Light and annealing induced changes in Si-H bonds in undoped a-Si : H


Autoria(s): Sheng SR; Kong GL; Liao XB
Data(s)

2000

Resumo

Light and annealing induced changes in Si-H bonds in undoped a-Si:H have been investigated by a differential infrared spectroscopy method. The light-induced changes in Si-H bonds are not monotonic, quite different from the usual Staebler-Wronski effect in electronic properties, and involve more complicated physics. The magnitude of the light-induced changes in Si-H bonds is proportional to the hydrogen content in the film. There may exist more than one microscopic process which determine the light-induced changes in Si-H bonds. Almost the whole a-Si:H network is affected when a-Si:H is subjected to Light-soaking or to annealing. The light-induced changes in Si-H bonds may be an independent light-induced phenomenon or an auxiliary process of the metastable SWE defect creation. (C) 2000 Elsevier Science Ltd. All rights reserved.

Identificador

http://ir.semi.ac.cn/handle/172111/12386

http://www.irgrid.ac.cn/handle/1471x/65163

Idioma(s)

英语

Fonte

Sheng SR; Kong GL; Liao XB .Light and annealing induced changes in Si-H bonds in undoped a-Si : H ,SOLID STATE COMMUNICATIONS,2000,116(9):519-524

Palavras-Chave #半导体物理 #amorphous silicon #semiconductors #infrared absorption #HYDROGENATED AMORPHOUS-SILICON #MODEL #METASTABILITY #SOAKING
Tipo

期刊论文