Indium doping effect on GaN in the initial growth stage


Autoria(s): Yuan HR; Lu DC; Liu XL; Chen Z; Wang XH; Wang D; Han PD
Data(s)

2001

Resumo

Three minutes' growth was carried out to investigate the indium-doping effect on initially grown GaN. Indium-doped and undoped samples were grown by low-pressure metalorganic vapor phase epitaxy. Atomic force microscope observation revealed that In-doping modified the morphology of the nuclei. Indium-doping also enhanced wetting between the buffer and nuclei layers, which was also supported by optical transmission. Photoluminescence suggested that indium-doping obviously enhanced band-edge related emission even in the nucleation stage. X-ray diffraction performed on samples grown for 20 minutes indicated improvement of the crystalline quality through indium-doping. The mechanism of the indium-doping effect was discussed.

Identificador

http://ir.semi.ac.cn/handle/172111/12120

http://www.irgrid.ac.cn/handle/1471x/65030

Idioma(s)

英语

Fonte

Yuan HR; Lu DC; Liu XL; Chen Z; Wang XH; Wang D; Han PD .Indium doping effect on GaN in the initial growth stage ,JOURNAL OF ELECTRONIC MATERIALS,2001 ,30(8):977-979

Palavras-Chave #半导体材料 #GaN #indium doping #initial growth stage #morphology #optical transmission #photoluminescence #VAPOR-PHASE EPITAXY #BUFFER LAYER #FILMS #SAPPHIRE #DEPOSITION
Tipo

期刊论文