1.55-mu m resonant cavity enhanced photodiode based on MBE grown Ge quantum dots


Autoria(s): Yu J; Kasper E; Oehme M
Data(s)

2006

Resumo

Self-assembly Ge quantum dots (QD) on Si and Si/Ge mutli-quantum-wells (MQW) are grown by MBE. The island size and island density was investigated by atomics force microscopy. Ten-layer and twenty-layer MQW were selected for photodiode device fabrication. In photoluminescence (PL), a broad peak around 1.55-mu m wavelength was observed with higher peak intensity for the 10-layer MQW which had less defects than the 20-layer sample. Resonant cavity enhanced (RCE) photodiodes were fabricated by bonding on a SOI wafer. Selected responsivity at 1.55 mu m was successfully demonstrated. (c) 2005 Elsevier B.V. All rights reserved.

Identificador

http://ir.semi.ac.cn/handle/172111/10670

http://www.irgrid.ac.cn/handle/1471x/64531

Idioma(s)

英语

Fonte

Yu J; Kasper E; Oehme M .1.55-mu m resonant cavity enhanced photodiode based on MBE grown Ge quantum dots ,THIN SOLID FILMS,2006,508(1-2):396-398

Palavras-Chave #半导体材料 #SiGe #photodiode #MBE #quantum dots #PHOTODETECTORS #OPERATION
Tipo

期刊论文