Donor acceptor pair in molecular beam epitaxy grown GaN


Autoria(s): Ren GB; Dewsnip DJ; Lacklison DE; Orton JW; Cheng TS; Foxon CT
Data(s)

1997

Resumo

We have recently found evidence of new donor acceptor pair (DAP) luminescence in molecular beam epitaxy (MBE) grown films. A variety of nominally undoped samples have been studied by photoluminescence (PL) over a temperature range of 5-300 K. The samples show intensive luminescence al energies of 3.404-3.413 eV varying with different sample at 5 K, as well as a fairly strong (DX)-X-0 line at low temperature. We attribute the Line at 3.404-3.413 eV to DAP recombination which is over 0.1 eV different from the well known DAP caused by ME-doping in GaN. The DAP line shows fine structure. it even predominates in one particular sample. The peak position shifts to higher energy with temperature increasing from 5 up to 70 K, and as the excitation laser intensity increases. The data are consistent with DAP luminescence involving an acceptor level of about 90 meV (presumably carbon) above the valence band edge in GaN. It is much shallower than the acceptor level of 250 meV produced by the p-type dopant Mg which is commonly used at present. (C) 1997 Elsevier Science S.A.

Identificador

http://ir.semi.ac.cn/handle/172111/15225

http://www.irgrid.ac.cn/handle/1471x/101507

Idioma(s)

英语

Fonte

Ren GB; Dewsnip DJ; Lacklison DE; Orton JW; Cheng TS; Foxon CT .Donor acceptor pair in molecular beam epitaxy grown GaN ,MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY,1997,43(0):242-245

Palavras-Chave #半导体材料 #donor acceptor pair #GaN #molecular beam epitaxy #photoluminescence #shallow acceptor #GAAS #LUMINESCENCE #CD
Tipo

期刊论文