PS-b-PEO嵌段共聚物薄膜的结晶与微相分离

半结晶性嵌段共聚物中，嵌段间的不相容性导致的微相分离与结晶嵌段的结晶行为之间存在相互竞争与协同作用。现阶段的大部分工作主要集中于半结晶性嵌段共聚物相分离发生后的结晶行为的结晶动力学和内部链折叠，而对于结晶与微相分离同时发生时的结晶与微相分离行为的研究还较少。 本论文以半结晶性的聚苯乙烯和聚环氧乙烷的二嵌段共聚物（PS-b-PEO）薄膜为研究对象，研究其破坏性（break out）结晶行为，以及研究方形片晶与微相分离结构的关系。 首先，本论文研究了不同相分离取向对结晶行为的影响。我们通过控制膜厚得到垂直基底和平行基底的微相分离薄膜。在溶剂蒸汽中，微相分离取向垂直基底时，仅仅是有序度增加，片晶协同生成。退火时间增加，结晶成核控制生长向扩散控制生长转变，导致片晶周围树枝晶生长。微相分离结构为平行基底取向时，焓主要用于取向转变和有序度增加，体系没有片晶生成，仅边缘效应使树枝晶产生。在结晶取向方面，研究了溶剂蒸汽氛围内界面作用改变使分子链轴垂直基底（flat-on）结晶向分子链轴平行基底（edge-on）结晶的转变。随着溶剂分子扩散到基底界面，结晶嵌段PEO与基底相互作用从强变弱，是发生这种转变的决定因素。 其次，从片晶与微相分离相互转变和片晶上微相分离刷的形成两方面研究片晶与微相分离的竞争与协同关系。退火溶剂的选择性影响片晶与微相分离的竞争。在PEO不良溶剂蒸汽环己烷中发生以下转变：片晶生成，逐渐被微相分离破坏，片晶重新生成；PEO良溶剂水中仅存在结晶到微相分离的转变。即晶体溶解，与PS发生微相分离以获得能量上的有利状态。可溶解嵌段的自由体积增加和结晶嵌段的低溶胀性分别是微相分离和结晶发生的关键因素。片晶与微相分离协同关系研究上，通过调控二嵌段共聚物片晶上聚合物刷的密度（小于14.3大于3.8），获得具有微相分离结构的聚合物刷。PS-PS刷的弱相互作用以及PS与PEO（连接PEO片层结构未结晶的PEO链）之间的强不相容性对片层上微相分离刷的形成起来决定作用。

通过阴离子转Ziegler-Natta聚合机理转换合成PS-b-EPM

能够作为聚烯烃材料与其它聚合物材料共混增容剂的、含有聚烯烃链段的嵌段共聚物的合成，对于扩大聚烯烃材料的应用，获得性能优良的共混型聚合物材料具有重要意义。烯烃类单体聚合方法单一，而且其通用的聚合方法，Ziegler-Natta聚合，不是令人满意的合成嵌段共聚物的方法。因此，含有聚烯烃链段的嵌段共聚物的合成一直是比较困难的研究课题之一，近年来发展起来的阴离子转Ziegler-Natta聚合方法为合成这类嵌段共聚物开辟了新途径。阴离子转Ziegler-Natta聚合是利用阴离子聚合所得到的活性聚合物及其反离子与过渡金属化合物组成“Ziegler-Natta”催化剂使烯类单体聚合，从而得到含有聚烯烃链段和阴离子聚合物链段的嵌段共聚物的一种新的合成方法。这种结合两种聚合机理的聚合方法能够有效地避免单一机理聚合方法对单体的要求和限制，从而扩大了嵌段共聚物的合成范围。目前，有关阴离子转Ziegler-Natta聚合方法的研究工作尚属于初步阶段，许多基本问题还没有统一的结论。本工作的目的就是对这一聚合方法的聚合规律，特点等基本问题进行初步探讨，为今后这方面工作的开展奠定初步基础。本工作以阴离子转Ziegler-Natta聚合为方法，以PS-EPM嵌段共聚物为合成对象，并通过对产物的组成、分子量、序列分布、温度转变行为及形态的表征，可初步得到以下结论。1、在较低的催化剂浓度下，可使催化效率比较高。在本聚合体系下，最高可达694克EPM段/克Ti。这一数值与一般非载体钛催化体系相比是比较高的。2、在合适的聚合条件下，如聚合时间较短，聚合温度较低，可得到分子量分布较窄的嵌段共聚物，并且基本上不含有非嵌段烯烃共聚物。3、以聚苯乙烯作为阴离子段聚合物，可发生较明显的β-消除反应，使产物中含有难以分离的烯烃共聚物，本工作以几个单元的聚异戊二烯作为聚苯乙烯活性离子的端基，有效地抑制了β-消除反应的发生，得到了比较纯净的PS-EPM嵌段共聚物。5、由阴离子转来的“Ziegler-Natta聚合具有阴离子聚合和Ziegler-Natta聚合的共同特点，是介于阴离子聚合和Ziegler-Natta聚合之间的一种特殊聚合形式；在聚合初期主要呈现阴离子聚合特征随着聚合的进行，逐渐向具有Ziegler-Natta聚合特征的聚合形式过渡。

PS-b-P4VP/CoSm杂化材料的制备及其磁性能

用溶液相金属盐沉积法在苯乙烯与4-乙烯基吡啶嵌段共聚物(PS-b-P4VP)胶束中制备了平均直径为12 nm的PS-b-P4VP/Co、PS-b-P4VP/CoSm(nCo∶nSm=3.8∶1,13.0∶1)、PS-b-P4VP/Sm纳米粒子。胶束溶液通过高温回流使磁性成核粒子和磁性金属原子的流动能力和扩散能力提高而获得尺寸均一的颗粒。

Microphase-Separated Brushes on Square Platelets in PS-b-PEO Thin Films

In polystyrene-block-poly(ethylene oxide) thin square platelets can be obtained via fast solvent evaporation by controlling the tethering density (0.08 < sigma < 0.11). The tethering density of the brushes is proportional to the thickness of the PEO crystal and increases with increasing initial solution heating temperature (T-i). When T-i < T-m, where T-m is the melting point of PEO, brushes with microphase-separated structures are observed. The formation of microphase-separated brushes depends on two factors: the strong incompatibility between PS and noncrystalline PEO chains (attached to the crystalline PEO) and the weak interaction between PS-PS brushes.

Surface morphology evolution of poly (styrene-block-4-vinylpyridine) (PS-b-P4VP)(H+) and poly(methyl methacrylate)-dibenzo-18-crown-6-poly(methyl methacrylate) (PMCMA) supramolecular film

Well-ordered nanostructured polymeric supramolecular thin films were fabricated from the supramolecular assembly of poly(styrene-block-4-vinylpyridine) (PS-b-P4VP)(H+) and poly(methyl methacrylate)-dibenzo-18-crown-6-poly(methyl methacrylate) (PMCMA). A depression Of cylindrical nanodomains was formed by the block of P4VP(H+) and PMCMA associates surrounded by PS. The repulsive force aroused from the incompatibility between the block of P4VP(H+) and PMCMA was varied through changing the molecule weight (M-w) of PMCMA, the volume fraction of the block of P4VP(H+), and annealing the film at high temperature. Increasing the repulsive force led to a change of overall morphology from ordered nanoporous to featureless structures. The effects of solvent nature and evaporation rate on the film morphology were also investigated. Further evolution of surface morphologies from nanoporous to featureless to nanoporous structures was observed upon exposure to carbon bisulfide vapors for different treatment periods. The wettability of the film surface was changed from hydrophilicity to hydrophobicity due to the changes of the film surface microscopic composition.

Surface structure of thin asymmetric PS-b-PMMA diblock copolymers investigated by atomic force microscopy

Asymmetric poly(styrene-b-methyl methacrylate) (PS-b-PMMA) diblock copolymers of molecular weight M-n = 29,700g mol(-1) (M-PS = 9300 g mol(-1) M-PMMA = 20,100 g mol(-1), PD = 1.15, chi(PS) = 0.323, chi(PMMA) = 0.677) and M-n = 63,900 g mol(-1) (M-PS = 50,500 g mol(-1), M-PMMA = 13,400 g mol(-1), PD = 1.18, chi(PS) = 0.790, chi(PMMA) = 0.210) were prepared via reversible addition-fragmentation chain transfer (RAFT) polymerization. Atomic force microscopy (AFM) was used to investigate the surface structure of thin films, prepared by spin-coating the diblock copolymers on a silicon substrate. We show that the nanostructure of the diblock copolymer depends on the molecular weight and volume fraction of the diblock copolymers. We observed a perpendicular lamellar structure for the high molar mass sample and a hexagonal-packed cylindrical patterning for the lower molar mass one. Small-angle X-ray scattering investigation of these samples without annealing did not reveal any ordered structure. Annealing of PS-b-PMMA samples at 160 degrees C for 24 h led to a change in surface structure.

Formation of sub-7 nm feature size PS-b-P4VP block copolymer structures by solvent vapour process

The nanometer range structure produced by thin films of diblock copolymers makes them a great of interest as templates for the microelectronics industry. We investigated the effect of annealing solvents and/or mixture of the solvents in case of symmetric Poly (styrene-block-4vinylpyridine) (PS-b-P4VP) diblock copolymer to get the desired line patterns. In this paper, we used different molecular weights PS-b-P4VP to demonstrate the scalability of such high χ BCP system which requires precise fine-tuning of interfacial energies achieved by surface treatment and that improves the wetting property, ordering, and minimizes defect densities. Bare Silicon Substrates were also modified with polystyrene brush and ethylene glycol self-assembled monolayer in a simple quick reproducible way. Also, a novel and simple in situ hard mask technique was used to generate sub-7nm Iron oxide nanowires with a high aspect ratio on Silicon substrate, which can be used to develop silicon nanowires post pattern transfer.

Semiconductor nanowire fabrication via bottom-up & top-down paradigms

Semiconductor nanowires are pseudo 1-D structures where the magnitude of the semiconducting material is confined to a length of less than 100 nm in two dimensions. Semiconductor nanowires have a vast range of potential applications, including electronic (logic devices, diodes), photonic (laser, photodetector), biological (sensors, drug delivery), energy (batteries, solar cells, thermoelectric generators), and magnetic (spintronic, memory) devices. Semiconductor nanowires can be fabricated by a range of methods which can be categorised into one of two paradigms, bottom-up or top-down. Bottom-up processes can be defined as those where structures are assembled from their sub-components in an additive fashion. Top-down fabrication strategies use sculpting or etching to carve structures from a larger piece of material in a subtractive fashion. This seminar will detail a number of novel routes to fabricate semiconductor nanowires by both bottom-up and top-down paradigms. Firstly, a novel bottom-up route to fabricate Ge nanowires with controlled diameter distributions in the sub-20 nm regime will be described. This route details nanowire synthesis and diameter control in the absence of a foreign seed metal catalyst. Additionally a top-down route to nanowire array fabrication will be detailed outlining the importance of surface chemistry in high-resolution electron beam lithography (EBL) using hydrogen silsesquioxane (HSQ) on Ge and Bi2Se3 surfaces. Finally, a process will be described for the directed self-assembly of a diblock copolymer (PS-b-PDMS) using an EBL defined template. This section will also detail a route toward selective template sidewall wetting of either block in the PS-b-PDMS system, through tailored functionalisation of the template and substrate surfaces.

Block copolymer self-assembly based device structures

This thesis investigated the block copolymer (BCP) thin film characteristics and pattern formation using a set of predetermined molecular weights of PS-b-PMMA and PS-b-PDMS. Post BCP pattern fabrication on the required base substrate a dry plasma etch process was utilised for successful pattern transfer of the BCP resist onto underlying substrate. The resultant sub-10 nm device features were used in front end of line (FEoL) fabrication of active device components in integrated circuits (IC). The potential use of BCP templates were further extended to metal and metal-oxide nanowire fabrication. These nanowires were further investigated in real-time applications as novel sensors and supercapacitors.

Development of block copolymer lithography for device structure fabrication

This thesis investigated well-ordered block copolymer (BCP) thin film characteristics and their use for nanoscale pattern formation using a series of polystyrene-block-polymethylmethacrylate (PS-b-PMMA), polystyrene-blockpolydimethylsiloxane (PS-b-PDMS) and polystyrene-block-poly(ethylene oxide) (PS-b-PEO) systems of various molecular weights. BCP thin films, which act as an ‘on-chip’ etch mask and material templates, are highly promising self-assembling process for future scalable nanolithography. Unlike conventional BCP processing methods, the work in this thesis demonstrates that well-ordered patterns can be achieved in a few seconds compared to several hours by use of a non-conventional microwave assisted technique. As a result, well-ordered BCP nanoscale structures can be developed in industry appropriate periods facilitating their incorporation into current technologies. An optimised and controlled plasma dry etch process was used for successful pattern transfer to the underlying silicon substrate. Long range ordered BCP templates were further modified by selective metal inclusion technique to form a hard mask template towards fabrication of high aspect ratio nanopillars and nanowires. The work described here is centred on how these templates might be used to generate function at substrate surfaces. Herein we describe a number of innovations which might allow their successful uptake in a number of applications.

Überkritisches Kohlendioxid als Reaktionsmedium für die Dispersionspolymerisation

Überkritisches Kohlendioxid (CO2) ist für die Polymerisation von besonderem Interesse. Die Dispersionspolymerisation von N-Vinylpyrrolidon (VP) wurde mit Polystyrol-Polydimethylsiloxan Diblockcopolymeren (PS-b-PDMS) in diesem Medium durchgeführt. Hierfür wurde ein neues Hochdrucklabor eingerichtet, eine Sichtzelle und eine neuartige Lichtstreuzelle konstruiert. Für die Durchführung von Lichtstreuexperimenten wurde der Brechungs-index von CO2 bis zu hohen Dichten an einer Reflexionsapparatur bestimmt. Mittels dynamischen Lichtstreumessungen an Polydimethylsiloxan (PDMS) in überkritischem CO2 wurden unter den untersuchten Bedingungen ein Radius bestimmt, wie er für ungestörte Knäueldimensionen erwartet wurde. Das PS-b-PDMS wurde mittels anionischer Polymerisation mit verschiedenen Blocklängen und sehr engen Molekulargewichtsverteilungen synthetisiert. Das Phasenverhalten von PS-b-PDMS wurde in überkritischem CO2 visuell und in einer VP/CO2-Mischung mittels Turbidimetrie untersucht. Das Monomer wirkt als Co-Solvens für den PDMS-Block des Stabilisators. Bei einer Konzentration von ca. 1 Gew.-% PS-b-PDMS (pro Monomer) in CO2 bei 38 MPa und 80°C wurden sphärische ca. 1µm große PVP-Partikeln synthetisiert. PS-b-PDMS ist unter diesen Bedingungen ein geeigneter Stabilisator für die Polymerisation von VP in überkritischem CO2. Bei Konzentrationen von mehr als ca. 5 Gew.-% PS-b-PDMS wurden agglomerierte Partikeln beobachtet. Die Kinetik der Partikelentstehung wurde turbidimetrisch untersucht. Bereits in der frühen Phase der Polymerisation wurde eine anwachsende Partikelgröße gefunden.

Untersuchung des Aggregationsverhaltens amphiphiler Diblockcopolymere in überkritischem Kohlendioxid mittels dynamischer Lichtstreuung

„Untersuchung des Aggregationsverhaltens amphiphiler Diblockcopolymere in überkritischem Kohlendioxid mittels dynamischer Lichtstreuung“ In der vorliegenden Arbeit wurde die Mizellenbildung von Diblockcopolymeren des Typs PS-b-PDMS in überkritischem Kohlendioxid (CO2,SC) mittels dynamischer Lichtstreuung (DLS) charakterisiert. Zu diesem Zweck wurden Mischungen aus den Diblockcopolymeren in CO2,SC mit Styrol als Monomer druckabhängig auf diese Fähigkeit hin untersucht. Eine Mizellenbildung konnte anhand der gemessenen hydrodynamischen Radien Rh gezeigt werden. Um eine Vergleichsmöglichkeit gegenüber den mit Styrol gefüllten Kern-Hüllen-Mizellen zu bekommen, wurde das Diblockcopolymer PS-b-PDMS (9/27) zunächst ohne Styrol auf die Fähigkeit hin untersucht ungefüllte Mizellen zu bilden. Durch Druckvariation konnte ein kritischer Mizellendruck von ca. 46,7 MPa bei einer Temperatur von 338 K im Experiment bestätigt werden, der gefundene Rh liegt bei ca. 34 nm. Dagegen setzt die Aggregation bei einer PS-b-PDMS (9/27)/Styrol/CO2,SC- Mischung bei einem wesentlich niedrigeren Druck ein. Durch Druckvariation zwischen 38 MPa und 45,7 MPa wurde eine Größenänderung der Mizellen beobachtet. Durch zeitabhängige-DLS-Messungen am gleichen System bei einem bestimmten Druck wurde ein langsames Schrumpfen der Mizellen gefunden. Um den Einfluß der Blockgröße der verwendeten Amphiphile auf die Mizellenbildung zu untersuchen wurde das System PS-b-PDMS(6/37)/Styrol/CO2,SC mit Hilfe der DLS im Bereich zwischen 39,4 MPa und 43,1 MPa untersucht. Die Druckänderung zeigte für Rh ein nahezu invariantes Verhalten, daß durch eine verlängerte PDMS-Blocklänge und eine damit verbundene Kompensation der verschiedenen Wechselwirkungskräfte zwischen Mizellenkern, -hülle und CO2,SC erklärt werden kann. Im System PS-b-PDMS(6/16)/Styrol/CO2,SC konnte experimentell mit Hilfe der DLS erst nach einer ver-änderten molaren Zusammensetzung eine Mizellenbildung ab 40 MPa ermöglicht werden. Allerdings ändert sich auch in diesem System der hydrodynamische Radius ebenfalls mit dem Druck. Je nach Druck-, Temperatur- und molarer Zusammensetzung variiert die Tendenz der Systeme, Mizellen zu bilden die eine Emulsion stabilisieren können. Für die in Dispersions-Polymerisationsreaktionen eingesetzten Diblockcopolymere bedeutet dieses Ergebnis differenzierte Applikationsmöglichkeiten. Mit den ermittelten Konzentrationsverhältnissen an Amphiphil und Monomer konnte ein Bereich gefunden werden, in dem die thermodynamischen Bedingungen für die Mizellenbildung einerseits und die Vorraussetzungen für die DLS andererseits gegeben sind.

The morphology of ordered block copolymer patterns as probed by high resolution imaging

The microphase separation of block copolymer (BCP) thin films can afford a simple and cost-effective means to studying nanopattern surfaces, and especially the fabrication of nanocircuitry. However, because of complex interface effects and other complications, their 3D morphology, which is often critical for application, can be more complex than first thought. Here, we describe how emerging microscopic methods may be used to study complex BCP patterns and reveal their rich detail. These methods include helium ion microscopy (HIM) and high resolution x-section transmission electron microscopy (XTEM), and complement conventional secondary electron and atomic force microscopies (SEM and TEM). These techniques reveal that these structures are quite different to what might be expected. We illustrate the advances in the understanding of BCP thin film morphology in several systems, which result from this characterization. The systems described include symmetric, lamellar forming polystyrene-b-polymethylmethacrylate (PS-b-PMMA), cylinder forming polystyrene-b-polydimethylsiloxane (PS-b-PDMS), as well as lamellar and cylinder forming patterns of polystyrene-b-polyethylene oxide (PS-b-PEO) and polystyrene-b-poly-4-vinylpyridine (PS-b-P4VP). Each of these systems exhibits more complex arrangements than might be first thought. Finding and developing techniques whereby complex morphologies, particularly at very small dimensions, can be determined is critical to the practical use of these materials in many applications. The importance of quantifying these complex morphologies has implications for their use in integrated circuit manufacture, where they are being explored as alternative pattern forming methods to conventional UV lithography.

Hybridization of poly(4-vinyl pyridine)-b-polystyrene-b-poly(4-vinyl pyridine) aggregates in dioxane/water solution

Self-assembly of binary blends of two triblock copolymers of poly(4-vinyl pyridine)-b-polystyrene-b-poly(4-vinyl pyridine), i.e., P4VP(43)-b-PS260-b-P4VP(43) (P1) and P4VP(43)-b-PS366-b-P4VP(43) (P2), in dioxane/water solution was studied. These two triblock copolymers individually tend to form vesicles (P2) and cylindrical micelles (P1) in dilute solution. It was found that copolymer components in the blend, sample preparation method, and annealing time had significant effect on hybridization aggregate morphology. By increasing P1 content in the copolymer blends, fraction of looped and stretched cylinders increased, while fraction of bilayers decreased. Nearly no bilayer was observed when P1 content was above 85 wt%.

Crystal Growth Transition from Flat-On to Edge-On Induced by Solvent Evaporation in Ultrathin Films of Polystyrene-b-Poly(ethylene oxide)

The transition of lamellar crystal orientation from flat-on to edge-on in ultrathin films of polystyrene-b-poly(ethylene oxide) (PS-b-PEO) via solvent vapor (toluene) treatment Was investigated. When the as-prepared film was treated in saturated solvent vapor, breakout crystals could form quickly, and then they transformed from square single crystals (flat-on lamellae) to dendrites and finally to nanowire crystals (edge-on lamellae). Initially, heterogeneous nucleation tit the polymer/substrate interface dominated the structure evolution, leading to flat-on lamellar crystals orientation. And the transition from faceted habits to dendrites indicated a transition of underlying mechanism from nucleation-controlled to diffusion-limited growth. As the solvent molecules gradually diffused into the polymer/substrate interface, it will subsequently weaken the polymer-substrate interaction.