离子辅助沉积中离子束流密度的作用

测量了End-Hall离子源在不同条件下的离子束流密度，在不同离子束流密度下进行了心离子辅助沉积ZrO2薄膜的实验，研究了离子束流密度对薄膜折射率、晶相的影响．根据动量传递模型分析了离子束流密度对薄膜折射率的作用；根据热尖峰理论证明了一定条件下离子束流密度不会影响薄膜晶体结构。

光学薄膜中界面层和表面吸附层对相位延迟的影响

多层介质反射镜在非正入射的时候，两个不同的偏振态之间会产生不同的相移．根据空气与膜层、膜层之间的实际情况，建立了界面层和表面吸附层模型，并运用它分析相位延迟产生误差的原因．通过优化设计，入射角为54°，在1285～1345nm之间p，s波获得了270±1°的相移，同时也使反射率在99．5％以上．用离子束溅射技术制备相位延迟膜，用分光光度计测试了光谱特性和用椭偏仪测试了相位特性，在相应波段获得了262．4±1．8°的相移，同时也使反射率在99．6％以上．误差的主要来源是离子源工作特性会产生不均匀的过渡层和最

氧碘激光器相位延迟片的制备与性能研究

多层介质反射镜在非正入射的时候，两个不同的偏振态之间会产生不同的相移。利用矩阵法，根据菲涅耳公式和电磁场边界条件，推导出p，s波的相移。通过优化设计．入射角为54°，在1285～1345nm之间p，s波获得了270°±1°的相移，同时也使反射率在99．5％以上。用离子束溅射技术制备相位延迟膜，用分光光度计测试了光谱特性和用椭偏仪测试了相位特性，在相应波段获得了262．4°±1．8°的相移，同时也使反射率在99．6％以上。误差的主要来源是离子源工作特性会产生不均匀的过渡层和最外层会吸收一些水气、灰尘等也产生

Surface plasmon modulated nano-aperture vertical-cavity surface-emitting laser

We have fabricated surface plasmon modulated nano-aperture vertical-cavity surface-emitting lasers (VCSELs) from common 850 nm VCSELs using focus ion beam etching with Ga+ ion source. The far-field output power is about 0.3 mW at a driving current of 15 mA with a sub-wavelength aperture surrounded by concentric periodic grooves. The enhancement of transmission intensity can be explained by diffraction and enhanced fields associated with surface plasmon. This structure also exhibits beaming properties.

全永磁ECR离子源研究进展

Electron Cyclotron Resonance (ECR) ion source is regarded as the most efficient machine to produce stable multiple charge state ion beams. Because of the special characteristics, all-permanent magnet ECR ion sources have been widely adopted around the world to produce stable ion beams of multiple charge state with good repetition have been widely adopted around the world to produce stable ion beams of multiple charge state with good repetition and high duty factor for compact research platforms and ion beam implanters. In this paper, all-permanent magnet ECR ion sources developed at IMP are presented, and typical parameters and performances are discussed. The high charge state source, LAPECR2, is mainly used to produce intense high charge state ion beams, and the LAPECR1 source is designed to produce intense ion beams of medium and low charge state. An improved LAPECR1-M is specially designed to produce heavy metal ion beams of low charge state. These ECR ion sources have been adopted by different experimental terminals at IMP and, with their nice performance, many experimental studies could be possible. 中文文摘：ECR(电子回旋共振)离子源是产生稳定的强流多电荷态离子束流最有效装置。全永磁ECR 离子源因其独特的特点为很多中小型多电荷态离子束流实验平台与离子注入机等系统所采用，为后者产生重复性好、稳定性强的多电荷态离子束流。本文着重论述了中国科学院近代物理研究所研制的几台全永磁多电荷态ECR 离子源及其特性与典型性能，如能产生强流高电荷态离子束流的高性能全永磁离子源LAPECR2，能产生强流中 低电荷态离子束流的LAPECR1，能产生多电荷态重金属离子束流的LAPECR1-M 等。这些性能稳定的离子源为提高近代物理研究所相关试验平台的性能提供了关键的束流品质保障。

Effects of magnetic configuration on hot electrons in highly charged ECR plasma

To investigate the hot electrons in highly charged electron cyclotron resonance (ECR) plasma, Bremsstrahlung radiations were measured on two ECR ion sources at the Institute of Modern Physics. Used as a comparative index of the mean energy of the hot electrons, a spectral temperature, Tspe, is derived through a linear fitting of the spectra in a semi-logarithmic representation. The influences of the external source parameters, especially the magnetic configuration, on the hot electrons are studied systematically. This study has experimentally demonstrated the importance of high microwave frequency and high magnetic field in the electron resonance heating to produce a high density of hot electrons, which is consistent with the empirical ECR scaling laws. The experimental results have again shown that a good compromise is needed between the ion extraction and the plasma confinement for an efficient production of highly charged ion beams. In addition, this investigation has shown that the correlation between the mean energy of the hot electrons and the magnetic field gradient at the ECR is well in agreement with the theoretical models.中文摘要：ECR(电子回旋共振)离子源是产生稳定的强流多电荷态离子束流最有效装置。全永磁 ECR 离子源因其独特的特点为很多中小型多电荷态离子束流实验平台与离子注入机等系统所采用，为后者产生重复性好、稳定性强的多电荷态离子束流。本文着重论述了中国科学院近代物理研究所研制的几台全永磁多电荷态ECR离子源及其特性与典型性能，如能产生强流高电荷态离子束流的高性能全永磁离子源LAPECR2，能产生强流中低电荷态离子束流的LAPECR1，能产生多电荷态重金属离子束流的LAPECR1-M等。这些性能稳定的离子源为提高近代物理研究所相关试验平台的性能提供了关键的束流品质保障。

Experimental results of helicon sources

Helicon plasma source is known as an efficient generator of uniform and high density plasma. A helicon plasma source was developed for the investigation of plasma striping and plasma lens at the Institute of Modern Physics, CAS. In this paper, the characteristics of helicon plasma have been studied by using Langmuir four-probe and a high plasma density up to 3.9×1013 /cm3 has been achieved with the Nagoya type III antenna. In the experiment, several important phenomena have been found: (1) for a given magnetic induction intensity, the plasma density became greater with the increase of RF power; (2) the helicon mode appeared at the RF power between 300 W and 400 W; (3) the plasma density gradually tended to saturation as the RF power increased to the higher power; (4) a higher plasma density can be obtained by a good matching between the RF power and the magnetic field distribution. The key issue is how to optimize the matching between the RF power and the magnetic field. Moreover, some tests on the extraction of ion beam were performed, and the preliminary results were given. The problems which existed in the helicon ion source will be discussed and the increase in beam density will be expected by extraction system optimum.

强流高电荷态全永磁ECR离子源LAPECR2的初步调试

研制成功了一台强流高电荷态全永磁ECR(Electron Cyclotron Resonance)离子源LAPECR2(Lanzhou All Permanent Magnet ECR Ion Source No.2)。该离子源在完成磁体装配后已成功在近代物理研究所320 kV高压平台上安装就位,与后束运线完成对接组装。离子源于2005年7月在14.5 GHz实现了第一次成功起弧,并引出较强的混合束流。目前离子源已与后束线以及部分实验终端完成了联调,在实验终端能够获得强流较高电荷态的离子束流。本文将着重论述该全永磁源的结构技术特点和主要参数指标。本文还着重论述了LAPECR2离子源在14.5 GHz微波功率馈入条件下的初步调试结果,在此基础上对束流向实验终端联调的实验结果进行了讨论,着重分析了影响束流引出与传输效率的主要因素。

超导ECR源SECRAL轫致辐射谱的测量

热电子在ECR(Electron Cyclotron Resonance)源中有着非常重要的作用,为了研究ECR源的工作参数(微波功率、磁场等)对热电子的影响,我们对SECRAL(Superconducting ECR ion source with Advanced design in Lanzhou)等离子体在轴向发出的轫致辐射谱进行了系统的测量。从测得的轫致辐射谱中我们得到用来衡量热电子能量的参考量——光谱温度Tspe,并且对ECR源的几个工作参数与Tspe的关系进行了讨论。

高性能全永磁ECR离子源LAPECR2的研制

研制了一台体积和重量都较大、设计性能较高的全永磁电子回旋共振(Electron cyclotron resonance, ECR)离子源LAPECR2(Lanzhou all permanent magnetic ECR ion source No．2)。该离子源将用于中国科学院近代物理研究所320 kV高压平台,为其提供强流高电荷态离子束流。LAPECR2的研制采用全新的全永磁磁体结构设计,通过采用高性能的NdFeB永磁材料、优化的磁结构设计以及精确的计算,实测源体的磁场参数能达到高性能ECR离子源的设计要求。离子源采用较高频率的14．5 GHz微波馈入加热等离子体,波导直接馈入离子源以增强馈入微波的稳定性与效率。此外,还大量采用了一些有利于提高离子源高电荷态离子产额的关键技术,如铝内衬等离子体弧腔、负偏压盘、铝制等离子体电极、三电极引出系统、辅助掺气等。

A latest developed all permanent magnet ECRIS for atomic physics research at IMP

Electron cyclotron resonance (ECR) ion sources have been used for atomic physics research for a long time. With the development of atomic physics research in the Institute of Modern Physics (IMP), additional high performance experimental facilities are required. A 300 kV high voltage (HV) platform has been under construction since 2003, and an all permanent magnet ECR ion source is supposed to be put on the platform. Lanzhou all permanent magnet ECR ion source No. 2 (LAPECR2) is a latest developed all permanent magnet ECRIS. It is a 900 kg weight and circle divide 650 mm X 562 mm outer dimension (magnetic body) ion source. The injection magnetic field of the source is 1.28 T and the extraction magnetic field is 1.07 T. This source is designed to be running at 14.5 GHz. The high magnetic field inside the plasma chamber enables the source to give good performances at 14.5 GHz. LAPECR2 source is now under commissioning in IMP. In this article, the typical parameters of the source LAPECR2 are listed, and the typical results of the preliminary commissioning are presented.

Beam dynamics design of an RFQ for a planned accelerator, which uses a direct plasma injection scheme

To meet the requirements of providing high-intensity heavy ion beams the direct plasma injection scheme (DPIS) was proposed by a RIKEN-CNS-TIT collaboration. In this scheme a radio frequency quadrupole (RFQ) was joined directly with the laser ion source (LIS) without a low-energy beam transport (LEBT) line. To find the best design of the RFQ that will have short length, high transmission efficiency and small emittance growth, beam dynamics designs with equipartitioning design strategy and with matched-only design strategy have been performed, and a comparison of their results has also been done. Impacts of the input beam parameters on transmission efficiency are presented, too. (C) 2008 Elsevier B.V. All rights reserved.

The electron emission yield induced by the interaction of highly charged argon ions with silicon surface

The electron emission yield of the interaction of highly charged argon ions with silicon surface is reported. The experiment was done at the Atomic Physics Research Platform on the Electron Cyclotron Resonance (ECR) Ion Source of the National Laboratory HIRFL (Heavy Ion Research Facility in Lanzhou). In the experiment, the potential energy and kinetic energy was selected by varying the projectile charge states and extracting voltage, thus the contributions of the projectile potential energy deposition and electronic energy loss in the solid are extensively investigated. The results show that, the two main factors leading to surface electron emission, namely the potential energy deposition and the electronic energy loss, are both approximately proportional to the electron emission yield per ion.

First results of SECRAL at 18GHz for intense beam production of highly charged ions

A Superconducting ECR ion source with Advanced design in Lanzhou (SECRAL) was successfully built to produce intense beams of highly charged ions for Heavy Ion Research Facility in Lanzhou (HIRFL). The ion source has been optimized to be operated at 28GHz for its maximum performance. The superconducting magnet confinement configuration of the ion source consists of three axial solenoid coils and six sextupole coils with a cold iron structure as field booster and clamping. For 28GHz operation, the magnet assembly can produce peak mirror fields on axis 3.6T at injection, 2.2T at extraction and a radial sextupole field of 2.0T at plasma chamber wall. A unique feature of SECRAL is that the three axial solenoid coils are located inside of the sextupole bore in order to reduce the interaction forces between the sextupole coils and the solenoid coils. During the ongoing commissioning phase at 18GHz with a stainless steel chamber, tests with various gases and some metals have been conducted with microwave power less than 3.2kW and it turned out the performance is very promising. Some record ion beam intensities have been produced, for instance, 810e mu A of O7+, 505e mu A of Xe20+, 306e mu A of Xe27+, 21e mu A of Xe34+, 2.4e mu A of Xe38+ and so on. To reach better results for highly charged ion beams, further modifications such as an aluminium chamber with better cooling, higher microwave power and a movable extraction system will be done, and also emittance measurements are being prepared.