High-reflectance 193 nm Al2O3/MgF2 mirrors


Autoria(s): Shang SZ; 邵建达; Liao CY; Yi K; 范正修; Chen L
Data(s)

2005

Resumo

Thin-film single layers of Al2O3 and MgF2 were deposited upon super polished fused-silica by electron-beam evaporation. The subsequent optical constants n and k were reported for the spectral range of 180-230 nm. High-reflectance dense multilayer coatings for 193 nm were designed on the basis of the evaluated optical constants and produced. The spectra of the reflectance of HR coatings were compared to the theoretical calculations. HR mirrors of 27 layers with a reflectance of more than 98% were reported. (c) 2004 Elsevier B.V. All rights reserved.

Identificador

http://ir.siom.ac.cn/handle/181231/4436

http://www.irgrid.ac.cn/handle/1471x/12795

Idioma(s)

英语

Fonte

Shang SZ;邵建达;Liao CY;Yi K;范正修;Chen L.,Appl. Surf. Sci.,2005,249(1~4):157-161

Palavras-Chave #光学薄膜 #optical coatings #193 nm #HR mirrors #Al2O3 #MgF2
Tipo

期刊论文