Studies of high DC current induced degradation in III-V nitride based heterojunctions


Autoria(s): Ho WY; Surya C; Tong KY; Lu LW; Ge WK
Data(s)

2000

Resumo

We report experiments on high de current stressing in commercial III-V nitride based heterojunction light-emitting diodes. Stressing currents ranging from 100 mA to 200 mA were used. Degradations in the device properties were investigated through detailed studies of the current-voltage (I-V) characteristics, electroluminescence, deep-level transient Fourier spectroscopy and flicker noise. Our experimental data demonstrated significant distortions in the I-V characteristics subsequent to electrical stressing. The room temperature electro-luminescence of the devices exhibited a 25% decrement in the peak emission intensity. Concentration of the deep-levels was examined by deep-level transient Fourier spectroscopy, which indicated an increase in the density of deep-traps from 2.7 x 10(13) cm(-3) to 4.2 x 10(13) cm(-3) at E-1 = E-C - 1.1 eV. The result is consistent with our study of 1/f noise, which exhibited up to three orders of magnitude increase in the voltage noise power spectra. These traps are typically located at energy levels beyond the range that can be characterized by conventional techniques including DLTS. The two experiments, therefore, provide a more complete picture of trap generation due to high dc current stressing.

Identificador

http://ir.semi.ac.cn/handle/172111/12520

http://www.irgrid.ac.cn/handle/1471x/65230

Idioma(s)

英语

Fonte

Ho WY; Surya C; Tong KY; Lu LW; Ge WK .Studies of high DC current induced degradation in III-V nitride based heterojunctions ,IEEE TRANSACTIONS ON ELECTRON DEVICES,2000,47(7):1421-1425

Palavras-Chave #半导体物理 #current stressing #DLTS #flicker noise #heterojunctions #III-V nitride #LOW-FREQUENCY FLUCTUATIONS #RESONANT-TUNNELING DIODES #FLICKER NOISE #GALLIUM NITRIDE #1/F NOISE #DEVICES #TRANSISTORS #QUALITY
Tipo

期刊论文