Indium doping effect on GaN in the initial growth stage
| Data(s) |
2001
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|---|---|
| Resumo |
Three minutes' growth was carried out to investigate the indium-doping effect on initially grown GaN. Indium-doped and undoped samples were grown by low-pressure metalorganic vapor phase epitaxy. Atomic force microscope observation revealed that In-doping modified the morphology of the nuclei. Indium-doping also enhanced wetting between the buffer and nuclei layers, which was also supported by optical transmission. Photoluminescence suggested that indium-doping obviously enhanced band-edge related emission even in the nucleation stage. X-ray diffraction performed on samples grown for 20 minutes indicated improvement of the crystalline quality through indium-doping. The mechanism of the indium-doping effect was discussed. |
| Identificador | |
| Idioma(s) |
英语 |
| Fonte |
Yuan HR; Lu DC; Liu XL; Chen Z; Wang XH; Wang D; Han PD .Indium doping effect on GaN in the initial growth stage ,JOURNAL OF ELECTRONIC MATERIALS,2001 ,30(8):977-979 |
| Palavras-Chave | #半导体材料 #GaN #indium doping #initial growth stage #morphology #optical transmission #photoluminescence #VAPOR-PHASE EPITAXY #BUFFER LAYER #FILMS #SAPPHIRE #DEPOSITION |
| Tipo |
期刊论文 |