Role of surface defect states in visible luminescence from oxidized hydrogenated amorphous Si hydrogenated amorphous Ge multilayers


Autoria(s): Xu J; He ZH; Chen KJ; Huang XF; Feng DA; Han HX; Wang ZP; Li GH
Data(s)

1999

Resumo

Nanocrystalline Ge embedded in amorphous silicon dioxide matrix was fabricated by oxidizing hydrogenated amorphous Si/hydrogenated amorphous Ge (a-Si:H/a-Ge:H) multilayers. The structures before and after oxidation were systematically investigated. The orange-green light emission was observed at room temperature and the luminescence peak was located at 2.2 eV. The size dependence in the photoluminescence peak energy was not observed and the luminescence intensity was increased gradually with oxidation time. The origin for this visible light emission is discussed. In contrast to the simple quantum effect model, the surface defect states of nanocrystalline Ge are believed to play an important role in radiative recombination process. (C) 1999 American Institute of Physics. [S0003-6951(99)02425-0].

Identificador

http://ir.semi.ac.cn/handle/172111/12880

http://www.irgrid.ac.cn/handle/1471x/65410

Idioma(s)

英语

Fonte

Xu J; He ZH; Chen KJ; Huang XF; Feng DA; Han HX; Wang ZP; Li GH .Role of surface defect states in visible luminescence from oxidized hydrogenated amorphous Si hydrogenated amorphous Ge multilayers ,APPLIED PHYSICS LETTERS,1999,74(25):3773-3775

Palavras-Chave #半导体物理 #QUANTUM-CONFINEMENT #PHOTOLUMINESCENCE #SUPERLATTICES #NANOCRYSTALS #CRYSTALLITES #FILMS
Tipo

期刊论文