Application of thermal ion-molecule reactions in tackling spectroscopic inferences in inductively coupled plasma mass spectrometry

Part I: Ultra-trace determination of vanadium in lake sediments: a performance comparison using O2, N20, and NH3 as reaction gases in ICP-DRC-MS Thermal ion-molecule reactions, targeting removal of specific spectroscopic interference problems, have become a powerful tool for method development in quadrupole based inductively coupled plasma mass spectrometry (ICP-MS) applications. A study was conducted to develop an accurate method for the determination of vanadium in lake sediment samples by ICP-MS, coupled with a dynamic reaction cell (DRC), using two differenvchemical resolution strategies: a) direct removal of interfering C10+ and b) vanadium oxidation to VO+. The performance of three reaction gases that are suitable for handling vanadium interference in the dynamic reaction cell was systematically studied and evaluated: ammonia for C10+ removal and oxygen and nitrous oxide for oxidation. Although it was able to produce comparable results for vanadium to those using oxygen and nitrous oxide, NH3 did not completely eliminate a matrix effect, caused by the presence of chloride, and required large scale dilutions (and a concomitant increase in variance) when the sample and/or the digestion medium contained large amounts of chloride. Among the three candidate reaction gases at their optimized Eonditions, creation of VO+ with oxygen gas delivered the best analyte sensitivity and the lowest detection limit (2.7 ng L-1). Vanadium results obtained from fourteen lake sediment samples and a certified reference material (CRM031-040-1), using two different analytelinterference separation strategies, suggested that the vanadium mono-oxidation offers advantageous performance over the conventional method using NH3 for ultra-trace vanadium determination by ICP-DRC-MS and can be readily employed in relevant environmental chemistry applications that deal with ultra-trace contaminants.Part II: Validation of a modified oxidation approach for the quantification of total arsenic and selenium in complex environmental matrices Spectroscopic interference problems of arsenic and selenium in ICP-MS practices were investigated in detail. Preliminary literature review suggested that oxygen could serve as an effective candidate reaction gas for analysis of the two elements in dynamic reaction cell coupled ICP-MS. An accurate method was developed for the determination of As and Se in complex environmental samples, based on a series of modifications on an oxidation approach for As and Se previously reported. Rhodium was used as internal standard in this study to help minimize non-spectral interferences such as instrumental drift. Using an oxygen gas flow slightly higher than 0.5 mL min-I, arsenic is converted to 75 AS160+ ion in an efficient manner whereas a potentially interfering ion, 91Zr+, is completely removed. Instead of using the most abundant Se isotope, 80Se, selenium was determined by a second most abundant isotope, 78Se, in the form of 78Se160. Upon careful selection of oxygen gas flow rate and optimization ofRPq value, previous isobaric threats caused by Zr and Mo were reduced to background levels whereas another potential atomic isobar, 96Ru+, became completely harmless to the new selenium analyte. The new method underwent a strict validation procedure where the recovery of a suitable certified reference material was examined and the obtained sample data were compared with those produced by a credible external laboratory who analyzed the same set of samples using a standardized HG-ICP-AES method. The validation results were satisfactory. The resultant limits of detection for arsenic and selenium were 5 ng L-1 and 60 ng L-1, respectively.

Étude critique de la densité électronique et des températures (excitation et ionisation) d'un plasma d'aluminium induit par laser

La caractérisation de matériaux par spectroscopie optique d’émission d’un plasma induit par laser (LIPS) suscite un intérêt qui ne va que s’amplifiant, et dont les applications se multiplient. L’objectif de ce mémoire est de vérifier l’influence du choix des raies spectrales sur certaines mesures du plasma, soit la densité électronique et la température d’excitation des atomes neutres et ionisés une fois, ainsi que la température d’ionisation. Nos mesures sont intégrées spatialement et résolues temporellement, ce qui est typique des conditions opératoires du LIPS, et nous avons utilisé pour nos travaux des cibles binaires d’aluminium contenant des éléments à l’état de trace (Al-Fe et Al-Mg). Premièrement, nous avons mesuré la densité électronique à l’aide de l’élargissement Stark de raies de plusieurs espèces (Al II, Fe II, Mg II, Fe I, Mg I, Halpha). Nous avons observé que les densités absolues avaient un comportement temporel différent en fonction de l’espèce. Les raies ioniques donnent des densités électroniques systématiquement plus élevées (jusqu’à 50 % à 200 ns après l’allumage du plasma), et décroissent plus rapidement que les densités issues des raies neutres. Par ailleurs, les densités obtenues par les éléments traces Fe et Mg sont moindres que les densités obtenues par l’observation de la raie communément utilisée Al II à 281,618 nm. Nous avons parallèlement étudié la densité électronique déterminée à l’aide de la raie de l’hydrogène Halpha, et la densité électronique ainsi obtenue a un comportement temporel similaire à celle obtenue par la raie Al II à 281,618 nm. Les deux espèces partagent probablement la même distribution spatiale à l’intérieur du plasma. Finalement, nous avons mesuré la température d’excitation du fer (neutre et ionisé, à l’état de trace dans nos cibles), ainsi que la température d’ionisation, à l’aide de diagrammes de Boltzmann et de Saha-Boltzmann, respectivement. À l’instar de travaux antérieurs (Barthélémy et al., 2005), il nous est apparu que les différentes températures convergeaient vers une température unique (considérant nos incertitudes) après 2-3 microsecondes. Les différentes températures mesurées de 0 à 2 microsecondes ne se recoupent pas, ce qui pourrait s’expliquer soit par un écart à l’équilibre thermodynamique local, soit en considérant un plasma inhomogène où la distribution des éléments dans la plume n’est pas similaire d’un élément à l’autre, les espèces énergétiques se retrouvant au cœur du plasma, plus chaud, alors que les espèces de moindre énergie se retrouvant principalement en périphérie.

Spatial and temporal analysis of laser induced plasma from a polymer sample

Spatial and temporal analyses of the spectra of the laser induced plasma from a polytetrafluroethylene (PTFE) target obtained with the 1.06 mu m radiation from a Q-switched Nd:YAG laser have been carried out. The spatially resolved spectra of the plasma emission show that molecular bands of C2 (Swan bands) and CN are very intense in the outer regions of the plasma, whereas higher ionized states of carbon are predominant in the core region of the plasma emission. The vibrational temperature and population distribution in the different vibrational levels have been studied as a function of laser energy. From the time resolved studies, it has been observed that there exist fairly large time delays for the onset of emission from all the species in the outer region of the plasma. The molecular bands in each region exhibit much larger time delays in comparison to the ionic lines in the plasma.

Electron density and temperature measurements in a laser produced carbon plasma

Plasma generated by fundamental radiation from a Nd:YAG laser focused onto a graphite target is studied spectroscopically. Measured line profiles of several ionic species were used to infer electron temperature and density at several sections located in front of the target surface. Line intensities of successive ionization states of carbon were used for electron temperature calculations. Stark broadened profiles of singly ionized species have been utilized for electron density measurements. Electron density as well as electron temperature were studied as functions of laser irradiance and time elapsed after the incidence of laser pulse. The validity of the assumption of local thermodynamic equilibrium is discussed in light of the results obtained.

Spectral features of laser induced plasma from YBa2Cu3O7 and GdBa2Cu3O7 highTc superconductors

Laser induced plasma emission spectra from highT c superconducting samples of YBa2Cu3O7 and GdBa2Cu3O7 obtained with 1.06µm radiation from a Q switched Nd:YAG laser beam has been analysed. The results clearly show the presence of diatomic oxides in addition to ionized species of the constituent metals in the plasma thus produced.

Anomalous profile of a self-reversed resonance line from Ba+ in a laser produced plasma from YBa2Cu307

A laser produced plasma from the multielement solid target YBa2Cu3O7 is generated using 1.06 μm, 9 ns pulses from a Q-switched Nd:YAG laser in air at atmospheric pressure. A time resolved analysis of the profile of the 4554.03 Å resonance line emission from Ba II at various laser power densities has been carried out. It has been found that the line has a profile which is strongly self-reversed. It is also observed that at laser power densities equal to or exceeding 1.6×1011 W cm−2, a third peak begins to develop at the centre of the self-reversed profile and this has been interpreted as due to the anisotropic resonance scattering (fluorescence). The number densities of singly ionized barium ions evaluated from the width of the resonance line as a function of time delay with respect to the beginning of the laser pulse give typical values of the order of 1019 cm−3. The higher ion concentrations existing at smaller time delays are seen to decrease rapidly. The Ba II ions in the ground state resonantly absorb the radiation and this absorption is maximum around 120 ns after the laser pulse.

Effect of ambient gas on the expansion dynamics of plasma plume formed by laser blow off of thin film

A study has been carried out to understand the influence of ambient gases on the dynamics of laser-blow-off plumes of multi-layered LiF–C thin film. Plume images at various time intervals ranging from 100 to 3000 ns have been recorded using an intensified CCD camera. Enhancement in the plume intensity and change in size and shape occurs on introducing ambient gases and these changes are highly dependent on the nature and composition of the ambient gas used. Velocity of the plume was found to be higher in helium ambient whereas intensity enhancement is greater in argon environment. The plume shapes have maximum size at 10−2 and 10−1 Torr of Ar and He pressures, respectively. As the background pressure increases further (>10−2 Torr: depending on the nature of gas), the plume gets compressed/focused in the lateral direction. Internal structure formation and turbulences are observed at higher pressures (>10−1 Torr) in both ambient gases.

Application of Imaging to Study the Evolution and Dynamics of Laser Produced Plasma from Solid and Thin Film Li Targets

The present thesis report the results obtained from the studies carried out on the laser blow off plasma (LBO) from LiF-C (Lithium Fluoride with Carbon) thin film target, which is of particular importance in Tokamak plasma diagnostics. Keeping in view of its significance, plasma generated by the irradiation of thin film target by nanosecond laser pulses from an Nd:YAG laser over the thin film target has been characterized by fast photography using intensified CCD. In comparison to other diagnostic techniques, imaging studies provide better understanding of plasma geometry (size, shape, divergence etc) and structural formations inside the plume during different stages of expansion.

Lithography-free micro- and nanostructuring based on conventional plasma etching

In now-a-days semiconductor and MEMS technologies the photolithography is the working horse for fabrication of functional devices. The conventional way (so called Top-Down approach) of microstructuring starts with photolithography, followed by patterning the structures using etching, especially dry etching. The requirements for smaller and hence faster devices lead to decrease of the feature size to the range of several nanometers. However, the production of devices in this scale range needs photolithography equipment, which must overcome the diffraction limit. Therefore, new photolithography techniques have been recently developed, but they are rather expensive and restricted to plane surfaces. Recently a new route has been presented - so-called Bottom-Up approach - where from a single atom or a molecule it is possible to obtain functional devices. This creates new field - Nanotechnology - where one speaks about structures with dimensions 1 - 100 nm, and which has the possibility to replace the conventional photolithography concerning its integral part - the self-assembly. However, this technique requires additional and special equipment and therefore is not yet widely applicable. This work presents a general scheme for the fabrication of silicon and silicon dioxide structures with lateral dimensions of less than 100 nm that avoids high-resolution photolithography processes. For the self-aligned formation of extremely small openings in silicon dioxide layers at in depth sharpened surface structures, the angle dependent etching rate distribution of silicon dioxide against plasma etching with a fluorocarbon gas (CHF3) was exploited. Subsequent anisotropic plasma etching of the silicon substrate material through the perforated silicon dioxide masking layer results in high aspect ratio trenches of approximately the same lateral dimensions. The latter can be reduced and precisely adjusted between 0 and 200 nm by thermal oxidation of the silicon structures owing to the volume expansion of silicon during the oxidation. On the basis of this a technology for the fabrication of SNOM calibration standards is presented. Additionally so-formed trenches were used as a template for CVD deposition of diamond resulting in high aspect ratio diamond knife. A lithography-free method for production of periodic and nonperiodic surface structures using the angular dependence of the etching rate is also presented. It combines the self-assembly of masking particles with the conventional plasma etching techniques known from microelectromechanical system technology. The method is generally applicable to bulk as well as layered materials. In this work, layers of glass spheres of different diameters were assembled on the sample surface forming a mask against plasma etching. Silicon surface structures with periodicity of 500 nm and feature dimensions of 20 nm were produced in this way. Thermal oxidation of the so structured silicon substrate offers the capability to vary the fill factor of the periodic structure owing to the volume expansion during oxidation but also to define silicon dioxide surface structures by selective plasma etching. Similar structures can be simply obtained by structuring silicon dioxide layers on silicon. The method offers a simple route for bridging the Nano- and Microtechnology and moreover, an uncomplicated way for photonic crystal fabrication.

Gas collisions and pressure quenching of the photoluminescence of silicon nanopowder grown by plasma-enhanced chemical vapor deposition

The quenching of the photoluminescence of Si nanopowder grown by plasma-enhanced chemical vapor deposition due to pressure was measured for various gases ( H2, O2, N2, He, Ne, Ar, and Kr) and at different temperatures. The characteristic pressure, P0, of the general dependence I(P)=I0exp(-P/P0) is gas and temperature dependent. However, when the number of gas collisions is taken as the variable instead of pressure, then the quenching is the same within a gas family (mono- or diatomic) and it is temperature independent. So it is concluded that the effect depends on the number of gas collisions irrespective of the nature of the gas or its temperature

A dedicated setup for the measurement of the electron transport parameters in gases at large electric fields

Electron transport parameters are important in several areas ranging from particle detectors to plasma-assisted processing reactors. Nevertheless, especially at high fields strengths and for complex gases, relatively few data are published. A dedicated setup has been developed to measure the electron drift velocity and the first Townsend coefficient in parallel plate geometry. An RPC-like cell has been adopted to reach high field strengths without the risk of destructive sparks. The validation data obtained with pure Nitrogen will be presented and compared to a selection of the available literature and to calculations performed with Magboltz 2 version 8.6. The new data collected in pure Isobutane will then be discussed. This is the first time the electron drift velocity in pure Isobutane is measured well into the saturation region. Good agreement is found with expectations from Magboltz. (C) 2009 Elsevier B.V. All rights reserved.

Effect of atmospheric plasma treatment on pad-dyeing of natural dyes on wool

Plasma treatment is an emerging surface modification technique that alters dye uptake of wool without using chemicals or water for pre-treatment. Padding is an established continuous dyeing technique known for its efficient use of water, time and energy. This study combined these two techniques for colouration of wool fabric using two natural dyes derived from the Acacia plant family. The investigation focused on the effects of plasma treatment and obtaining unique patterning effects. Helium (100%) and a mixture of helium and nitrogen (95%/5%) were used as the plasma gases under atmospheric conditions. Plasma treated wool fabric was padded with the above natural dyes. Copper sulphate and ferrous sulphate were applied on the dyed fabric as mordant yielding neutral shades of beige and grey respectively. Up to a 30% enhancement of dye adsorption on plasma treated wool substrate was observed as compared to untreated sample for both gases used. This higher adsorption indicates the hydrophilic character of the natural dyes used. Key performance parameters such as fastness to washing, rubbing and light were tested and found to be satisfactory. A single process tone-on-tone pattern was achieved by controlling the plasma exposure of treated area. This study concluded that a merger of natural dyes with modern plasma treatment and padding techniques for wool colouration was feasible.

Improvement of polypyrrole coating adhesion by radio frequency plasma

Tariq worked in the area of electronic textiles. He coated polyester fabric and PVDF films with polypyrrole. Plasma treatment was used to improve binding of coatings over the surface. He investigated in detail, the factors responsible for adhesion improvement using XPS, AFM, SEM, contact angle, abrasion tests and conductivity measurements. Different plasma gases, plasma power and plasma modes were investigated to get optimum bonding data. His investigations pointed towards improved surface oxygen functionalization and suitable surface morphology for improved bonding.

Estudo da nitretação a plasma aplicada em ferramentas para fresamento

Este trabalho tem como objetivo estudar a influência do tratamento superficial, através da técnica de nitretação a plasma, no processo de fresamento com fresas de aço rápido AISI M2. Foram investigados os efeitos deste tratamento superficial no processo de corte, variando-se a forma de refrigeração/lubrificação das fresas com fluído de corte convencional (emulsão) em abundância, com minimização e sem fluído (lubrificação a seco). Na nitretação, a composição da mistura de gases utilizada nos experimentos foi de 5% N2 e 95% H2 em volume, a uma pressão de tratamento de 5 mbar (3,8 Torr). A temperatura utilizada foi de 440oC, durante um tempo de tratamento de 30 minutos, resultando em uma camada nitretada com uma zona de difusão com aproximadamente 8µm de profundidade. As ferramentas empregadas no processo de fresamento foram investigadas através de medição de forças de usinagem, medições de desgaste na superfície de incidência (flanco) e na superfície de saída (face), sendo as camadas nitretadas caracterizadas por metalografia óptica e microdureza. Foi observado um desempenho superior das fresas nitretadas apenas para as condições de corte a seco.

Nitretação a plasma: fundamentos e aplicações

A nitretação é uma técnica de tratamento de superfície utilizada para endurecer superfícies de metais, principalmente de aços. O uso do plasma para auxiliar esta técnica vem crescendo nos últimos anos. Pelo fato desta técnica utilizar o plasma como fonte energética e este possuir uma vasta aplicação em outras técnicas para processamento de materiais, enobrece ainda mais a leitura do presente livro. Ele apresenta uma revisão da descarga elétrica em gases levando o leitor a refletir, multidisciplinarmente, sobre possibilidades de aplicação da mesma. Apresenta a técnica de nitretação iônica sob o aspecto histórico, científico, tecnológico, operacional e econômico e, finalmente, faz uma revisão das novas técnicas de endurecimento superficial assim como as técnicas convencionais de nitretação