808 nm high-power laser grown by MBE through the control of Be diffusion and use of superlattice


Autoria(s): Zhu DH; Wang ZG; Liang JB; Xu B; Zhu ZP; Zhang J; Gong Q; Li SY
Data(s)

1997

Resumo

808 nm high-power laser diodes are gown by MBE. In the laser structure, the combination of Si-doped GRIN (graded-index) region adjacent to n-AlGaAs cladding layer with reduced Be doping concentration near the active region has been used to diminish Be diffusion and oxygen incorporation. As compared with the laser structure which has undoped GRIN region and uniform doping concentration for Si and Be, respectively, in the cladding layers, the slope efficiency has increased by about 8%. Typical threshold current density of 300 A/cm(2) and the minimum threshold current density of 220 A/cm(2) for lasers with 500 mu m cavity length are obtained. A high slope efficiency of 1.3 W/A for coated lasers with 1000 mu m cavity length is also demonstrated, Recorded CW output power at room temperature has reached 2.3 W.

Identificador

http://ir.semi.ac.cn/handle/172111/15149

http://www.irgrid.ac.cn/handle/1471x/101469

Idioma(s)

英语

Fonte

Zhu DH; Wang ZG; Liang JB; Xu B; Zhu ZP; Zhang J; Gong Q; Li SY .808 nm high-power laser grown by MBE through the control of Be diffusion and use of superlattice ,JOURNAL OF CRYSTAL GROWTH,1997,175(0):1004-1008

Palavras-Chave #半导体材料 #high-power #semiconductor laser #MBE #quantum well #MOLECULAR-BEAM EPITAXY #QUANTUM-WELL LASERS #BERYLLIUM #DIODES #MIGRATION #OPERATION #MIRRORS
Tipo

期刊论文