Zhou XN; Chen LH
Data(s)

1998

Resumo

High performance uncooled 1.55 mu m InGaAsP/InP strained layer quantum well (SL-QW) lasers grown by low pressure metal organic chemical vapor deposition (LP-MOCVD) were reported in this paper. Whole MOCVD over growth method were applied in this work. The threshold currents of 5mA and the highest lasing temperature of 122 degrees C were obtained.

High performance uncooled 1.55 mu m InGaAsP/InP strained layer quantum well (SL-QW) lasers grown by low pressure metal organic chemical vapor deposition (LP-MOCVD) were reported in this paper. Whole MOCVD over growth method were applied in this work. The threshold currents of 5mA and the highest lasing temperature of 122 degrees C were obtained.

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SPIE.; COS.; COEMA.

Chinese Acad Sci, Inst Semicond, Beijing 100083, Peoples R China

SPIE.; COS.; COEMA.

Identificador

http://ir.semi.ac.cn/handle/172111/13881

http://www.irgrid.ac.cn/handle/1471x/105122

Idioma(s)

英语

Publicador

SPIE-INT SOC OPTICAL ENGINEERING

1000 20TH ST, PO BOX 10, BELLINGHAM, WA 98227-0010 USA

Fonte

Ma XY; Cao Q; Wang ST; Guo L; Wang ZM; Wang LM; He GP; Yang YL; Zhang HQ; Zhou XN; Chen LH .High performance 1.55 mu m InGaAsP/InP strained layer quantum well laser diodes fabricated by MOCVD overgrowth method .见:SPIE-INT SOC OPTICAL ENGINEERING .SEMICONDUCTOR LASERS III, 3547,1000 20TH ST, PO BOX 10, BELLINGHAM, WA 98227-0010 USA ,1998,8-11

Palavras-Chave #半导体物理 #InGaAsP #strained layer quantum well #laser diode #MOCVD
Tipo

会议论文