Caracterização de filmes ópticos compósitos nano-estruturados, inomogêneos ou anisotrópicos, produzidos por troca iônica e pelo método sol-gel

Este trabalho tem como objetivo o desenvolvimento e a aplicação de métodos de caracterização de filmes ópticos, associados à sua estrutura inomogênea ou anisotrópica. Os materiais estudados são guias ópticos planares e filmes compósitos com propriedades ópticas não-lineares. Esses materiais são relevantes para aplicações na área de optoeletrônica e óptica integrada. O trabalho é dividido em duas partes principais. A primeira parte é dedicada à caracterização de guias de onda planares produzidos por troca iônica, vidros dopados com íons de Ag e/ou K, através de um e/ou dois processos de troca. O perfil de índice de refração é estudado através da técnica de Modos Guiados, uma técnica óptica empregada tradicionalmente em guias desse tipo. Em complementação a essa medida óptica, são realizadas medidas do perfil de concentração do íon dopante, empregando as técnicas de RBS e EDS. É dedicado um interesse especial pela região próxima à superfície da amostra, a região crítica na análise por Modos Guiados. Os métodos de Abelès-Hacskaylo e de Brewster-Pfund são estendidos a esses guias inomogêneos, permitindo a medida direta do valor do índice de refração superficial. Essa informação e os dados obtidos por Modos Guiados permitem a determinação de um perfil de índice de refração mais acurado ao longo da profundidade do guia. A segunda parte é dedicada ao estudo de materiais compósitos: filmes finos constituídos por uma matriz (silicato, silicato + PVP, e PMMA) dopada com moléculas orgânicas que apresentam propriedades ópticas não-lineares de segunda ordem (PNA, DR-1 e HBO-BO6). Nessas amostras, é aplicado um campo elétrico de alta voltagem (efeito corona), gerando um alinhamento dos cromóforos dopantes. Essa mudança na simetria estrutural do material, de isotrópica para uniaxial, é observada através da assimetria correspondente no valor do índice de refração (birrefringência). O valor da birrefringência induzida é obtido através da medida da variação da refletância de luz pelo material, auxiliada por medidas prévias das constantes ópticas do material por Elipsometria.

Influência dos parâmetros de processo na deposição de nitreto de titânio por plasma em gaiola catódica

Titanium nitride films were grown on glass using the Cathodic Cage Plasma Deposition technique in order to verify the influence of process parameters in optical and structural properties of the films. The plasma atmosphere used was a mixture of Ar, N2 and H2, setting the Ar and N2 gas flows at 4 and 3 sccm, respectively and H2 gas flow varied from 0, 1 to 2 sccm. The deposition process was monitored by Optical Emission Spectroscopy (OES) to investigate the influence of the active species in plasma. It was observed that increasing the H2 gas flow into the plasma the luminescent intensities associated to the species changed. In this case, the luminescence of N2 (391,4nm) species was not proportional to the increasing of the H2 gas into the reactor. Other parameters investigated were diameter and number of holes in the cage. The analysis by Grazing Incidence X-Ray Diffraction (GIXRD) confirmed that the obtained films are composed by TiN and they may have variations in the nitrogen amount into the crystal and in the crystallite size. The optical microscopy images provided information about the homogeneity of the films. The atomic force microscopy (AFM) results revealed some microstructural characteristics and surface roughness. The thickness was measured by ellipsometry. The optical properties such as transmittance and reflectance (they were measured by spectrophotometry) are very sensitive to changes in the crystal lattice of the material, chemical composition and film thicknesses. Therefore, such properties are appropriate tools for verification of this process control. In general, films obtained at 0 sccm of H2 gas flow present a higher transmittance. It can be attributed to the smaller crystalline size due to a higher amount of nitrogen in the TiN lattice. The films obtained at 1 and 2 sccm of H2 gas flow have a golden appearance and XRD pattern showed peaks characteristics of TiN with higher intensity and smaller FWHM (Full Width at Half Maximum) parameter. It suggests that the hydrogen presence in the plasma makes the films more stoichiometric and becomes it more crystalline. It was observed that with higher number of holes in the lid of the cage, close to the region between the lid and the sample and the smaller diameter of the hole, the deposited film is thicker, which is justified by the most probability of plasma species reach effectively the sample and it promotes the growth of the film

Sinterização de filmes finos de LiNbO3 em forno microondas: estudo da influência da direção do fluxo de calor

Fundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP)

Projeto e construção de um elipsômetro automatizado

Coordenação de Aperfeiçoamento de Pessoal de Nível Superior (CAPES)

(Bio)funcionalização de superfícies nanoestruturadas para eletrocatálise e desenvolvimento de biossensores eletroquímicos e óticos

Tese de doutoramento, Química (Química Física), Universidade de Lisboa, Faculdade de Ciências, 2016

Estudo de camadas anti-reflectoras para células solares

Trabalho de projecto de mestrado, Engenharia da Energia e Ambiente, Universidade de Lisboa, Faculdade de Ciências, 2016

Influência dos parâmetros de processo na deposição de nitreto de titânio por plasma em gaiola catódica

Titanium nitride films were grown on glass using the Cathodic Cage Plasma Deposition technique in order to verify the influence of process parameters in optical and structural properties of the films. The plasma atmosphere used was a mixture of Ar, N2 and H2, setting the Ar and N2 gas flows at 4 and 3 sccm, respectively and H2 gas flow varied from 0, 1 to 2 sccm. The deposition process was monitored by Optical Emission Spectroscopy (OES) to investigate the influence of the active species in plasma. It was observed that increasing the H2 gas flow into the plasma the luminescent intensities associated to the species changed. In this case, the luminescence of N2 (391,4nm) species was not proportional to the increasing of the H2 gas into the reactor. Other parameters investigated were diameter and number of holes in the cage. The analysis by Grazing Incidence X-Ray Diffraction (GIXRD) confirmed that the obtained films are composed by TiN and they may have variations in the nitrogen amount into the crystal and in the crystallite size. The optical microscopy images provided information about the homogeneity of the films. The atomic force microscopy (AFM) results revealed some microstructural characteristics and surface roughness. The thickness was measured by ellipsometry. The optical properties such as transmittance and reflectance (they were measured by spectrophotometry) are very sensitive to changes in the crystal lattice of the material, chemical composition and film thicknesses. Therefore, such properties are appropriate tools for verification of this process control. In general, films obtained at 0 sccm of H2 gas flow present a higher transmittance. It can be attributed to the smaller crystalline size due to a higher amount of nitrogen in the TiN lattice. The films obtained at 1 and 2 sccm of H2 gas flow have a golden appearance and XRD pattern showed peaks characteristics of TiN with higher intensity and smaller FWHM (Full Width at Half Maximum) parameter. It suggests that the hydrogen presence in the plasma makes the films more stoichiometric and becomes it more crystalline. It was observed that with higher number of holes in the lid of the cage, close to the region between the lid and the sample and the smaller diameter of the hole, the deposited film is thicker, which is justified by the most probability of plasma species reach effectively the sample and it promotes the growth of the film