Catalyst-free plasma enhanced growth of graphene from sustainable sources


Autoria(s): Jacob, Mohan V.; Rawat, Rajdeep S.; Ouyang, Bo; Bazaka, Kateryna; Kumar, D. Sakthi; Taguchi, Dai; Iwamoto, Mitsumasa; Neupane, Ram; Varghese, Oomman K.
Data(s)

2015

Resumo

Details of a fast and sustainable bottom-up process to grow large area high quality graphene films without the aid of any catalyst are reported in this paper. We used Melaleuca alternifolia, a volatile natural extract from tea tree plant as the precursor. The as-fabricated graphene films yielded a stable contact angle of 135°, indicating their potential application in very high hydrophobic coatings. The electronic devices formed by sandwiching pentacene between graphene and aluminum films demonstrated memristive behavior, and hence, these graphene films could find use in nonvolatile memory devices also.

Identificador

http://eprints.qut.edu.au/92053/

Publicador

American Chemical Society

Relação

DOI:10.1021/acs.nanolett.5b01363

Jacob, Mohan V., Rawat, Rajdeep S., Ouyang, Bo, Bazaka, Kateryna, Kumar, D. Sakthi, Taguchi, Dai, Iwamoto, Mitsumasa, Neupane, Ram, & Varghese, Oomman K. (2015) Catalyst-free plasma enhanced growth of graphene from sustainable sources. Nano Letters, 15(9), pp. 5702-5708.

Fonte

School of Chemistry, Physics & Mechanical Engineering; Institute of Health and Biomedical Innovation; Science & Engineering Faculty

Palavras-Chave #091200 MATERIALS ENGINEERING #graphene #PECVD #hydrophobic #memristor
Tipo

Journal Article