A novel tris(2,2 '-bipyridine)ruthenium(II)/tripropylamine cathodic electrochemiluminescence in acetonitrile for the indirect determination of hydrogen peroxide

A novel tris(2,2'-bipyridine)ruthenium(II) (Ru(bpy)3(2+)) cathodic electrochemiluminescence (ECL) was generated at -0.78V at the Pt electrode in acetonitrile (ACN), which suggested that the cathodic ECL differed from conventional cathodic ECL It was found that tripropylamine (TPrA) could enhance this cathodic ECL and the linear range (log-log plot) was 0.2 mu M-0.2 mM. In addition, hydrogen peroxide (H2O2) could inhibit the cathodic ECL and was indirectly detected with the linear range of 27-540 mu M. The RSD (n = 12) of the ECL intensity in the presence of 135 mu M H2O2 was 0.87%. This method was also demonstrated for the fast determination of H2O2 in disinfectant sample and satisfactory results were obtained.

Cathodic electrochemiluminescence in aqueous solutions at bismuth electrodes

The high hydrogen evolution overpotential of a bismuth electrode makes it a powerful electrode for cathodic electro-chemiluminescence studies in aqueous solutions.

Novel tris(2,2-bipyridine)ruthenium(II) cathodic electrochemiluminescence in aqueous solution at a glassy carbon electrode

A novel approach of generating cathodic electrochemiluminescence lof Ru(bpy)(3)(2+) at -0.4 V triggered by reactive oxygen species is reported for detecting alkylamines and some organic acids.

Progress in Ru (bpy)(3)(2+) Electrogenerated Chemiluminescence

Among various ECL systems, such as 9,10-diphenylanthracene, lucigenin, tris(2,2'-bipyridyl) ruthenium, peroxyoxalate, luminol, graphene, and nanocrystals, Ru(bpy)(3)(2+) ECL is one of the most widely studied ECL systems in recent years due to its broad applications in immunoassays, DNA probe assays, coreactants analysis, and aptasensors. In this review, the progress in Ru(bpy)(3)(2+) ECL has been summarized on the whole, and the future research trends have been proposed.

Unique electrochemiluminescence behavior of Ru(bpy)(3)(2+) in a gold/Nafion/Ru(bpy)(3)(2+) composite

The unique electrochemiluminescence (ECL) behavior of tris(bipyridine) ruthenium(II) (Ru(bpy)(3)(2+) immobilized in a gold/Nafion/Ru(bpy)(3)(2+) composite material was investigated. In this composite, the Ru(bpy)(3)(2+) ECL was found mainly occurred at 0-0.4 V during the cathodic scan process and the ECL peak was at about 0.1 V, which was quite different to the reported Ru(bpy)(3)(2+) ECL. Similar to the generally observed Ru(bpy)(3)(2+) ECL, the present ECL also could be enhanced by tri-n-propylarnine (TPA). It is also unique that in the presence of TPA, another ECL peak at about 0.38 V occurred.

Effective enhancement of peroxydisulfate electrochemiluminescence on C-60/DDAB films

Effective enhancement of electrochermluminescence (ECL) of peroxydisulfate on a C-60/didodecyldimethyl ammonium bromide (C-60/DDAB) film coated glassy carbon electrode (GCE) surface is reported in this paper. The C60/DDAB film gave lower cathodic current in the presence of peroxydisulfate than that from a bare GCE. To our surprise, electrochemiluminescent intensity from peroxydisulfate reduction was effectively enhanced on the C60/DDAB film, which was 50 times and 250 times higher than those from a DDAB film coated and bare GCE, respectively. Moreover, the ECL onset potential on the C60/DDAB film was about -0.9 V, which positively shifted 200 mV compared with that from the bare GCE. Dissolved oxygen and the applied potential also affected the electrochemiluminescent intensity. The presence of oxygen decreased the intensity, and the intensity reached maximum at the applied potential of -1.7 V. The unique property will greatly enrich ECL studies and applications based on fullerenes.

Cathodic corrosion of Cu substrates as a route to nanostructured Cu/M (M = Ag, Au, Pd) surfaces

The electrochemical formation of nanostructured materials is generally achieved by reduction of a metal salt onto a substrate that does not influence the composition of the deposit. In this work we report that Ag, Au and Pd electrodeposited onto Cu under conditions where galvanic replacement is not viable and hydrogen gas is evolved results in the formation of nanostructured surfaces that unexpectedly incorporate a high concentration of Cu in the final material. Under cathodic polarization conditions the electrodissolution/corrosion of Cu occurs which provides a source of ionic copper that is reduced at the surface-electrolyte interface. The nanostructured Cu/M (M = Ag, Au and Pd) surfaces are investigated for their catalytic activity for the reduction of 4 nitrophenol by NaBH4 where Cu/Ag was found to be extremely active. This work indicates that a substrate electrode can be utilized in an interesting manner t make bimetallic nanostructures with enhanced catalytic activity.

Effects of superimposed pulse bias on TiN coating in cathodic arc deposition

Orthogonal designs are used to investigate the main factors when doing experiments in which pulse bias is superimposed on d.c. bias during cathodic are deposition of TiN. Pulse peak, duty cycle, frequency, direct voltage, are current and pressure all are investigated when coating TiN on HSS substrates. Roughness, surface micrograph, microhardness and thickness are tested. By analysis of variance, it is shown that pressure and frequency are the main factors. R-a and droplet density of the film with (d.c. + pulse) bias decrease. A simple explanation for the result is suggested.

Properties of tetrahedral amorphous carbon deposited by a filtered cathodic vacuum arc

The properties of a highly sp3 bonded form of amorphous carbon denoted ta-C deposited from a filtered cathodic vacuum arc (FCVA) are described as a function of ion energy and deposition temperature. The sp3 fraction depends strongly on ion energy and reaches 85% at an ion energy of 100 eV. Other properties such as density and band gap vary in a similar fashion, with the optical gap reaching a maximum of 2.3 eV. These films are very smooth with area roughness of order 1 nm. The sp3 fraction falls suddenly to almost zero for deposition above about 200 °C.