A geometrical model of GaN morphology in initial growth stage


Autoria(s): Yuan HR; Chen Z; Lu DC; Liu XL; Han PD; Wang XH
Data(s)

2002

Resumo

Based on morphology observed by atomic force microscopy, a geometrical model was proposed in order to explain the statistical results obtained from morphology observation on GaN in initial growth stage. Four parameters were introduced to describe the morphology characteristics in this model. Least-square fitting of height distribution was performed. The height distribution derived from the model agreed well with that obtained from experimental records. It was also found that the model should be further advanced to understand the growth of GaN in initial growth stage. (C) 2002 Elsevier Science BY. All rights reserved.

Identificador

http://ir.semi.ac.cn/handle/172111/12042

http://www.irgrid.ac.cn/handle/1471x/64991

Idioma(s)

英语

Fonte

Yuan HR; Chen Z; Lu DC; Liu XL; Han PD; Wang XH .A geometrical model of GaN morphology in initial growth stage ,JOURNAL OF CRYSTAL GROWTH,2002,234(1):115-120

Palavras-Chave #半导体材料 #computer simulation #crystal morphology #atomic force microscopy #nitrides #AIN BUFFER LAYER #SAPPHIRE
Tipo

期刊论文