Dispersion characteristics of nanometer-scaled silicon rib waveguides


Autoria(s): Jia L (Jia Lianxi); Geng MM (Geng Minming); Zhang L (Zhang Lei); Yang L (Yang Lin); Chen P (Chen Ping); Liu YL (Liu Yuliang)
Data(s)

2010

Resumo

We investigate the dispersion properties of nanometer-scaled silicon waveguides with channel and rib cross section around the optical fiber communication wavelength and systematically study their relationship with the key structural parameters of the waveguide. The simulation results show that the introduction of an extra degree of freedom in the rib depth enables the rib waveguide more flexible in engineering the group velocity dispersion (GVD) compared with the channel waveguide. Besides, we get the structural parameters of the waveguides that can realize zero-GVD at 1550 nm.

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This work was supported by the National Natural Science Foundation of China (Nos. 60877015, 60977037, and 60907001) and the National "863" Program of China (No. 2009AA03Z416).

其它

This work was supported by the National Natural Science Foundation of China (Nos. 60877015, 60977037, and 60907001) and the National "863" Program of China (No. 2009AA03Z416).

Identificador

http://ir.semi.ac.cn/handle/172111/11279

http://www.irgrid.ac.cn/handle/1471x/66190

Idioma(s)

英语

Fonte

Jia L (Jia Lianxi), Geng MM (Geng Minming), Zhang L (Zhang Lei), Yang L (Yang Lin), Chen P (Chen Ping), Liu YL (Liu Yuliang).Dispersion characteristics of nanometer-scaled silicon rib waveguides.CHINESE OPTICS LETTERS,2010,8(5):485-489

Palavras-Chave #光电子学 #GROUP-VELOCITY DISPERSION #WAVELENGTH CONVERSION #ON-INSULATOR #PHOTONIC WIRES #SI #PROPAGATION #GENERATION #ROUGHNESS #INDEX #CHIP
Tipo

期刊论文