Canadian Niagara Power Glass Slide - Plan and Profile of Discharge Tunnel

Plan and profile of discharge tunnel along Niagara River. The horizontal scale is 1 inch = 100 feet, the vertical scale is 1 inch = 40 feet. The drawing is dated November 7, 1902.

Note regarding discharge over waste weirs

Note regarding discharge over waste weirs. This is initialed by S.D. Woodruff, May 4, 1846.

Discharge of Mortgage signed by Henry Kalar, President of the Niagara Permanent Building Society

Discharge of Mortgage signed by Henry Kalar, President of the Niagara Permanent Building Society stating that John McNeilly [?] has satisfied all money due and the mortgage is therefore discharged. The right hand side of this document is burned. Text is slightly affected, Aug. 8, 1853.

Modification des propriétés optiques de nanofils à base de GaN par plasma N2/O2

Une sonde électrostatique de Langmuir cylindrique a été utilisée pour caractériser une post-décharge d’un plasma d’ondes de surface de N2-O2 par la mesure de la densité des ions et électrons ainsi que la température des électrons dérivée de la fonction de distribution en énergie des électrons (EEDF). Une densité maximale des électrons au centre de la early afterglow de l’ordre de 1013 m-3 a été déterminée, alors que celle-ci a chuté à 1011 m-3 au début de la late afterglow. Tout au long du profil de la post-décharge, une densité des ions supérieure à celle des électrons indique la présence d’un milieu non macroscopiquement neutre. La post-décharge est caractérisée par une EEDF quasi maxwellienne avec une température des électrons de 0.5±0.1 eV, alors qu’elle grimpe à 1.1 ±0.2 eV dans la early afterglow due à la contribution des collisions vibrationnelles-électroniques (V-E) particulièrement importantes. L’ajout d’O2 dans la décharge principale entraîne un rehaussement des espèces chargées et de la température des électrons suivi d’une chute avec l’augmentation de la concentration d’O2. Le changement de la composition électrique de la post-décharge par la création de NO+ au détriment des ions N2+ est à l’origine du phénomène. Le recours à cette post-décharge de N2 pour la modification des propriétés d’émission optique de nanofils purs de GaN et avec des inclusions d’InGaN a été étudié par photoluminescence (PL). Bien que l’émission provenant des nanofils de GaN et de la matrice de GaN recouvrant les inclusions diminue suite à la création de sites de recombinaison non radiatifs, celle provenant des inclusions d’InGaN augmente fortement. Des mesures de PL par excitation indiquent que cet effet n’est pas attribuable à un changement de l’absorption de la surface de GaN. Ceci suggère un recuit dynamique induit par la désexcitation des métastables de N2 suite à leur collision à la surface des nanofils et la possibilité de passiver les défauts de surface tels que des lacunes d’azote par l’action d’atomes de N2 réactifs provenant de la post-décharge. L’incorporation d’O2 induit les mêmes effets en plus d’un décalage vers le rouge de la bande d’émission des inclusions, suggérant l’action des espèces d’O2 au sein même des nanostructures.

High power N2 laser with a modified gas flow system and discharge geometry

A high power Nz laser of the double-Blumlein type having a modified gas flow system, electrode configuration, and discharge geometry with minimum inductance is described. By incorporating a triggere’d-pressurized spark gap switch, arc-free operation was achieved for a wide E/P range. The device gives a peak power in excess of 700 kW with a FWHM of 3 ns and an efficiency of 0.51%, which is remarkably high for a pulsed nitrogen laser system. The dependence of output power on parameters such as operating pressure, voltage, and repetition rate are discussed.

Photoemission optogalvanic effect near the instability region of a hollow cathode discharge

The photoemission optogalvanic (POG) effect has been investigated in a neon-neodymium hollow cathode discharge using cw laser excitation. Both positive and negative effects were observed. It was found that the amplitude of the POG signal was unstable near the instability region of the discharge.

Subcritical Hopf bifurcation in Ne-Nd hollow cathode discharge

We report the experimental observation of subcritical Hopf bifurcation and the existence of non-oscillating “windows” in the dynamics of a Ne-Nd hollow cathode discharge current as the control parameter.

High resolution optogalvanic study in nitrogen discharge

Doppler limited high resolution spectrum in the wavelength region 17224 to 17236 cm−1 of the first positive system (B 3Π g −A 3Σ u + ) of the N2 molecule is recorded by optogalvanic spectroscopic technique using a single mode ring dye laser. It is observed that the intensity and line width of the rotational line increase with the discharge current. Dependence of the collision broadening coefficient on the current was also evaluated.

Structural, electrical and electrochemical characterization of high frequency magnetron sputtered spinel oxide cathode films for lithium ion battery applications

The main challenges in the deposition of cathode materials in thin film form are the reproduction of stoichiometry close to the bulk material and attaining higher rates of deposition and excellent crystallinity at comparatively lower annealing temperatures. There are several methods available to develop stoichiometric thin film cathode materials including pulsed laser deposition; plasma enhanced chemical vapor deposition, electron beam evaporation, electrostatic spray deposition and RF magnetron sputtering. Among them the most versatile method is the sputtering technique, owing to its suitability for micro-fabricating the thin film batteries directly on chips in any shape or size, and on flexible substrates, with good capacity and cycle life. The main drawback of the conventional sputtering technique using RF frequency of 13.56MHz is its lower rate of deposition, compared to other deposition techniques A typical cathode layer for a thin film battery requires a thickness around one micron. To deposit such thick layers using convention RF sputtering, longer time of deposition is required, since the deposition rate is very low, which is typically 10-20 Å/min. This makes the conventional RF sputtering technique a less viable option for mass production in an economical way. There exists a host of theoretical and experimental evidences and results that higher excitation frequency can be efficiently used to deposit good quality films at higher deposition rates with glow discharge plasma. The effect of frequencies higher than the conventional one (13.56MHz) on the RF magnetron sputtering process has not been subjected to detailed investigations. Attempts have been made in the present work, to sputter deposit spinel oxide cathode films, using high frequency RF excitation source. Most importantly, the major challenge faced by the thin film battery based on the LiMn2O4 cathode material is the poor capacity retention during charge discharge cycling. The major causes for the capacity fading reported in LiMn2O4cathode materials are due to, Jahn-Teller distortion, Mn2+ dissolution into the electrolyte and oxygen loss in cathode material during cycling. The work discussed in this thesis is an attempt on overcoming the above said challenges and developing a high capacity thin film cathode material.

Studies On The Dynamics And Water Quality Of The Muvattupuzha River In Relation To Effluent Discharge

The present study aims at the investigation of the 1ysico—chemical features of a tropical tidal river viz. we Muvattupuzha river. This river is expected to receive Jderate to heavy pollution loads in years to come, from we lone industrial unit, already set up on its bank. ilike other rivers, the geographical disposition of this Lver attains unique importance as regards its dynamics for 3) availability of natural runoff water from catchment :eas, which becomes very heavy during the monsoon season 3) regular steady availability of tail race water from a /dro—electric power station throughout the yearThe study also aims at arriving at the balancing forces of inherent self~purification of the river verses pollution loads from the factory effluents. The investigation period falls ahead of actual pollution occurrence and so the ambient conditions for a period of nearly one-and-a—half years were investigated, the analyses of which providflz to formulate the inter-relations of parameters varying with seasons. Tracer experiments were carried out which revealed the dispersion and dilution characteristics of the river in the vicinity of effluent outfall. The studv covers the trial—cum-capacity production periods of the factory during which effluents of various strength and quantity were discharged into the river; a few computed values arQ’cjmpgrQdl ... with the observed values. The base data along with the profiles of Oxygen sag equation have been utilized fb develop a mathematical model of the river with regard to its water quality