Dielectric response and its light-induced change in undoped alpha-Si : H films below 13 MHz


Autoria(s): Yue GZ; Kong GL; Zhang DL; Ma ZX; Sheng SR; Liao XB
Data(s)

1998

Resumo

The low frequency (<13 MHz) dielectric response and its light-induced change in undoped a-Si:H were investigated in detail. The dielectric constant epsilon (the real part) in this range decreases with illumination time: following a stretched exponential law similar to that found for other light-induced changes. The saturation relative change was about 0.1-0.2 % for the measured samples. The change is fading away either after repeated illumination-annealing training or by aging at room temperature. The present results indicate some rearrangement of the whole Si network caused by light soaking.

Identificador

http://ir.semi.ac.cn/handle/172111/13282

http://www.irgrid.ac.cn/handle/1471x/65611

Idioma(s)

英语

Fonte

Yue GZ; Kong GL; Zhang DL; Ma ZX; Sheng SR; Liao XB .Dielectric response and its light-induced change in undoped alpha-Si : H films below 13 MHz ,PHYSICAL REVIEW B,1998,57(4):2387-2392

Palavras-Chave #半导体物理 #HYDROGENATED AMORPHOUS-SILICON #SEMICONDUCTORS #CONDUCTIVITY #DISCHARGE #BONDS
Tipo

期刊论文